Methods of generating various illumination patterns remain as an attractive and important micro-optics research area for the development of resolution enhancement in advanced lithography system. In the current illumination system of lithography machine, off-axis illumination is widely used as an effective approach to enhance the resolution and increase the depth of focus (DOF). This paper proposes a novel illumination mode generation unit, which transform conventional mode to double annular shaped radial polarized (DARP) mode for improving the resolution of micro-lithography. Through LightToolsTM software simulation, double annular shaped mode is obtained from the proposed generation unit. The mathematical expressions of the radius variation of inner and outer rings are deduced. The impacts of conventional and dual concentric annular illumination pattern on critical dimension uniformity were simulated on an isolated line, square hole and corner. Lithography performance was compared between DARP illumination mode and corresponding single annular modes under critical dimension of 45nm. As a result, DARP illumination mode can improve the uniformity of aerial image at 45nm node through pitch varied in 300-500 nm to a certain extent.
A polarization phase shifting lateral shearing interferometer based on a polarization beam
splitting plate(PBSP) is proposed. The front surface of the PBSP is coated with polarization beam
splitting film and its back surface is coated with total reflection film. The beam to be tested is split by
the PBSP with an incidence angle of 45° and divided into two mutually perpendicular linearly
polarization beams. Phase shifting can be introduced to the interferometer when the PBSP is combined
with a polarzation temporal or spatial phase shifter. A polarizaiton temporal phase shifting lateral
shearing interferometer system is built up both with the ASAP software and the experiments. The
usefulness of the interferometer is verified.
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