Dr. Masamitsu Shirai Profile

Dr. Masamitsu Shirai

Emeritus Professor at Osaka Metropolitan Univ

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Author

Publications (17)

Proceedings Article | 19 March 2012 Paper

Diffusion of acid from resist to Si-hardmask layer

Masamitsu Shirai, Hiroki Takeda, Tatsuya Hatsuse, Haruyuki Okamura, Hiroyuki Wakayama, Makoto Nakajima

Proceedings Volume 8325, 83251L (2012) https://doi.org/10.1117/12.915935

KEYWORDS: Diffusion, Silicon, Photoresist processing, Semiconducting wafers, Optical lithography, FT-IR spectroscopy, Polymers, Interfaces, Industrial chemicals, Bottom antireflective coatings

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Proceedings Article | 16 April 2011 Paper

EUV negative-resist based on thiol-yne system

Masamitsu Shirai, Koichi Maki, Haruyuki Okamura, Koji Kaneyama, Toshiro Itani

Proceedings Volume 7972, 79721E (2011) https://doi.org/10.1117/12.879037

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Manganese, Line width roughness, Thin film coatings, Diffusion, Line edge roughness, Standards development, Silicon

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Proceedings Article | 16 April 2011 Paper

Diffusion of amines from resist to BARC layer

Masamitsu Shirai, Tatsuya Hatsuse, Haruyuki Okamura, Shigeo Kimura, Yasuyuki Nakajima

Proceedings Volume 7972, 79721O (2011) https://doi.org/10.1117/12.879039

KEYWORDS: Diffusion, Silicon, Photoresist processing, Polymers, Semiconducting wafers, Bottom antireflective coatings, Reflectivity, Optical lithography, Chemically amplified resists, Image processing

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Proceedings Article | 30 March 2010 Paper

Highly sensitive EUV-resist based on thiol-ene radical reaction

Masamitsu Shirai, Koichi Maki, Haruyuki Okamura, Koji Kaneyama, Toshiro Itani

Proceedings Volume 7639, 76391J (2010) https://doi.org/10.1117/12.846339

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Polymers, Line edge roughness, Silicon, Scanning electron microscopy, Photography, Diffusion, Carbon monoxide

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Proceedings Article | 1 April 2009 Paper

Non-chemically amplified negative resist for EUV lithography

Masamitsu Shirai, Koichi Maki, Haruyuki Okamura, Koji Kanayama, Toshiro Itani

Proceedings Volume 7273, 72731N (2009) https://doi.org/10.1117/12.813377

KEYWORDS: Extreme ultraviolet lithography, Polymers, Line width roughness, Extreme ultraviolet, Line edge roughness, Carbon monoxide, Silicon, Scanning electron microscopy, Photography, Diffusion

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Proceedings Article | 1 April 2009 Paper

Diffusion of acid and amine at resist/BARC interface

Masamitsu Shirai, Noriaki Majima, Haruyuki Okamura, Yoshiomi Hiroi, Shigeo Kimura, Yasuyuki Nakajima

Proceedings Volume 7273, 727331 (2009) https://doi.org/10.1117/12.813379

KEYWORDS: Diffusion, Polymers, Interfaces, Silicon, Semiconducting wafers, Photoresist processing, Industrial chemicals, Bottom antireflective coatings, Reflectivity, Carbon monoxide

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Proceedings Article | 1 April 2009 Paper

Novel resist for replica preparation of mold for imprint lithography

Daisaku Matsukawa, Hiroyuki Wakayama, Kazuyuki Mitsukura, Haruyuki Okamura, Yoshihiko Hirai, Masamitsu Shirai

Proceedings Volume 7273, 72730T (2009) https://doi.org/10.1117/12.813383

KEYWORDS: Ultraviolet radiation, Quartz, Lithography, Positron emission tomography, Silicon, Nickel, Optical lithography, Molecules, Polymerization, Silicon films

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Proceedings Article | 4 April 2008 Paper

EUV resist based on low molecular weight PHS

Masamitsu Shirai, Akitaka Kurosima, Haruyuki Okamura, Koji Kaneyama, Toshiro Itani

Proceedings Volume 6923, 692344 (2008) https://doi.org/10.1117/12.771774

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Polymers, Polymerization, Line width roughness, Line edge roughness, Semiconductors, Diffusion, Bioalcohols, Ultraviolet radiation

