Dr. Masanori Yamaguchi Profile

Dr. Masanori Yamaguchi

at Ushio Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 8 March 2014 Paper

Multi-wavelength light emission from three-dimensional AlGaN quantum wells fabricated on facet structures

Ken Kataoka, Masanori Yamaguchi, Kensuke Fukushima, Mitsuru Funato, Yoichi Kawakami

Proceedings Volume 8986, 898627 (2014) https://doi.org/10.1117/12.2037286

KEYWORDS: Quantum wells, Aluminum nitride, Aluminum, Sapphire, Transmission electron microscopy, Scanning electron microscopy, Indium gallium nitride, Gallium nitride, Ultraviolet radiation, Atomic force microscopy

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Proceedings Article | 16 April 2011 Paper

Regeneration of imprint molds using vacuum ultraviolet light

Masashi Nakao, Masanori Yamaguchi, Shintaro Yabu

Proceedings Volume 7972, 79722M (2011) https://doi.org/10.1117/12.879397

KEYWORDS: Vacuum ultraviolet, Oxygen, Etching, Quartz, Lithography, Ultraviolet radiation, Polymethylmethacrylate, Nickel, Optical microscopes, Scanning electron microscopy

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Proceedings Article | 1 April 2009 Paper

Correlation of experimental and simulated cure-induced photoresist distortions in double patterning

Thomas Wallow, Mahidhar Rayasam, Masanori Yamaguchi, Yohei Yamada, Karen Petrillo, Kenji Yoshimoto, Jongwook Kye, Ryoung-Han Kim, Harry Levinson

Proceedings Volume 7273, 727309 (2009) https://doi.org/10.1117/12.814474

KEYWORDS: Double patterning technology, Photoresist materials, Finite element methods, Scanning electron microscopy, Photoresist processing, Metrology, Etching, Lithography, Ultraviolet radiation, Photoresist developing

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SPIE Journal Paper | 1 January 2009

Cure-induced photoresist distortions in double patterning

Thomas Wallow, Mahidhar Rayasam, Masanori Yamaguchi, Yohei Yamada, Ryoung-Han Kim, Jongwook Kye, Harry Levinson

JM3, Vol. 8, Issue 01, 011010, (January 2009) https://doi.org/10.1117/12.10.1117/1.3094746

KEYWORDS: Double patterning technology, Photoresist materials, Finite element methods, Photoresist processing, Scanning electron microscopy, Etching, Lithography, Optical lithography, Ultraviolet radiation, Image analysis

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