Prof. Naftali Paul Eisenberg Profile

Prof. Naftali Paul Eisenberg

Dept Manager at Jerusalem College of Technology

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 11 September 2007 Paper

Paper

Efficiency enhancement in concentrator solar cells by dielectric micro-concentrators

Omer Korech, Jeffrey Gordon, Eugene Katz, Daniel Feuermann, Naftali Eisenberg

Proceedings Volume 6651, 665103 (2007) https://doi.org/10.1117/12.733024

KEYWORDS: Solar concentrators, Metals, Solar cells, Nonimaging optics, Dielectrics, Microfabrication, Reflectivity, Glasses, Resistance, Optical design

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Proceedings Article | 21 April 2006 Paper

Paper

Development of I.R. micro-electro-optical devices: new methods and new results

N. Eisenberg, M. Manevich, A. Arsh, M. Klebanov, V. Lyubin

Proceedings Volume 6185, 618519 (2006) https://doi.org/10.1117/12.663086

KEYWORDS: Photoresist materials, Chalcogenides, Silver, Photoresist developing, Micromirrors, Selenium, Fresnel lenses, Diffusion, Metals, Refractive index

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Proceedings Article | 17 September 1999 Paper

Paper

Achromatic diffractive optical element

Salman Noach, Naftali Eisenberg, Yoel Arieli

Proceedings Volume 3778, (1999) https://doi.org/10.1117/12.363751

KEYWORDS: Diffractive optical elements, Wavefronts, Refractive index, Etching, Chromatic aberrations, Light sources, Computer simulations, Optical design, Glasses, Aberration correction

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Proceedings Article | 17 September 1999 Paper

Paper

Microlens arrays based on chalcogenide glass resists using the proximity microlithography method

Salman Noach, M. Manevich, Matvei Klebanov, Victor Lyubin, Naftali Eisenberg

Proceedings Volume 3778, (1999) https://doi.org/10.1117/12.363753

KEYWORDS: Photoresist materials, Microlens array, Microlens, Photomasks, Chalcogenides, Chalcogenide glass, Spherical lenses, Optical lithography, Lithography, Photoresist developing

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Proceedings Article | 22 September 1997 Paper

Paper

Construction of a detection system with a wide field of view

T. Verker, Naftali Schweitzer, Jack Broder, Naftali Eisenberg

Proceedings Volume 3110, (1997) https://doi.org/10.1117/12.281359

KEYWORDS: Interference filters, Optical filters, Sensors, Telecommunications, Photodetectors, Domes, Spherical lenses, Signal to noise ratio, Thin films, Signal detection

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Proceedings Article | 22 September 1997 Paper

Paper

Multiple lenslet array imagers and correlators

I. Glaser, Naftali Eisenberg, M. Maniewictz

Proceedings Volume 3110, (1997) https://doi.org/10.1117/12.281340

KEYWORDS: Holography, Optical correlators, Point spread functions, Imaging systems, Imaging arrays, Optical filters, Diffraction, Polarization, Image filtering, Silicon

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Proceedings Article | 22 September 1997 Paper

Paper

Sol-gel prepared glass for micro-optical elements and arrays

Yair Haruvy, Irith Gilath, M. Maniewictz, Naftali Eisenberg

Proceedings Volume 3110, (1997) https://doi.org/10.1117/12.281379

KEYWORDS: Sol-gels, Glasses, Chemical elements, Silicon, Polymerization, Molecules, Etching, Metals, Thin films, Water

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Proceedings Article | 22 September 1997 Paper

Paper

New computer-generated hologram

Yoel Arieli, A. Solomon, Naftali Eisenberg

Proceedings Volume 3110, (1997) https://doi.org/10.1117/12.281384

KEYWORDS: Computer generated holography, Phase contrast, Beam shaping, Diffraction, Image filtering, Optical filters, Solids, Direct methods, Visualization, Lithium

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Proceedings Article | 22 September 1997 Paper

Paper

Refractive and diffractive micro-optical elements and arrays prepared by the fast sol-gel processes

Yair Haruvy, Irith Gilath, M. Maniewictz, Naftali Eisenberg

Proceedings Volume 3110, (1997) https://doi.org/10.1117/12.281363

KEYWORDS: Sol-gels, Chemical elements, Glasses, Optical components, Optical lithography, Lithium, Scanning electron microscopy, Electroluminescence, Fresnel lenses, 3D modeling

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Proceedings Article | 6 June 1995 Paper

Paper

Development of transparent microlens in negative photoresist for solar application

M. Manevich, Naftali Eisenberg

Proceedings Volume 2426, (1995) https://doi.org/10.1117/12.211196

KEYWORDS: Photoresist materials, Microlens, Solar cells, Microlens array, Photoresist developing, Glasses, Absorption, Lithography, Photovoltaics, Sun

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Proceedings Article | 6 June 1995 Paper

Paper

Kinoforms for wideband use

Yoel Arieli, Y. Lauber, Naftali Eisenberg

Proceedings Volume 2426, (1995) https://doi.org/10.1117/12.211223

KEYWORDS: Fresnel lenses, Computer generated holography, Chromatic aberrations, Diffraction, Light wave propagation, Phase shifts, Superposition, Helium neon lasers, Laser therapeutics, Surgery

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Proceedings Article | 6 June 1995 Paper

Paper

Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist

Naftali Eisenberg, M. Manevich, Matvei Klebanov, S. Shutina, Victor Lyubin

Proceedings Volume 2426, (1995) https://doi.org/10.1117/12.211195

KEYWORDS: Photoresist materials, Microlens array, Chalcogenides, Microlens, Photoresist developing, Lithography, Refractive index, Glasses, Fabrication, Optoelectronics

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Proceedings Article | 13 August 1993 Paper

Paper

Long-wavelength IR GaAs/GaAlAs detector array

Shmuel Borenstain, Naftali Eisenberg

Proceedings Volume 1972, (1993) https://doi.org/10.1117/12.151092

KEYWORDS: Staring arrays, Gallium arsenide, Sensors, Quantum wells, Long wavelength infrared, Optical engineering, Imaging systems, Quantum efficiency, Thermography, Absorption

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Proceedings Article | 13 August 1993 Paper

Paper

New methods for generating microlenses by lithographic processes

Yoel Arieli, Michael Ben-Ezra, Naftali Eisenberg

Proceedings Volume 1972, (1993) https://doi.org/10.1117/12.151101

KEYWORDS: Microlens, Diffraction gratings, Far-field diffraction, Diffraction, Photoresist materials, Lithography, Optical engineering, CCD cameras, Microlens array, Fabrication

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Proceedings Article | 1 November 1990 Paper

Paper

New process for manufacturing arrays of microlenses on various substrates

Marc Abitbol, Naftali Eisenberg

Proceedings Volume 1334, (1990) https://doi.org/10.1117/12.22857

KEYWORDS: Microlens, Photoresist materials, Photoresist developing, Fabrication, Array processing, Microlens array, Printing, Etching, Ion beams, Photomasks

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Showing 5 of 15 publications

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