Dr. Lin-Hung Shiu Profile

Dr. Lin-Hung Shiu

Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd

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Author

Publications (11)

Proceedings Article | 27 March 2007 Paper

Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

Fu-Jye Liang, Hsing Chang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn J. Lin

Proceedings Volume 6520, 65204U (2007) https://doi.org/10.1117/12.712531

KEYWORDS: Semiconducting wafers, Scanners, Digital watermarking, Particles, Superposition, Microfluidics, Printing, Computer simulations, System identification, Immersion lithography

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Proceedings Article | 26 March 2007 Paper

Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Lin-Hung Shiu, Fu-Jye Liang, Hsing Chang, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6520, 652012 (2007) https://doi.org/10.1117/12.712527

KEYWORDS: Particles, Semiconducting wafers, Scanning electron microscopy, Digital watermarking, Printing, Defect inspection, Polymers, Immersion lithography, Neodymium, Wafer-level optics

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SPIE Journal Paper | 1 January 2007 Open Access

Defect reduction with special routing for immersion lithography

Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

JM3, Vol. 6, Issue 01, 010501, (January 2007) https://doi.org/10.1117/12.10.1117/1.2718941

KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

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Proceedings Article | 12 May 2005 Paper

Characterization of ArF immersion process for production

Jeng-Horng Chen, Li-Jui Chen, Tun-Ying Fang, Tzung-Chi Fu, Lin-Hung Shiu, Yao-Te Huang, Norman Chen, Da-Chun Oweyang, Ming-Che Wu, Shih-Che Wang, John Lin, Chun-Kuang Chen, Wei-Ming Chen, Tsai-Sheng Gau, Burn Lin, Richard Moerman, Wendy Gehoel-van Ansem, Eddy van der Heijden, Fred de Jong, Dorothe Oorschot, Herman Boom, Martin Hoogendorp, Christian Wagner, Bert Koek

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602025

KEYWORDS: Semiconducting wafers, Scanners, Immersion lithography, Particles, Lithography, Overlay metrology, Prototyping, Microfluidics, Water, Finite element methods

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Proceedings Article | 12 May 2005 Paper

Mask polarization effects in hyper NA systems

Chun-Kuang Chen, Tsai-Sheng Gau, Lin-Hung Shiu, Burn Lin

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602032

KEYWORDS: Polarization, Photomasks, Diffraction, Optical lithography, Image acquisition, Semiconducting wafers, Projection systems, Immersion lithography, Computer simulations, Lenses

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Proceedings Article | 20 August 2004 Paper

Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Shuo-Yen Chou, Jaw-Jung Shin, King-Chang Shu, Jan-Wen You, Lin-Hung Shiu, Bin-Chang Chang, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557745

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Laser energy, Image processing, Electron beam lithography, Semiconducting wafers, Optical simulations, Optical proximity correction, Convolution

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Proceedings Article | 28 May 2004 Paper

Study of line edge roughness using continuous wavelet transform for 65-nm node

Lin-Hung Shiu, Chun-Kuang Chen, Tsai-Sheng Gau, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536649

KEYWORDS: Line edge roughness, Critical dimension metrology, Lithography, Continuous wavelet transforms, Photoresist processing, Image processing, Optical lithography, Polymers, Photomasks, Modulation

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Proceedings Article | 24 July 2002 Paper

70-nm contact hole pattern with shrink technology

Lin-Hung Shiu

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474267

KEYWORDS: Scanning electron microscopy, Lithography, Photoresist processing, Critical dimension metrology, Photomasks, Process control, 193nm lithography, Thermal effects, Resolution enhancement technologies, Phase shifts

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Proceedings Article | 14 September 2001 Paper

Optimal positions for SB assignment and the specification of SB width variation

Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau, Fu-Jye Liang, Shuo-Yen Chou, Lin-Hung Shiu

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435683

KEYWORDS: Antimony, Scattering, Critical dimension metrology, Double sideband modulation, Resolution enhancement technologies, Modulation, Superposition, Light scattering, Chromium, Photoresist processing

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Proceedings Article | 14 September 2001 Paper

Lithography challenges of dual-damascence process in 0.13 um era

Li-Jui Chen, Lin-Hung Shiu, Chern-Shyan Tsai, Ching-Hsu Chang, Tsung-Kuei Kang, Shuo-Yen Chou

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435791

KEYWORDS: Reflectivity, Etching, Image processing, Lithography, Photoresist processing, Optical lithography, Critical dimension metrology, Coating, Polymers, Dielectrics

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Proceedings Article | 24 August 2001 Paper

Novel negative photoresist process for 0.18 um dual damascene

Lin-Hung Shiu, Chih-Ming Lai, Fu-Jye Liang, Hung-Chun Chen, Li-Jui Chen, Shuo-Yen Chou

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436891

KEYWORDS: Photoresist processing, Scanning electron microscopy, Etching, Copper, Resolution enhancement technologies, Bottom antireflective coatings, Photomasks, Photoresist materials, Phase shifts, Aluminum

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Showing 5 of 11 publications

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