Mr. Osamu Suga Profile

Osamu Suga

Manager at Semiconductor Leading Edge Technologies Inc

SPIE Involvement:

Author

Publications (68)

SPIE Journal Paper | 27 February 2012

Particle protection capability of extreme ultraviolet lithography mask carriers based on the gap effect and filter effect

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

JM3, Vol. 11, Issue 1, 013002, (February 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013002

KEYWORDS: Particles, Photomasks, Extreme ultraviolet lithography, Solids, Inspection, Pellicles, Semiconductors, Protactinium, Reticles, Particle filters

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Proceedings Article | 14 October 2011 Paper

Phase defect analysis with actinic full-field EUVL mask blank inspection

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 8166, 81660G (2011) https://doi.org/10.1117/12.898898

KEYWORDS: Inspection, Photomasks, Defect detection, Multilayers, Extreme ultraviolet lithography, Imaging systems, Transmission electron microscopy, Semiconducting wafers, Light scattering, Atomic force microscopy

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SPIE Journal Paper | 1 October 2011

Evaluation of extreme ultraviolet mask defect using blank inspection, patterned mask inspection, and wafer inspection

Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Kazuo Tawarayama, Mari Nozoe, Toshihiko Tanaka, Osamu Suga, Ichiro Mori

JM3, Vol. 10, Issue 04, 043006, (October 2011) https://doi.org/10.1117/12.10.1117/1.3644984

KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

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Proceedings Article | 20 April 2011 Paper

EB defect inspection of EUV resist patterned wafer for hp 32 nm and beyond

Mari Nozoe, Toshihiko Tanaka, Takashi Kamo, Shinji Kubo, Tomohiro Tamori, Noriaki Takagi, Takeshi Yamane, Tsuneo Terasawa, Hiroyuki Shigemura, Osamu Suga

Proceedings Volume 7971, 797123 (2011) https://doi.org/10.1117/12.879346

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Extreme ultraviolet, Wafer inspection, Defect inspection, Line width roughness, Image processing, Signal to noise ratio

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Proceedings Article | 8 April 2011 Paper

Evaluation results of a new EUV reticle pod having reticle grounding paths

Kazuya Ota, Masami Yonekawa, Mitsuaki Amemiya, Takao Taguchi, Osamu Suga

Proceedings Volume 7969, 79691V (2011) https://doi.org/10.1117/12.879553

KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Electrodes, Photomasks, Particle contamination, Resistance, Dielectric polarization

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Proceedings Article | 8 April 2011 Paper

Overlay accuracy of EUV1 using compensation method for nonflatness of mask

Yuusuke Tanaka, Takashi Kamo, Kazuya Ota, Hiroyuki Tanaka, Osamu Suga, Masamitsu Itoh, Shusuke Yoshitake

Proceedings Volume 7969, 796936 (2011) https://doi.org/10.1117/12.879340

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Photovoltaics, Semiconducting wafers, Source mask optimization, Overlay metrology, Extreme ultraviolet, Scanners, Lithography, Distortion

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Proceedings Article | 7 April 2011 Paper

Development of new FIB technology for EUVL mask repair

Fumio Aramaki, Takashi Ogawa, Osamu Matsuda, Tomokazu Kozakai, Yasuhiko Sugiyama, Hiroshi Oba, Anto Yasaka, Tsuyoshi Amano, Hiroyuki Shigemura, Osamu Suga

Proceedings Volume 7969, 79691C (2011) https://doi.org/10.1117/12.879609

KEYWORDS: Extreme ultraviolet lithography, Ions, Etching, Extreme ultraviolet, Silicon, Image resolution, Reflectivity, Ion beams, Mirrors, Ruthenium

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Proceedings Article | 6 April 2011 Paper

Phase defect printability and actinic dark-field mask blank inspection capability analyses

Tsuneo Terasawa, Takeshi Yamane, Takashi Kamo, Toshihiko Tanaka, Osamu Suga

Proceedings Volume 7969, 79690V (2011) https://doi.org/10.1117/12.879398

KEYWORDS: Inspection, Photomasks, Defect detection, Critical dimension metrology, Signal detection, Extreme ultraviolet lithography, Semiconducting wafers, Printing, Extreme ultraviolet, Cameras

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SPIE Journal Paper | 1 April 2011

Light-shield border impact on the printability of extreme-ultraviolet mask

Takashi Kamo, Kazuo Tawarayama, Yuusuke Tanaka, Yukiyasu Arisawa, Hajime Aoyama, Toshihiko Tanaka, Osamu Suga

JM3, Vol. 10, Issue 02, 023001, (April 2011) https://doi.org/10.1117/12.10.1117/1.3574117

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation

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Proceedings Article | 29 March 2011 Paper

Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Kazuo Tawarayama, Mari Nozoe, Toshihiko Tanaka, Osamu Suga, Ichiro Mori

