Kurt R. Kimmel
Principal at HOYA Corp. USA
SPIE Involvement:
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Publications (22)

Proceedings Article | 27 May 2009 Paper
Proceedings Volume 7470, 747004 (2009) https://doi.org/10.1117/12.835795
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Error analysis, Optical lithography, Mask making, Scanners, Extreme ultraviolet, Etching, Critical dimension metrology

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712219 (2008) https://doi.org/10.1117/12.801685
KEYWORDS: Photomasks, Semiconducting wafers, Scanners, Inspection, Wafer inspection, Critical dimension metrology, Printing, Metrology, Manufacturing, Defect inspection

Proceedings Article | 26 March 2008 Paper
Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Sarah McGowan, Uzodinma Okoroanyanwu, Rolf Seltmann, Cyrus Tabery, Anna Tchikoulaeva, Tom Wallow, Obert Wood, John Arnold, Don Canaperi, Matthew Colburn, Kurt Kimmel, Chiew-Seng Koay, Erin Mclellan, Dave Medeiros, Satyavolu Papa Rao, Karen Petrillo, Yunpeng Yin, Hiroyuki Mizuno, Sander Bouten, Michael Crouse, Andre van Dijk, Youri van Dommelen, Judy Galloway, Sang-In Han, Bart Kessels, Brian Lee, Sjoerd Lok, Brian Niekrewicz, Bill Pierson, Robert Routh, Emil Schmit-Weaver, Kevin Cummings, James Word
Proceedings Volume 6921, 69210P (2008) https://doi.org/10.1117/12.772933
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Transistors, Extreme ultraviolet, Optical proximity correction, Photoresist processing, Etching, Metals, Scanners

Proceedings Article | 15 March 2007 Paper
O. Wood, D. Back, R. Brainard, G. Denbeaux, D. Goldfarb, F. Goodwin, J. Hartley, K. Kimmel, C. Koay, B. La Fontaine, J. Mackey, B. Martinick, W. Montgomery, P. Naulleau, U. Okoroanyanwu, K. Petrillo, B. Pierson, M. Tittnich, S. Trogisch, T. Wallow, Y. Wei
Proceedings Volume 6517, 65170U (2007) https://doi.org/10.1117/12.714016
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Photomasks, Contamination, Reflectivity, Microscopes, Image resolution, Manufacturing, Lithography

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601621
KEYWORDS: Polymers, Lithography, Immersion lithography, Materials processing, Semiconducting wafers, Particles, Photoresist materials, Image processing, Photoresist processing, Scanners

Showing 5 of 22 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 17 December 2003

SPIE Conference Volume | 27 December 2002

Conference Committee Involvement (13)
Optical Microlithography XXIII
23 February 2010 | San Jose, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
Showing 5 of 13 Conference Committees
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