Dr. Kazumasa Okamoto
Assistant Professor at The Institute of Scientific and Industrial Research
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 9 April 2024 Poster + Paper
Proceedings Volume 12957, 129572F (2024) https://doi.org/10.1117/12.3025195
KEYWORDS: Extreme ultraviolet lithography, Lithography, Metals, Annealing, Extreme ultraviolet, Etching, Reactive ion etching, Particles, Miniaturization, Design

Proceedings Article | 22 February 2021 Poster + Presentation
Proceedings Volume 11612, 116120Y (2021) https://doi.org/10.1117/12.2584016
KEYWORDS: Chromium, Electron beam lithography, Photomasks, Silicon, Semiconducting wafers, Line width roughness, Glasses, Electron beams, Quartz, Lithography

Proceedings Article | 20 September 2020 Presentation
Proceedings Volume 11518, 115180D (2020) https://doi.org/10.1117/12.2574963
KEYWORDS: Line width roughness, Electron beam lithography, Chemically amplified resists, Photomasks, Electron beams, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Electronic components

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11326, 113260D (2020) https://doi.org/10.1117/12.2551865
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Electron beam lithography, Polymers, Lithography, Line width roughness, FT-IR spectroscopy, Ionization

Proceedings Article | 23 March 2020 Presentation + Paper
Y. Ikari, K. Okamoto, N. Maeda, A. Konda, T. Kozawa, T. Tamura
Proceedings Volume 11326, 113260G (2020) https://doi.org/10.1117/12.2551825
KEYWORDS: Polymers, Monte Carlo methods, Absorption, Chemically amplified resists, Photomasks, Temperature metrology, Ions, Lithography, Image processing, Semiconductors

Proceedings Article | 9 July 2015 Paper
Naoya Nomura, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki
Proceedings Volume 9658, 96581C (2015) https://doi.org/10.1117/12.2193060
KEYWORDS: Fluorine, Extreme ultraviolet, Polymers, Chemical species, Extreme ultraviolet lithography, Absorption, Radiation effects, Lithography, Chemical reactions, Ions

Proceedings Article | 27 March 2014 Paper
Toshihiko Susa, Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki
Proceedings Volume 9051, 90511O (2014) https://doi.org/10.1117/12.2045881
KEYWORDS: Absorption, Polymers, Extreme ultraviolet, Oxygen, Molecules, Lithography, Chemically amplified resists, Hydrogen, Scientific research, Electron beams

Proceedings Article | 27 March 2014 Paper
Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki
Proceedings Volume 9051, 90511T (2014) https://doi.org/10.1117/12.2046057
KEYWORDS: Chemically amplified resists, Absorption, Extreme ultraviolet, Lithography, Electron beams, Chromium, Ionization, Solids, Electron beam lithography, Photoresist processing

Proceedings Article | 16 April 2011 Paper
Kazumasa Okamoto, Takahiro Kozawa, Takaki Hatsui, Yasuharu Tajima, Keita Oikawa, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, Takashi Sumiyoshi
Proceedings Volume 7972, 797217 (2011) https://doi.org/10.1117/12.879358
KEYWORDS: Ionization, Extreme ultraviolet, Free electron lasers, Ions, Electrons, Argon, Polymers, Protactinium, Absorption, Extreme ultraviolet lithography

Proceedings Article | 16 April 2011 Paper
Y. Tajima, K. Okamoto, T. Kozawa, S. Tagawa, R. Fujiyoshi, T. Sumiyoshi
Proceedings Volume 7972, 79721N (2011) https://doi.org/10.1117/12.879362
KEYWORDS: Picosecond phenomena, Absorption, Extreme ultraviolet, Polymers, Chemically amplified resists, Lithography, Oscillators, Ionization, Polymethylmethacrylate, Semiconductors

Proceedings Article | 30 March 2010 Paper
Proceedings Volume 7639, 76391K (2010) https://doi.org/10.1117/12.846699
KEYWORDS: Absorption, Solids, Electron beams, Polymers, Extreme ultraviolet lithography, FT-IR spectroscopy, Absorbance, Chromium, Chemically amplified resists, Extreme ultraviolet

Proceedings Article | 2 September 2009 Paper
Masanobu Haraguchi, Kazunori Iuchi, Hidenori Sokabe, Tatsuya Okuno, Toshihiro Okamoto, Masuo Fukui, Kazumasa Okamoto, Seiichi Tagawa
Proceedings Volume 7395, 73950U (2009) https://doi.org/10.1117/12.825789
KEYWORDS: Waveguides, Plasmons, Silver, Wave propagation, Metals, Transmittance, Numerical simulations, Plasmonics, Finite-difference time-domain method, Dielectrics

Proceedings Article | 28 August 2008 Paper
Masanobu Haraguchi, Yosuke Matsuzaki, Tatsuro Tsuzura, Toshihiro Okamoto, Masuo Fukui, Kazumasa Okamoto, Shu Seki, Seiichi Tagawa
Proceedings Volume 7033, 70330V (2008) https://doi.org/10.1117/12.794541
KEYWORDS: Waveguides, Plasmons, Transmittance, Mirrors, Resonators, Plasmonics, Plasmonic waveguides, Fabry–Perot interferometers, Metals, Dielectrics

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 692329 (2008) https://doi.org/10.1117/12.772535
KEYWORDS: Absorption, Chromium, Lithography, Picosecond phenomena, Bioalcohols, Hydrogen, Electron beam lithography, Extreme ultraviolet, Absorbance, Polymers

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69231A (2008) https://doi.org/10.1117/12.772165
KEYWORDS: Chemically amplified resists, Absorption, Polymers, Line edge roughness, Solids, Diffusion, Image quality, Extreme ultraviolet, Photoresist processing, Polymer thin films

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 61533O (2006) https://doi.org/10.1117/12.656262
KEYWORDS: Polymers, Absorption, Electron beams, Ionization, Chemically amplified resists, Ionizing radiation, Picosecond phenomena, Silver, X-rays, Extreme ultraviolet lithography

Proceedings Article | 4 May 2005 Paper
Atsuro Nakano, Kazumasa Okamoto, Yukio Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai, Hiroaki Nemoto, Tsutomu Shimokawa
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.596827
KEYWORDS: Phase modulation, Absorption, Polymers, Image processing, Bioalcohols, Ionizing radiation, Ionization, Electron beams, Absorbance, Chemically amplified resists

Showing 5 of 17 publications
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