The evolution of microlithography to 0.25 micrometers and below has driven the need for performance enhancements in several critical areas. Among these are imaging, illumination, and overlay. This paper briefly reviews MicrascanTM III system concepts. The main body of the paper presents system level performance and discusses the key subsystems which enable 0.25 micron imaging and 55 nm overlay. Autocal, MicrascanTM III's image, reticle and wafer position reference subsystem is discussed with respect to functionality and performance with a pulsed illumination source. MicrascanTM III illuminator performance, including automated off axis illumination module are presented. Performance of the magnetically levitated Monostage and its interaction with overlay and imaging is discussed. System performance with respect to resolution, image quality and overlay on product levels is presented and analyzed.
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