Mr. Maharshi Chauhan Profile

Maharshi Chauhan

at NXP Semiconductors

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Publications (1)

Proceedings Article | 24 August 2001 Paper

High resolution patterning in chemically amplified resists: the effect of film thickness

David Medeiros, Wayne Moreau, Karen Petrillo, Maharshi Chauhan, Wu-Song Huang, Christopher Magg, Dario Goldfarb, Marie Angelopoulos, Paul Nealey

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436853

KEYWORDS: Electron beam lithography, Electron beams, Scanning electron microscopy, Deep ultraviolet, Semiconducting wafers, Photomicroscopy, Chemically amplified resists, Thin films, Silicon, Modulation

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