Kentaro Matsunaga
Researcher
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 16 April 2011 Paper
Koutarou Sho, Tomoya Oori, Kazunori Iida, Katsutoshi Kobayashi, Keisuke Kikutani, Katsumi Yamamoto, Fumiki Aiso, Kentaro Matsunaga, Eishi Shiobara, Koji Hashimoto
Proceedings Volume 7972, 79720C (2011) https://doi.org/10.1117/12.877616
KEYWORDS: Etching, Photomasks, Lithography, Optical lithography, Semiconductors, Scanning electron microscopy, Photoresist processing, Silica, Double patterning technology, Critical dimension metrology

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 797209 (2011) https://doi.org/10.1117/12.879302
KEYWORDS: Fullerenes, Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Semiconducting wafers, Semiconductors, Etching, Scanning electron microscopy

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691L (2011) https://doi.org/10.1117/12.879333
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Reactive ion etching, Extreme ultraviolet, Lithography, Lithographic illumination, Semiconducting wafers, Yield improvement, Semiconductors, Photoresist processing

Proceedings Article | 5 April 2011 Paper
Yuusuke Tanaka, Kentaro Matsunaga, Shunko Magoshi, Seiichiro Shirai, Kazuo Tawarayama, Hiroyuki Tanaka
Proceedings Volume 7969, 79690Q (2011) https://doi.org/10.1117/12.870332
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Extreme ultraviolet, Wafer-level optics, Modulation, Control systems, Projection systems, Lithography

Proceedings Article | 25 March 2011 Paper
Proceedings Volume 7969, 796905 (2011) https://doi.org/10.1117/12.878432
KEYWORDS: Lithography, Line width roughness, Photoresist processing, Extreme ultraviolet, Extreme ultraviolet lithography, Polymers, Etching, Semiconductors, Manufacturing, Scanning electron microscopy

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76391O (2010) https://doi.org/10.1117/12.846033
KEYWORDS: Polymers, Diffusion, Lithography, Line width roughness, Semiconducting wafers, Polymer thin films, Extreme ultraviolet lithography, Research management, Optical lithography, Photoresist processing

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76390R (2010) https://doi.org/10.1117/12.846429
KEYWORDS: Fullerenes, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Lithography, Semiconductors, Manufacturing, Photoresist processing, Scanning electron microscopy, Etching

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 763633 (2010) https://doi.org/10.1117/12.846073
KEYWORDS: Line width roughness, Photoresist processing, Scanning electron microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Protactinium, Semiconducting wafers, Lithography, Standards development, Cooling systems

Proceedings Article | 23 March 2010 Paper
Yuusuke Tanaka, Hajime Aoyama, Kazuo Tawarayama, Shunko Magoshi, Daisuke Kawamura, Kentaro Matsunaga, Takashi Kamo, Yukiyasu Arisawa, Taiga Uno, Hiroyuki Tanaka, Naofumi Nakamura, Eiichi Soda, Noriaki Oda, Shuichi Saito, Ichiro Mori
Proceedings Volume 7636, 76362D (2010) https://doi.org/10.1117/12.846315
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Metals, Extreme ultraviolet, Semiconducting wafers, Critical dimension metrology, Semiconductors, Anisotropy, Error analysis

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76361N (2010) https://doi.org/10.1117/12.846325
KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Photomasks, Etching, Photoresist processing, Overlay metrology, Lithography, Scanning electron microscopy

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360S (2010) https://doi.org/10.1117/12.846088
KEYWORDS: Extreme ultraviolet lithography, Lithography, Photoresist processing, Line width roughness, Extreme ultraviolet, Manufacturing, Materials processing, Semiconductors, Analytical research, Semiconducting wafers

Proceedings Article | 1 April 2009 Paper
Kentaro Matsunaga, Tomoya Oori, Hirokazu Kato, Eishi Shiobara, Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Yusuke Horiguchi, Tomoya Ohashi, Satoshi Takei, Shinichi Ito
Proceedings Volume 7273, 72734E (2009) https://doi.org/10.1117/12.813647
KEYWORDS: Ultraviolet radiation, Coating, Lithography, Materials processing, Atomic force microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Polymers, Scanning transmission electron microscopy

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 69231E (2008) https://doi.org/10.1117/12.771922
KEYWORDS: Photoresist processing, Line width roughness, Vacuum ultraviolet, Etching, Photomasks, Immersion lithography, Image processing, Lithography, Natural surfaces, Semiconducting wafers

Proceedings Article | 2 April 2007 Paper
Kentaro Matsunaga, Takehiro Kondoh, Hirokazu Kato, Yuuji Kobayashi, Kei Hayasaki, Shinichi Ito, Akira Yoshida, Satoru Shimura, Tetsu Kawasaki, Hideharu Kyoda
Proceedings Volume 6519, 65191T (2007) https://doi.org/10.1117/12.711331
KEYWORDS: Bridges, Semiconducting wafers, Immersion lithography, Lithography, Scanners, 193nm lithography, Structural health monitoring, Digital watermarking, Thin film coatings, Defect inspection

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 61531Q (2006) https://doi.org/10.1117/12.655505
KEYWORDS: Semiconducting wafers, Coating, Immersion lithography, Particles, Inspection, Silicon, Wafer inspection, Wafer testing, Water, Digital watermarking

Proceedings Article | 4 May 2005 Paper
Daisuke Kawamura, Tomoyuki Takeishi, Koutarou Sho, Kentarou Matsunaga, Naofumi Shibata, Kaoru Ozawa, Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, Seiki Ishida, Takayuki Toshima, Yasunobu Oonishi, Shinichi Ito
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599314
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Digital watermarking, Immersion lithography, Silicon, Photoresist processing, Thin film coatings, Coating, Liquids, Water

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535177
KEYWORDS: Reactive ion etching, Lithography, Photomasks, Photoresist processing, Etching, Binary data, Semiconductors, Optical lithography, Lithographic illumination, Line edge roughness

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534975
KEYWORDS: Contamination, Lithography, Polymers, Coating, Transmittance, Adsorption, Contamination control, Critical dimension metrology, Polymer thin films, Spectroscopy

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436896
KEYWORDS: Ear, Semiconducting wafers, Photomasks, Photoresist processing, Lithography, Semiconductors, Image processing, Process control, Critical dimension metrology, Scanning electron microscopy

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312421
KEYWORDS: Edge roughness, Solids, Photography, Excimer lasers, Radium, Laser scanners, 3D scanning, Scanning electron microscopy, Microelectronics, Quenching (fluorescence)

Showing 5 of 21 publications
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