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Proceedings Article | 29 March 2006 Paper

Characteristics of low E_a 193-nm chemical amplification resists

Toshiyuki Ogata, Yohei Kinoshita, Sanae Furuya, Shogo Matsumaru, Motoki Takahashi, Daiju Shiono, Takahiro Dazai, Hideo Hada, Masamitsu Shirai

Proceedings Volume 6153, 615328 (2006) https://doi.org/10.1117/12.656199

KEYWORDS: Polymers, Plasma, Argon, Printing, Surface roughness, Lithography, FT-IR spectroscopy, Scanning electron microscopy, Photoresist processing, Electroluminescence

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Proceedings Article | 14 May 2004 Paper

Evaluation of 157-nm resist structure: outgassing relationship using in situ QCM technique

Masamitsu Shirai, Toyofumi Shinozuka, Shinichi Takashiba, Yusuke Horiguchi, Shigeo Irie, Toshiro Itani

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533649

KEYWORDS: Crystals, Quartz, Polymers, Chlorine, Polymethylmethacrylate, Adsorption, Fluorine, Lamps, Absorption, FT-IR spectroscopy

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Proceedings Article | 12 June 2003 Paper

F2 resist outgassing studied by in situ QCM technique

Masamitsu Shirai, Toyofumi Shinozuka, Masahiro Tsunooka, Seiichi Ishikawa, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485090

KEYWORDS: Polymers, Crystals, Quartz, Absorption, FT-IR spectroscopy, Polymethylmethacrylate, Vacuum ultraviolet, Lamps, Excimers, Infrared spectroscopy

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Proceedings Article | 19 November 2001 Paper

Computer-controlled laser ablation: a novel tool for biomolecular patterning

Jonathan Wright, Chitladda Mahanivong, Duy Pham, Dan Nicolau, K. Suyama, Masamitsu Shirai, Masahiro Tsunooka

Proceedings Volume 4590, (2001) https://doi.org/10.1117/12.454620

KEYWORDS: Laser ablation, Polymers, Proteins, Optical lithography, Microscopes, Rhodamine, Computing systems, Atomic force microscopy, Luminescence, Nitrogen lasers

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Proceedings Article | 23 June 2000 Paper

Negative-tone resist for phase-shifting mask technology: a progress report

Ernst Richter, Klaus Elian, Stefan Hien, Eberhard Kuehn, Michael Sebald, Masamitsu Shirai

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388361

KEYWORDS: Polymers, Diffusion, Photoresist processing, Lithography, Photomasks, Deep ultraviolet, Phase shifts, Photoresist materials, Photoresist developing, Polymer thin films

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Proceedings Article | 23 June 2000 Paper

Approach for VUV positive resists using photodecomposable polymers

Shinji Kishimura, Akiko Katsuyama, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388318

KEYWORDS: Polymers, Vacuum ultraviolet, Excimer lasers, Lithography, Transparency, Photoresist processing, Transmittance, FT-IR spectroscopy, Imaging systems, Absorption

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Proceedings Article | 29 June 1998 Paper

Polymer design in surface modification resist process for ArF lithography

Takahiro Matsuo, Masayuki Endo, Shigeyasu Mori, Koichi Kuhara, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312340

KEYWORDS: Polymers, Chemical vapor deposition, Photoresist processing, Lithography, Image processing, Scanning electron microscopy, Reactive ion etching, Photography, Lithium, Plasma

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Proceedings Article | 29 June 1998 Paper

Improved positive surface modification resist process for 193-nm lithography

Masayuki Endo, Takahiro Matsuo, Shigeyasu Mori, Taku Morisawa, Koichi Kuhara, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312439

KEYWORDS: Photoresist processing, Polymers, Chemical vapor deposition, Image processing, Lithography, Photolysis, 193nm lithography, Chlorine, Scanning electron microscopy, Etching

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Proceedings Article | 10 June 1996 Paper

Tunneling observation of phonon contribution to the Cooper pairing in high-Tc superconductors

Ryzo Aoki, Hironaru Murakami, Masamitsu Shirai, Vladimir Svistunov, A. Dyachenko, D. Afanassyev

Proceedings Volume 2696, (1996) https://doi.org/10.1117/12.241754

KEYWORDS: Phonons, Superconductors, Crystals, Superconductivity, Spectroscopy, Oxygen, Oxides, Ions, Scattering, Perovskite

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Showing 5 of 17 publications

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