Dr. Mun Ja Kim Profile

Dr. Mun Ja Kim

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 16 October 2017 Presentation

EUV mask readiness for HVM (Conference Presentation)

Heebom Kim, Chang Young Jeong, Donggun Lee, Ji Hoon Na, Hwan-Seok Seo, Mun Ja Kim, Sung-Won Kwon, Chan-Uk Jeon

Proceedings Volume 10451, 104510I (2017) https://doi.org/10.1117/12.2280687

KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Inspection, Extreme ultraviolet lithography, High volume manufacturing, Scanners, Transmittance

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Proceedings Article | 18 March 2016 Paper

Study of nanometer-thick graphite film for high-power EUVL pellicle

Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, Ji-Beom Yoo

Proceedings Volume 9776, 97761Z (2016) https://doi.org/10.1117/12.2218228

KEYWORDS: Extreme ultraviolet lithography, Pellicles, Silicon, Extreme ultraviolet, Graphene, Crystals, Transmittance, Silicon films, Thin films, Lithography, Hydrogen, Infrared lasers, Thermography

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Proceedings Article | 17 April 2014 Paper

Aerial image deformation caused by various defects of EUV pellicles

Sung-Gyu Lee, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482V (2014) https://doi.org/10.1117/12.2046623

KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Ruthenium, Lithography, Carbon, Computer simulations

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Proceedings Article | 17 April 2014 Paper

Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482D (2014) https://doi.org/10.1117/12.2046202

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

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Proceedings Article | 18 March 2014 Paper

Effect of defects on extreme ultraviolet pellicle

In-Seon Kim, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seong-Sue Kim, Ji-Won Kim, Hye-Keun Oh

Proceedings Volume 9048, 90482A (2014) https://doi.org/10.1117/12.2046171

KEYWORDS: Pellicles, Contamination, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Carbon, Extreme ultraviolet, Lithography, Absorption, Silicon

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Proceedings Article | 14 October 2011 Paper

30nm full field quartz template replicated from Si master for FLASH active layer NIL

Duhyun Lee, Byung-Kyu Lee, Woong Ko, Jae-Kwan Kim, Kiyeon Yang, Byounghoon Seung, Ilyong Jang, Mun Ja Kim, Byunggook Kim, ChangMin Park, Jeongho Yeo, Changyoul Moon

Proceedings Volume 8166, 81661U (2011) https://doi.org/10.1117/12.898747

KEYWORDS: Quartz, Silicon, Etching, Nanoimprint lithography, Chromium, Oxides, Photomasks, Line width roughness, Electron beam lithography, Semiconducting wafers

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Showing 5 of 6 publications

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