In this work we present our theoretical and experimental study on the technique for the fine modification of a
silicon integrated microring resonator spectral response. The method involves the local atomic layer deposition
of a thin TiO2 overlayer and is applicable for standard nanophotonic waveguides. The approach is based on the
dispersion management due to the specific dispersion properties brought by the thin TiO2 film deposition. In
addition, the technique is able to partially compensate the fabrication imperfections and reduce the propagation
losses.
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