Mr. Jun Sik Lee Profile

Jun Sik Lee

at Hynix Semiconductor Inc

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 19 May 2008 Paper

The source of carbon contamination for EUV mask production

Yongdae Kim, Junsik Lee, Yongkyoo Choi, Changreol Kim

Proceedings Volume 7028, 70281U (2008) https://doi.org/10.1117/12.799668

KEYWORDS: Carbon, Photomasks, Extreme ultraviolet lithography, Contamination, Extreme ultraviolet, Reflectivity, Analytical research, Lithography, Raman spectroscopy, Scanning probe microscopy

Read Abstract +

Proceedings Article | 19 May 2008 Paper

An explosive haze formation under low energy exposure

Junsik Lee, Yongdae Kim, Yongkyoo Choi, Changreol Kim

Proceedings Volume 7028, 70282B (2008) https://doi.org/10.1117/12.793085

KEYWORDS: Air contamination, Photomasks, Raman spectroscopy, Packaging, Explosives, Inspection, Reticles, Pellicles, Ultraviolet radiation, Organic materials

Read Abstract +

Proceedings Article | 9 November 2005 Paper

Survey of SO₄ outgas on mask storage environment

Jun Sik Lee, Sung Bae Jee, Sung Min Hwang, Hyun Yul Park, Oscar Han

Proceedings Volume 5992, 599248 (2005) https://doi.org/10.1117/12.626243

KEYWORDS: Photomasks, Pellicles, Ions, Semiconducting wafers, Air contamination, Manufacturing, Reticles, Contamination, Environmental sensing, Molecules

Read Abstract +

Proceedings Article | 5 November 2005 Paper

The surface treatment for prevention of growing defect

Jea-Young Jun, Ji-Sun Ryu, Yongk-Yoo Choi, Oscar Han

Proceedings Volume 5992, 59921F (2005) https://doi.org/10.1117/12.632044

KEYWORDS: Photomasks, Heat treatments, Ions, Etching, Dry etching, Atomic force microscopy, Glasses, Wet etching, Air contamination, Molybdenum

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Dong Wook Lee, Ho Yong Jung, Mun Sik Kim, Jun Sik Lee, Yong Kyoo Choi, Oscar Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569015

KEYWORDS: Ions, Ultraviolet radiation, Oxygen, Chemical analysis, Contamination, Phase shifts, Photomasks, Air contamination, Atomic force microscopy, Transmission electron microscopy

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Investigation of Cr defect in high Cr load logic mask

Ho-Yong Jung, Sung Jin Choi, Mun-Sik Kim, Dong Wook Lee, Junsik Lee, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557677

KEYWORDS: Chromium, Logic, Etching, Dry etching, Photomasks, Scanning electron microscopy, Image processing, Photoresist processing, Inspection, Atomic force microscopy

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Investigation of sub-pellicle defect formation at KrF lithography

Junsik Lee, Dong Wook Lee, Mun-Sik Kim, Ho-Yong Jung, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557703

KEYWORDS: Pellicles, Ions, Photomasks, Reticles, Adhesives, Inspection, Chemical analysis, Raman spectroscopy, Chromatography, Scanning electron microscopy

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years