Dr. Kazuhiko Omote Profile

Dr. Kazuhiko Omote

Director at Rigaku Corp

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Publications (17)

Proceedings Article | 10 April 2024 Presentation + Paper

Non-destructive investigation for metal structure in 3D flash memory by an ultra-high resolution x-ray microscope

K. Omote, R. Hirose, H. Tsukada, A. Hamaguchi, Y. Yoshitake, K. Yoshino

Proceedings Volume 12955, 129551B (2024) https://doi.org/10.1117/12.3010113

KEYWORDS: X-rays, Microscopes, Metals, X-ray imaging, Reflection, Mirrors, Multilayers, Transmittance, Silicon, Nondestructive evaluation

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Proceedings Article | 27 April 2023 Poster + Paper

Precise 3D profile measurement of high aspect ratio device patterns by small-angle x-ray scattering

R. Suenaga, Y. Ito, T. Goto, K. Omote

Proceedings Volume 12496, 124962A (2023) https://doi.org/10.1117/12.2657063

KEYWORDS: Tin, X-rays, Scattering, Transmission electron microscopy, Semiconducting wafers, 3D modeling, X-ray detectors, 3D metrology, Silicon, Film thickness

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Proceedings Article | 27 April 2023 Poster + Paper

Determination of deep hole structure for advanced semiconductor devices analyzed by transmission x-ray scattering

T. Goto, Y. Ito, R. Suenaga, K. Omote

Proceedings Volume 12496, 124962W (2023) https://doi.org/10.1117/12.2658129

KEYWORDS: Scattering, X-rays, Semiconducting wafers, Semiconductors, Etching, Critical dimension metrology, Process control, X-ray technology, Metrology

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Proceedings Article | 1 August 2021 Presentation

Image-based wavefront measurement for full-field x-ray microscopy

Yuto Tanaka, Satoshi Matsuyama, Takato Inoue, Nami Nakamura, Jumpei Yamada, Yoshiki Kohmura, Makina Yabashi, Kazuhiko Omote, Tetsuya Ishikawa, Kazuto Yamauchi

Proceedings Volume 11839, 118390A (2021) https://doi.org/10.1117/12.2595026

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Proceedings Article | 22 September 2020 Poster + Presentation

Measurement of cross-sectional profile for sub-15nm hp LS patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Eiji Yamanaka, Yoshiyasu Ito, Kiyoshi Ogata, Kazuhiko Omote, Naoya Hayashi

Proceedings Volume 11518, 1151810 (2020) https://doi.org/10.1117/12.2572462

KEYWORDS: Nanoimprint lithography, X-rays, Scattering, Scatter measurement, Quartz, Lithography, Semiconductors, Optical lithography, Semiconducting wafers, Photomasks

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Proceedings Article | 9 September 2019 Presentation

Development of high-resolution full-field x-ray microscope based on multilayer advanced Kirkpatrick-Baez mirrors (Conference Presentation)

Satoshi Matsuyama, Jumpei Yamada, Taku Hagiwara, Kazuhiko Omote, Raita Hirose, Yoshihiro Takeda, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

Proceedings Volume 11112, 1111207 (2019) https://doi.org/10.1117/12.2528366

KEYWORDS: Mirrors, X-rays, Microscopes, Spatial resolution, X-ray optics, Objectives, Cameras, Stars

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Proceedings Article | 19 April 2019 Paper

Throughput improvement method for cross-sectional profile measurement of hole patterns in nanoimprint templates

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Takashi Hirano, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10810, 1081010 (2019) https://doi.org/10.1117/12.2503252

KEYWORDS: Nanoimprint lithography, X-rays, Quartz, Diffraction, Scattering, Nanostructures, Scanning electron microscopy, Time metrology, Transmission electron microscopy, X-ray detectors

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Proceedings Article | 16 October 2017 Presentation + Paper

The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10451, 104510H (2017) https://doi.org/10.1117/12.2284761

KEYWORDS: X-rays, Nanoimprint lithography, Scattering, Quartz, 3D metrology, Critical dimension metrology, 3D acquisition, Scanning electron microscopy, Nanostructures, Ultraviolet radiation

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Proceedings Article | 13 July 2017 Paper

The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10454, 104540Y (2017) https://doi.org/10.1117/12.2280686

KEYWORDS: Nanoimprint lithography, X-rays, Scattering, Quartz, 3D metrology, Scanning electron microscopy, Transmission electron microscopy, Nanostructures, Critical dimension metrology, 3D modeling

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Proceedings Article | 18 May 2016 Paper

The measurement capabilities of cross-sectional profile of Nanoimprint template pattern using small angle x-ray scattering

Eiji Yamanaka, Rikiya Taniguchi, Masamitsu Itoh, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 9984, 99840V (2016) https://doi.org/10.1117/12.2246570

KEYWORDS: Diffraction, Nanoimprint lithography, Quartz, X-rays, Transmission electron microscopy, Scattering, Semiconducting wafers, Lithography, Nondestructive evaluation, Nanostructures

