Dr. Nadav Wertsman Profile

Dr. Nadav Wertsman

at Carl Zeiss SMS Ltd

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Author

Publications (6)

Proceedings Article | 2 April 2014 Paper

Compensating process non-uniformity to improve wafer overlay by RegC

Philippe Leray, Shaunee Cheng, Avi Cohen, Erez Graitzer, Vladimir Dmitriev, Shiran Rehtan, Nadav Wertsman

Proceedings Volume 9050, 905015 (2014) https://doi.org/10.1117/12.2048081

KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Overlay metrology, Process control, Optical lithography, Silica, Data modeling, Reticles, Data acquisition

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Proceedings Article | 9 November 2005 Paper

Advanced edge roughness measurement application for mask metrology

D. Chase, R. Kris, R. Katz, A. Tam, L. Gershtein, R. Falah, N. Wertsman

Proceedings Volume 5992, 59924N (2005) https://doi.org/10.1117/12.632439

KEYWORDS: Photomasks, Metrology, Edge roughness, Manufacturing, Reticles, Critical dimension metrology, Scanning electron microscopy, Integrated circuits, Line edge roughness, Photomask technology

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Proceedings Article | 27 January 2005 Paper

Verification of height and sidewall angle SEM metrology accuracy using Monte Carlo simulation

Roman Kris, Ofer Adan, Aviram Tam, Albert Karabekov, Ovadya Menadeva, Ram Peltinov, Oren Zoran, Nadav Wertsman, Arcadiy Vilenkin

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.575390

KEYWORDS: 3D metrology, Scanning electron microscopy, Monte Carlo methods, 3D modeling, Metrology, Optical lithography, Gallium, Semiconductors, Tolerancing

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Proceedings Article | 27 January 2005 Paper

Advanced 2D structures metrology with CD-SEM for OPC challenges

Roman Kris, Aviram Tam, Ram Peltinov, Ovadya Menadeva, Ofer Adan, Nadav Wertsman, Arcadiy Vilenkin

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.575344

KEYWORDS: Metrology, Algorithm development, Process control, OLE for process control, Optical proximity correction, Scanning electron microscopy, Shape analysis, Optical lithography, Reticles

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Proceedings Article | 20 August 2004 Paper

Mask metrology 2D application for measurement of OPC features and corner roundness

Roman Kris, Ovadya Menadeva, Aviram Tam, Ram Peltinov, Liraz Segal, Nadav Wertsman, Naftali Shcolnik, Gidon Gottlib, Arcadiy Vilenkin

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557808

KEYWORDS: Metrology, Reticles, Scanning electron microscopy, Optical proximity correction, Algorithm development, Photomasks, Image segmentation, OLE for process control, Image processing, Feature extraction

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Proceedings Article | 24 May 2004 Paper

CD-SEM application for generic analysis of two-dimensional features on wafers and reticles

Roman Kris, Aviram Tam, Ovadya Menadeva, Ram Peltinov, Liraz Segal, Nadav Wertsman, Ofer Adan, Naftali Shcolnik, Gidi Gottlib, Arcadiy Vilenkin

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.539441

KEYWORDS: Metrology, Semiconducting wafers, Reticles, Shape analysis, Scanning electron microscopy, Process control, Optical proximity correction, Algorithm development, Inspection, Optical lithography

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Showing 5 of 6 publications

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