The research proposal was used the electron-gun evaporation with ion-assisted deposition method to deposit zirconium dioxide (ZrO2) thin films on PET and PC flexible substrates. Then, the finite element method (FEM) with equivalent room temperature (ERT) could simulated the intrinsic stress of these AR multi-layer films. The self-made phase-shifting Moiré interferometer can verify the residual stress of these AR multilayer films. However, a polynomial fixing curvature was used to reduce the simulation error of intrinsic stress low to 1%. The residual stress of AR multilayer films deposited with electron-gun evaporation can be reduced to -279.3MPa.
The research proposal was used tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) as the high and low refractive index for
the multilayer anti-reflection (AR) films were deposited on a flexible polyethylene terephthalate (PET) by electron-beam
evaporator with ion-beam assisted deposition (IAD). The optical and stress properties of these multilayer (Ta2O5/SiO2)2 films
were investigated. A homemade Phase shadow moiré interferometer was used to measure the stresses of single and multilayer
films. The experimental results show the optimal oxygen pressure of Ta2O5 and SiO2 were 8 and 25 sccm, respectively for the
multilayer AR coating with electron-beam evaporator. The residual stress of the multilayer film stacks changed gradually
from tension to compression stresses which +3,167 MPa was for the first layer and -438 MPa for the fourth layer.
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