Different methods of fabrication of micro-optical devices for the Infra-Red (I.R.) such as micro-lens, micro-prism, micro-mirror arrays and Fresnel lenses based on the use of chalcogenide photoresists are described. In chalcogenide photoresists, two photoinduced phenomena are observed: photoinduced structural transformations and photoinduced diffusion of some metals, primarily, silver, and both phenomena enabled the development of new types of I.R micro-optical devices. The use of a new three-component As-S-Se photoresist and a new efficient amine-based selective developer allows for the realization of soft contrast characteristics of the photolithographic process with a Xe-source of light. Recent progress in the development of devices using photostructural transformations based on these two innovations will be described. Devices using the photoinduced silver diffusion are based on the different dissolution rate (in selective etchants) of the non-doped and silver-doped chalcogenide films. Parameters and characteristics of several micro-optical devices made using this effect are compared and discussed.
A simple microlens array fabrication process based on chalcogenide glass As-Se and As-S photoresists is described. Specific properties of chalcogenide photoresists important for microlenses preparation and the parameters of fabricated spherical and cylindrical microlens arrays are measured and discussed.
The use of a microlens on top of a photovoltaic solar cell working at high light concentration and the need for a very low absorption photoresist in the whole solar spectrum are explained. A process has been developed in a negative photoresist with adequate properties. The optical properties of the fabricated microlenses are described.
Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.
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