Dr. Laurent Dieu Profile

Dr. Laurent Dieu

US Technical Sales & Account Manager at Tekscend Photomask US Inc

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 20 May 2004 Paper

Paper

Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors

Bruno La Fontaine, Adam Pawloski, Yunfei Deng, Christian Chovino, Laurent Dieu, Obert Wood, Harry Levinson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.539074

KEYWORDS: Photomasks, Semiconducting wafers, Reflectors, Binary data, Extreme ultraviolet lithography, Multilayers, Critical dimension metrology, Reticles, Printing, Optical lithography

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Proceedings Article | 17 December 2003 Paper

Paper

193-nm haze contamination: a close relationship between mask and its environment

Eric Johnstone, Laurent Dieu, Christian Chovino, Julio Reyes, Dongsung Hong, Prakash Krishnan, Dianna Coburn, Christian Capella

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518262

KEYWORDS: Photomasks, Air contamination, Contamination, Pellicles, Reticles, Binary data, Glasses, Chemistry, Inspection, Environmental sensing

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Proceedings Article | 17 December 2003 Paper

Paper

Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM

Gim Chen, Julio Reyes, James Wood, Ismail Kashkoush, Laurent Dieu, Richard Novak

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518247

KEYWORDS: Photomasks, Transmittance, Reticles, Chemistry, Photoresist processing, Binary data, Mask cleaning, Reflectivity, Photoresist materials, Particles

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Proceedings Article | 17 December 2003 Paper

Paper

EUV mask making: an approach based on the direct patterning of the EUV reflector

Christian Chovino, Laurent Dieu, Eric Johnstone, Julio Reyes, Bruno La Fontaine, Harry Levinson, Adam Pawloski

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518259

KEYWORDS: Photomasks, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Reflectivity, Inspection, Reflectors, Lithography, Image processing

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Proceedings Article | 17 December 2003 Paper

Paper

Manufacturing of ArF chromeless hard shifter for 65-nm technology

Keun-Taek Park, Laurent Dieu, Greg Hughes, Kent Green, Ebo Croffie, Kunal Taravade

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518252

KEYWORDS: Optical design, Photomasks, Quartz, Etching, Semiconducting wafers, Printing, Critical dimension metrology, Manufacturing, Line edge roughness, Tolerancing

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Proceedings Article | 17 December 2003 Paper

Paper

Influence of antireflection coatings in ArF lithography

Bruno La Fontaine, Adam Pawloski, Alden Acheta, Yunfei Deng, Harry Levinson, Christopher Spence, Christian Chovino, Laurent Dieu, Eric Johnstone, Franklin Kalk

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518220

KEYWORDS: Reticles, Semiconducting wafers, Lithography, Modulation transfer functions, Reflectivity, Spatial frequencies, Critical dimension metrology, Chromium, Antireflective coatings, Scanners

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Proceedings Article | 28 August 2003 Paper

Paper

Semi-aqueous solvent applications for 193-nm EAPSM resist strip

Julio Reyes, Curt Jackson, Laurent Dieu, William Bowers, Russell Stevens

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504265

KEYWORDS: Reflectivity, Photomasks, Scanning probe microscopy, Chlorine, Photoresist processing, Etching, Phase shifts, Fluorine, Contamination, Phase measurement

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Proceedings Article | 28 August 2003 Paper

Paper

UV light with oxygen treatment of phase shift photoblank for phase and transmission control: applicable to MxSi(1-x)OyN(y-1)

Christian Chovino, Laurent Dieu

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504048

KEYWORDS: Reticles, Ultraviolet radiation, Oxygen, Phase shifts, Multilayers, Silicon, Photomasks, Ultraviolet sources, Etching, Chromium

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Proceedings Article | 26 June 2003 Paper

Paper

Mighty high-T lithography for 65-nm generation contacts

Will Conley, Patrick Montgomery, Kevin Lucas, Lloyd Litt, John Maltabes, Laurent Dieu, Gregory Hughes, David Mellenthin, Robert Socha, Eric Fanucchi, Arjan Verhappen, Kurt Wampler, Linda Yu, Erika Schaefer, Shawn Cassel, Jan Kuijten, Wil Pijnenburg, Vincent Wiaux, Geert Vandenberghe

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485499

KEYWORDS: Photomasks, Lithography, Inspection, Reticles, Optical lithography, Lithographic illumination, Binary data, Manufacturing, 193nm lithography, Semiconducting wafers

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Proceedings Article | 27 December 2002 Paper

Paper

Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node

Laurent Dieu, Eric Fanucchi, Greg Hughes, John Maltabes, David Mellenthin, Will Conley, Lloyd Litt, Kevin Lucas, Robert Socha, Kurt Wampler, Arjan Verhappen, Jan-Pieter Kiujten

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467783

KEYWORDS: Reticles, Inspection, Multilayers, Tin, Manufacturing, Lithography, Etching, Photomasks, Process control, Transmittance

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Proceedings Article | 5 September 2001 Paper

Paper

Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography

Kyung-Han Nam, Lee-Ju Kim, Hyoung-Sup Jeong, Sang Lee, In-Soo Lee, Cheol Shin, Hong-Seok Kim, L. Dieu, Seung-Weon Paek, Sang-Sool Koo, Sang-Man Bae, Young-Mog Ham, Ki-Soo Shin

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438396

KEYWORDS: Photomasks, Lithography, Mask making, Semiconducting wafers, Phase shifts, Dry etching, Scanning electron microscopy, Electroluminescence, 193nm lithography, Photoresist processing

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Proceedings Article | 22 January 2001 Paper

Paper

Ion-beam sputter-deposited SiN/TiN attenuating phase-shift photoblanks

Laurent Dieu, Peter Carcia, Hideaki Mitsui, Kunihiko Ueno

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410762

KEYWORDS: Multilayers, Tin, Ion beams, Photomasks, Phase shifts, Etching, Sputter deposition, Transmittance, Dry etching, Chemical analysis

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Proceedings Article | 30 June 1999 Paper

Paper

Optical superlattices as phase-shift masks for microlithography

Peter Carcia, Roger French, Gillian Reynolds, Greg Hughes, Charlie Torardi, M. Reilly, M. Lemon, C. Miao, David Jones, L. Wilson, Laurent Dieu

Proceedings Volume 3790, (1999) https://doi.org/10.1117/12.351257

KEYWORDS: Photomasks, Etching, Multilayers, Optical lithography, Quartz, Chromium, Transmittance, Superlattices, Optical properties, Reactive ion etching

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Showing 5 of 13 publications

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