TiO2 thin films were deposited on glass substrates by HiTUS (high target utilization sputtering) technique.
Structural studies of TiO2 thin films of different thickness were performed by X-ray diffraction. Refractive index and
extinction coefficient were measured by spectroscopic ellipsometer. Transmission spectra of TiO2 thin films were
investigated in the temperature interval 77-300 K. The temperature behaviour of Urbach absorption edge for TiO2 thin
film was studied. The effect of temperature on the optical parameters and order-disorder processes in TiO2 thin films was
analysed.
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