We present a comprehensive investigation into DSA materials and process development for P24 EUV lithography with the objective of mitigating DSA defects and enhancing the smoothness of DSA-defined patterns. We conduct a comparative assessment of the quality of DSA-rectified patterns between PS-b-PMMA and high Chi BCP. Furthermore, we explore resist planforms other than CAR for creating DSA guiding patterns.
Patterning variability at tight metal pitch leads to a high risk for reliability failures. In 2023, we (Intel) demonstrated a novel EUV-based multi-patterning process enhanced by directed self-assembly (DSA) to scale metal pitch to 18 nm and below along with electrical validation data. The DSA process rectifies systematic and random variations in EUV patterns at 60% lower dose and in combination with spacer-aligned double patterning results in low-defectivity and low- variability metal patterns at the tightest pitch. Here we go further and demonstrate design flexibility, tone-inversion capability to enable subtractive metallization, sub-20nm metal end-to-ends, via and line resistances in line with model expectations, robust end-of-line standard cell chain and comb yields, and world-first demonstration of robust reliability data with matched dielectric breakdown and electromigration to a mature process at looser pitch.
The response of a material to applied intense radiation is characterized by its nonlinear optical susceptibility. While the conventional microscopic picture of nonlinear optics of materials involves expressions using higher order perturbation theory, recent theoretical studies have established a link between nonlinear optics and geometrical properties of the electronic wavefunction. Weyl semimetals are a recently discovered class of materials with nontrivial band structure geometry. We use optical second harmonic generation to measure the second order nonlinear optical response of Weyl semimetals of the transition metal monopnictide (TMMP) family. We find that the TMMP compounds have the largest measured nonlinear optical susceptibility of any bulk crystalline materials, with a susceptibility nearly an order of magnitude higher than that of other nonlinear optical materials.
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