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Marshall Overcast
Photolithography Strategic Equipment & Process at Texas Instruments
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Publications (1)
Proceedings Article | 13 March 2018 Presentation + Paper
Understanding overlay signatures using machine learning on non-lithography context information
Marshall Overcast, Corey Mellegaard, David Daniel, Boris Habets, Georg Erley, Steffen Guhlemann, Xaver Thrun, Stefan Buhl, Steven Tottewitz
Proceedings Volume 10585, 105851U (2018) https://doi.org/10.1117/12.2303487
KEYWORDS: Semiconducting wafers, Overlay metrology, Etching, Machine learning, Optical alignment, Error analysis, Metrology, Lithography, Data processing, Semiconductors
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