Mr. Maciej W. Rudzinski Profile

Maciej W. Rudzinski

Sr. Applications Dev Engineer at Photronics Inc

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Author

Publications (13)

Proceedings Article | 30 September 2009 Paper

Critical dimension uniformity using reticle inspection tool

Mark Wylie, Trent Hutchinson, Gang Pan, Thomas Vavul, John Miller, Aditya Dayal, Carl Hess, Mike Green, Shad Hedges, Dan Chalom, Maciej Rudzinski, Craig Wood, Jeff McMurran

Proceedings Volume 7488, 74881O (2009) https://doi.org/10.1117/12.830148

KEYWORDS: Photomasks, Reticles, Scanning electron microscopy, Critical dimension metrology, Inspection, Manufacturing, Etching, Error analysis, Semiconducting wafers, Binary data

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Proceedings Article | 28 May 2004 Paper

Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

W. Shieh, William Chou, Chuen-Huei Yang, J. Wu, Noah Chen, Shih Yen, Tony Hsu, Steve Tuan, Doris Chang, Maciej Rudzinski, Lantian Wang, Kong Son

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544243

KEYWORDS: Semiconducting wafers, Reticles, Inspection, Photomasks, Lithography, Wafer inspection, Resolution enhancement technologies, Scanning electron microscopy, Manufacturing, Critical dimension metrology

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Proceedings Article | 17 December 2003 Paper

Phase-enhanced DUV inspection of alternating phase-shift reticles

Larry Zurbrick, Maciej Rudzinski, Long He, Kurt Kimmel, Alvina Williams

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518143

KEYWORDS: Inspection, Reticles, Defect detection, Manufacturing, Photomasks, Deep ultraviolet, Phase contrast, Quartz, Computer aided design, Phase shifts

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Proceedings Article | 28 May 2003 Paper

Inspection of alternating phase-shift masks through the use of phase contrast techniques

Larry Zurbrick, Maciej Rudzinski, Stanley Stokowski, Long He, Kurt Kimmel, Nishrin Kashwala

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515102

KEYWORDS: Inspection, Quartz, Defect detection, Phase contrast, Photomasks, Etching, Lithography, Detection and tracking algorithms, Phase shift keying, Phase shifts

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Proceedings Article | 28 May 2003 Paper

Extending TeraStar reticle inspection capability to the 90-nm node through layer-specific algorithms

Maciej Rudzinski, Hector Garcia, William Volk, Lantian Wang

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515100

KEYWORDS: Inspection, Reticles, Defect detection, Lithography, Algorithm development, Contamination, Databases, Phase shifts, Defect inspection, Photomasks

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Proceedings Article | 27 December 2002 Paper

Alternating phase-shift mask inspection through the use of phase contrast enhancement techniques

Larry Zurbrick, Maciej Rudzinski, Stanley Stokowski, Long He, Kurt Kimmel, Nishrin Kashwala

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468086

KEYWORDS: Inspection, Quartz, Defect detection, Photomasks, Phase contrast, Lithography, Etching, Manufacturing, Binary data, Phase shifts

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Proceedings Article | 1 August 2002 Paper

Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476919

KEYWORDS: Inspection, Phase shift keying, Defect detection, Phase shifts, Photomasks, Defect inspection, Detection and tracking algorithms, Algorithm development, Quartz, Etching

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Proceedings Article | 11 March 2002 Paper

New approaches to alternating phase-shift mask inspection

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458285

KEYWORDS: Inspection, Phase shifts, Photomasks, Defect detection, Reticles, Etching, Quartz, Algorithm development, Image transmission, Semiconducting wafers

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Proceedings Article | 9 April 2001 Paper

Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm

Larry Zurbrick, David Emery, Maciej Rudzinski, Mark Wihl, Michel Prudhomme, Christian Crell, Uwe Griesinger, Manuel Vorwerk, Mario Hennig

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425092

KEYWORDS: Inspection, Phase shifts, Defect detection, Reticles, Algorithm development, Photomasks, Detection and tracking algorithms, Defect inspection, Contamination, Signal detection

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Proceedings Article | 30 December 1999 Paper

High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles

Lars Liebmann, Scott Mansfield, Alfred Wong, Jacek Smolinski, Song Peng, Kurt Kimmel, Maciej Rudzinski, James Wiley, Larry Zurbrick

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373310

KEYWORDS: Reticles, Inspection, Photomasks, Quartz, Defect inspection, Manufacturing, Binary data, Etching, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 25 August 1999 Paper

Reticle OPC defect printability and detectability for 180-nm technology

Maciej Rudzinski, Larry Zurbrick, Donald Pettibone, Mohan Ananth

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360249

KEYWORDS: Semiconducting wafers, Reticles, Optical proximity correction, Inspection, Defect detection, Critical dimension metrology, Scanning electron microscopy, Photomasks, Deep ultraviolet, Databases

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Proceedings Article | 14 June 1999 Paper

Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Donald Pettibone, Mohan Ananth, Maciej Rudzinski, Sterling Watson, Larry Zurbrick, Hua-Yu Liu, Linard Karklin

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350857

KEYWORDS: Reticles, Semiconducting wafers, Scanning electron microscopy, Optical inspection, Cadmium sulfide, Photomasks, Wafer-level optics, Inspection, 3D modeling, Manufacturing

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Proceedings Article | 1 June 1992 Paper

Improving stepper alignment capability through phase-shifting techniques

Mircea Dusa, Maciej Rudzinski

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130321

KEYWORDS: Optical alignment, Phase shifts, Etching, Silicon, Diffraction, Semiconducting wafers, Diffraction gratings, Sensors, Fringe analysis, Optical lithography

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Showing 5 of 13 publications

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