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Nanoimprint lithography (NIL) is one of the most potential candidates for the next generation lithography for semiconductor. It will achieve the lithography with high resolution and low cost. High resolution of NIL will be determined by a high definition template. Nanoimprint lithography will faithfully transfer the pattern of NIL template to the wafer. Cross-sectional profile of the template pattern will greatly affect the resist profile on the wafer. Therefore, the management of the cross-sectional profile is essential. Grazing incidence small angle x-ray scattering (GI-SAXS) technique has been proposed as one of the method for measuring cross-sectional profile of periodic nanostructure pattern. Incident x-rays are irradiated to the sample surface with very low glancing angle. It is close to the critical angle of the total reflection of the x-ray. The scattered x-rays from the surface structure are detected on a two-dimensional detector. The observed intensity is discrete in the horizontal (2θ) direction. It is due to the periodicity of the structure, and diffraction is observed only when the diffraction condition is satisfied. In the vertical (β) direction, the diffraction intensity pattern shows interference fringes reflected to height and shape of the structure. Features of the measurement using x-ray are that the optical constant for the materials are well known, and it is possible to calculate a specific diffraction intensity pattern based on a certain model of the cross-sectional profile. The surface structure is estimated by to collate the calculated diffraction intensity pattern that sequentially while changing the model parameters with the measured diffraction intensity pattern. Furthermore, GI-SAXS technique can be measured an object in a non-destructive. It suggests the potential to be an effective tool for product quality assurance. We have developed a cross-sectional profile measurement of quartz template pattern using GI-SAXS technique. In this report, we will report the measurement capabilities of GI-SAXS technique as a cross-sectional profile measurement tool of NIL quartz template pattern.

Proceedings Article | 21 April 2016 Paper

Characterization of cross-sectional profile of resist L/S and hole pattern using CD-SAXS

Y. Ito, A. Higuchi, K. Omote

Proceedings Volume 9778, 97780L (2016) https://doi.org/10.1117/12.2218983

KEYWORDS: Diffraction, Scanning electron microscopy, Metrology, X-rays, Critical dimension metrology, Electron microscopes, Semiconducting wafers, Fringe analysis, Semiconductors, Electron beams, Scattering, Photoresist materials, X-ray diffraction, Nanostructures, Reflection

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Proceedings Article | 2 April 2010 Paper

Calibration of 25-nm pitch grating reference by high-resolution grazing incidence x-ray diffraction

Yoshiyasu Ito, Kazuhiko Omote, Yuko Okazaki, Yoshinori Nakayama, Hiroki Kawada

Proceedings Volume 7638, 763810 (2010) https://doi.org/10.1117/12.846519

KEYWORDS: Diffraction gratings, Diffraction, Calibration, X-rays, Deep ultraviolet, X-ray diffraction, Grazing incidence, Copper, Laser systems engineering, Silicon

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Proceedings Article | 2 April 2010 Paper

A new x-ray metrology for determining cross-sectional profile of semiconductor device pattern

Kazuhiko Omote, Yoshiyasu Ito, Yuko Okazaki

Proceedings Volume 7638, 763811 (2010) https://doi.org/10.1117/12.846515

KEYWORDS: X-rays, Diffraction, Metrology, Diffraction gratings, X-ray diffraction, Scattering, Semiconductors, Reflection, Transmission electron microscopy, Grazing incidence

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Proceedings Article | 2 April 2010 Paper

Characterization of cross sectional profile of nanostructure line grating using small angle x-ray scattering

Y. Ishibashi, T. Koike, Y. Yamazaki, Y. Ito, Y. Okazaki, K. Omote

Proceedings Volume 7638, 763812 (2010) https://doi.org/10.1117/12.848193

KEYWORDS: Transmission electron microscopy, X-rays, Silicon, Metrology, Critical dimension metrology, Diffraction, Scattering, Nondestructive evaluation, Nanostructures, Reflection

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Proceedings Article | 23 September 2009 Paper

A new x-ray metrology for profiling nanostructures of patterned media

Kazuhiko Omote, Yoshiyasu Ito, Yuko Okazaki, Yuichi Kokaku

Proceedings Volume 7488, 74881T (2009) https://doi.org/10.1117/12.833504

KEYWORDS: X-rays, Scattering, Diffraction, Metrology, X-ray diffraction, Profiling, Nanostructures, Reflection, Magnetism, Scanning electron microscopy

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Proceedings Article | 17 May 2000 Paper

Convergent-beam parallel detection x-ray diffraction system for characterizing combinatorial epitaxial thin films

Kazuhiko Omote, T. Kikuchi, J. Harada, Masashi Kawasaki, Akira Ohtomo, M. Ohtani, Tsuyoshi Ohnishi, Daisuke Komiyama, Hideomi Koinuma

Proceedings Volume 3941, (2000) https://doi.org/10.1117/12.385416

KEYWORDS: Thin films, X-ray diffraction, Sensors, Superlattices, Reflection, Spatial resolution, X-rays, Diffraction, Crystals, Reflectivity

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Proceedings Article | 30 December 1999 Paper

High-resolution thickness measurements and evaluation of a photomask blank

Teruyoshi Hirano, Ryuji Matsuo, Kozue Tomiyama, Ichiro Yazawa, Hiroshi Wada, Masao Otaki, Kazuhiko Omote

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373351

KEYWORDS: Photomasks, X-rays, Reflectivity, Scanning electron microscopy, X-ray technology, Interfaces, Chromium, Scattering, Etching, Sputter deposition

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Showing 5 of 17 publications

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