Microchannel plate (MCP) is an important charged particle electronic multiplier. Usually, electrons as the charged particles entered the input-end and strike the inner wall of the microchannel, producing an electron multiplication. Once the input particles changed into high-energy ions, colliding and sputtering effects would occur in the secondary electron multiplication generation processing of directly bombard on the microchannel plate. A poor ion bombardment-resistance property became the main bottleneck for the detection of high-energy ions of microchannel plate. In this paper, the (SrO, ZrO2) doped lead-silicate glass was as the cladding glass of microchannel plate and explored in the ion bombardment-resistant properties. Argon/cesium ion gun and laser confocal microscope were applied to investigate the ion etching and etching surface morphology of the lead-silicate glass microchannel plate, respectively. It impacted that (SrO, ZrO2) doped lead-silicate glass certainly benefited the ion-bombardment resistance of the MCP.
Microchannel plate (MCP) is an important potential readout device for cryogenic quantum computing, especially for the quantum computation based on floating electrons of liquid helium surface. The signal readout time is a primary property of quantum computing, which is grounded in and proportional to the bulk resistance of the MCP multiplier. Notwithstanding, the bulk resistance of the MCP multiplier became giant at cryogenic temperature for the property of huge negative temperature coefficient of resistance, almost 105 Gohm at 20K~30K, resulting in a readout time of 10-2-1s at cryogenic temperature. That was one of the major bottlenecks for the cryogenic quantum computing application of MCPs. In this paper, ruthenium oxide films were sol-gel deposited onto the lead-bismuth-silicate glass, one kind of the base material for MCPs, produced by the Research and Development Center of Microchannel Plate, China Building Materials Academy. Surface topographic properties of the film were investigated with a laser scanning confocal microscope (LSCM). The hybrid bulk-resistance of RuO2 film deposited glass was measured in a modified Vacuum Photoelectron Imaging Test Facility (VPIT). It indicated that the sol-gel deposited RuO2 film could decrease the bulk resistance of hydrogen-reduced lead-bismuth-silicate glass and effectively mitigate its giant thermal resistance. This research can give a significant reference for developing MCP detectors in cryogenic quantum computing applications.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.