Mr. Kazumasa Endo Profile

Kazumasa Endo

at Nikon Tsubasa Inc

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Author

Publications (3)

Proceedings Article | 2 April 2010 Paper

New measurement technology for CD and pattern profile variation using optical Fourier space

Fuminori Hayano, Akitoshi Kawai, Toshio Uchikawa, Kazumasa Endo, Kiminori Yoshino, Yuuichiro Yamazaki, Kuniharu Nagashima, Kenji Tsuchiya

Proceedings Volume 7638, 76380E (2010) https://doi.org/10.1117/12.846336

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Birefringence, Reflectivity, Photoresist materials, Polarization, Objectives, Astronomical imaging, Semiconductors

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Proceedings Article | 23 March 2009 Paper

New inspection technology for hole pattern by Fourier space on hp 4x-nm generation

Akitoshi Kawai, Fuminori Hayano, Kazumasa Endo, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 7272, 727219 (2009) https://doi.org/10.1117/12.814046

KEYWORDS: Diffraction, Semiconducting wafers, Critical dimension metrology, Inspection, Optical simulations, Wafer testing, Wafer-level optics, Polarization, Birefringence

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Proceedings Article | 5 April 2007 Paper

Novel technology of automatic macro inspection for 32-nm node and best focus detection

Kazuhiko Fukazawa, Kazumasa Endo, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 6518, 65182H (2007) https://doi.org/10.1117/12.711410

KEYWORDS: Inspection, Semiconducting wafers, Line edge roughness, Birefringence, Finite-difference time-domain method, Phase shifts, Polarization, Scanning electron microscopy, Image processing, Mirrors

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