Dr. Kouji Yoshida Profile

Dr. Kouji Yoshida

at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 1 December 2022 Presentation + Paper

Characteristics of fine feature hole templates for nanoimprint lithography toward 2nm and beyond

Koji Ichimura, Koji Yoshida, Hideki Cho, Ryugo Hikichi, Masaaki Kurihara

Proceedings Volume 12293, 122930F (2022) https://doi.org/10.1117/12.2643250

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Overlay metrology, Image processing, Fabrication, Scanning electron microscopy, Semiconductor manufacturing, Quartz, Lithography, Semiconductors

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Proceedings Article | 22 February 2021 Presentation

Nanoimprint template development by new fabrication method and its application

Koji Ichimura, Takaharu Nagai, Kouji Yoshida, Hisayoshi Watanabe, Naoya Hayashi

Proceedings Volume 11610, 116100B (2021) https://doi.org/10.1117/12.2584791

KEYWORDS: Nanoimprint lithography, Lithography, Double patterning technology, Photomasks, Overlay metrology, Fabrication, Ultraviolet radiation, Semiconductors, Semiconducting wafers, Polymers

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SPIE Journal Paper | 5 February 2016

Development of nanoimprint lithography templates toward high-volume manufacturing

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, Naoya Hayashi

JM3, Vol. 15, Issue 02, 021006, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021006

KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

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Proceedings Article | 19 March 2015 Paper

HVM readiness of nanoimprint lithography templates: defects, CD, and overlay

Koji Ichimura, Kouji Yoshida, Saburo Harada, Takaharu Nagai, Masaaki Kurihara, Naoya Hayashi

Proceedings Volume 9423, 94230D (2015) https://doi.org/10.1117/12.2175483

KEYWORDS: Nanoimprint lithography, Distortion, Image processing, Semiconducting wafers, Overlay metrology, Lithography, Etching, High volume manufacturing, Semiconductors, Photomasks

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Proceedings Article | 11 May 2009 Paper

Adhesion control between resist patterns and photomask blank surfaces

Masaaki Kurihara, Sho Hatakeyama, Kouji Yoshida, Takaharu Nagai, Daisuke Totsukawa, Masaharu Fukuda, Yasutaka Morikawa, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi, Hiroyuki Ohtani, Masamichi Fujihira

Proceedings Volume 7379, 73790A (2009) https://doi.org/10.1117/12.824251

KEYWORDS: Chromium, Photomasks, Quartz, Surface roughness, Head-mounted displays, Scanning probe microscopy, Photoresist processing, Interfaces, Atomic force microscopy, Silicon

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Proceedings Article | 19 May 2008 Paper

Optimization of measuring conditions for templates of UV nano imprint lithography

Kouji Yoshida, Kouichirou Kojima, Makoto Abe, Shiho Sasaki, Masaaki Kurihara, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 7028, 70281V (2008) https://doi.org/10.1117/12.793072

KEYWORDS: Scanning electron microscopy, Lithography, Critical dimension metrology, Atomic force microscopy, Metrology, Ultraviolet radiation, Nanoimprint lithography, Image analysis, Semiconducting wafers, Diffusion

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Proceedings Article | 19 May 2008 Paper

Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy

Masaaki Kurihara, Sho Hatakeyama, Kouji Yoshida, Makoto Abe, Daisuke Totsukawa, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 7028, 70282T (2008) https://doi.org/10.1117/12.793099

KEYWORDS: Adhesives, Photomasks, Scanning probe microscopy, Chromium, Head-mounted displays, Quartz, Silicon, Atomic force microscopy, Control systems, Fabrication

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Proceedings Article | 30 October 2007 Paper

Metrology for templates of UV nano imprint lithography

Kouji Yoshida, Kouichirou Kojima, Makoto Abe, Shiho Sasaki, Masaaki Kurihara, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 6730, 67305O (2007) https://doi.org/10.1117/12.746802

KEYWORDS: Metrology, Scanning electron microscopy, Lithography, Spatial frequencies, Scatterometry, Atomic force microscopy, Surface roughness, Reflection, Inspection, Ultraviolet radiation

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Proceedings Article | 20 May 2006 Paper

Optimization of source distribution for half-wavelength DOE

Ryuji Horiguchi, Nobuhito Toyama, Kimio Itoh, Kouji Yoshida, Masaaki Kurihara

Proceedings Volume 6283, 62832U (2006) https://doi.org/10.1117/12.681810

KEYWORDS: Diffractive optical elements, Optical proximity correction, Light sources, Photomasks, Diffraction, Resolution enhancement technologies, Etching, Optical alignment, Data conversion, Lead

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Proceedings Article | 26 April 1996 Paper

Exciton confinement effect in semiconductor quantum wells studied by resonant second harmonic generation

Hiroyuki Ito, Fujio Minami, Kouji Yoshida, Kuon Inoue, Kenji Watanabe

Proceedings Volume 2779, (1996) https://doi.org/10.1117/12.237053

KEYWORDS: Excitons, Second-harmonic generation, Quantum wells, Absorption, Semiconductors, Gallium arsenide, Harmonic generation, Polarization, Luminescence, Nd:YAG lasers

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Showing 5 of 10 publications

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