Proceedings Volume 7969, 79690J (2011) https://doi.org/10.1117/12.879551

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Wafer inspection, Defect detection, Extreme ultraviolet, Printing, Scanning electron microscopy, Multilayers, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 January 2011

Study of electrification of extreme ultraviolet lithography mask and adhesion of particles during electrostatic chucking

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

JM3, Vol. 10, Issue 1, 013002, (January 2011) https://doi.org/10.1117/12.10.1117/1.3532835

KEYWORDS: Photomasks, Particles, Extreme ultraviolet lithography, Dielectrics, Electrodes, Quartz, Resistance, Dielectric polarization, Solids, Inspection

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SPIE Journal Paper | 1 October 2010

Impact of extreme ultraviolet mask absorber defect with pattern roughness on lithographic images

Takashi Kamo, Hajime Aoyama, Yukiyasu Arisawa, Mihoko Kijima, Toshihiko Tanaka, Osamu Suga

JM3, Vol. 9, Issue 04, 041204, (October 2010) https://doi.org/10.1117/12.10.1117/1.3494618

KEYWORDS: Photomasks, Line width roughness, Image processing, Scanning electron microscopy, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Tolerancing

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Proceedings Article | 29 September 2010 Paper

Printability of EUVL mask defect detected by actinic blank inspection tool and 199-nm pattern inspection tool

Takashi Kamo, Tsuneo Terasawa, Takeshi Yamane, Hiroyuki Shigemura, Noriaki Takagi, Tsuyoshi Amano, Toshihiko Tanaka, Kazuo Tawarayama, Osamu Suga, Ichiro Mori

Proceedings Volume 7823, 78231U (2010) https://doi.org/10.1117/12.864305

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Defect detection, Particles, Extreme ultraviolet, Scanning electron microscopy, Lithography, Printing

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Proceedings Article | 29 September 2010 Paper

Prospect of EUV mask repair technology using e-beam tool

Shingo Kanamitsu, Takashi Hirano, Osamu Suga

Proceedings Volume 7823, 782322 (2010) https://doi.org/10.1117/12.864288

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet, Etching, Critical dimension metrology, Lithography, Scanning electron microscopy, Extreme ultraviolet lithography, Image resolution, Gallium

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Proceedings Article | 29 September 2010 Paper

Improvement of actinic blank inspection and phase defect analysis

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 7823, 78231V (2010) https://doi.org/10.1117/12.864290

KEYWORDS: Inspection, CCD cameras, Cameras, Imaging systems, Signal detection, Defect detection, Critical dimension metrology, Multilayers, Interference (communication), Defect inspection

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Proceedings Article | 29 September 2010 Paper

Evaluation of the contamination removal capability and multilayer degradation in various cleaning methods

Noriaki Takagi, Toshihisa Anazawa, Iwao Nishiyama, Osamu Suga

Proceedings Volume 7823, 782327 (2010) https://doi.org/10.1117/12.864294

KEYWORDS: Reflectivity, Contamination, Plasma, Oxygen, Silica, Ruthenium, Silicon, Carbon, Scanning probe microscopy, Oxidation

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Proceedings Article | 25 September 2010 Paper

Study of EUV mask defect repair using FIB method

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Yuichi Inazuki, Naoya Hayashi

Proceedings Volume 7823, 782323 (2010) https://doi.org/10.1117/12.864213

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Cadmium sulfide, Image processing, Scanning electron microscopy, Transmission electron microscopy, Semiconducting wafers, Carbon, Ions

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Proceedings Article | 27 May 2010 Paper

Thin absorber EUV mask with light-shield border of etched multilayer and its lithographic performance

Takashi Kamo, Hajime Aoyama, Yukiyasu Arisawa, Kazuo Tawarayama, Toshihiko Tanaka, Osamu Suga

Proceedings Volume 7748, 774805 (2010) https://doi.org/10.1117/12.867774

KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet lithography, Multilayers, Extreme ultraviolet, Lithography, Semiconducting wafers, Coating, Reticles, Deep ultraviolet

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Proceedings Article | 27 May 2010 Paper

Study on counting error in particle inspection

Mitsuaki Amemiya, Kazuya Ota, Takao Taguchi, Osamu Suga

Proceedings Volume 7748, 77481B (2010) https://doi.org/10.1117/12.867929

KEYWORDS: Particles, Inspection, Signal detection, Photomasks, Error analysis, Extreme ultraviolet lithography, Strontium, Nickel, Laser scattering, Scattering

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Proceedings Article | 27 May 2010 Paper

FIB-CVD technology for EUV mask repair

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka

Proceedings Volume 7748, 77481I (2010) https://doi.org/10.1117/12.867233

KEYWORDS: Chemical vapor deposition, Photomasks, Tungsten, Extreme ultraviolet, Carbon, Silicon, Gallium, Extreme ultraviolet lithography, Chemical analysis, Vacuum ultraviolet

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Proceedings Article | 26 May 2010 Paper

Actinic EUVL mask blank inspection capability with time delay integration mode

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 7748, 774803 (2010) https://doi.org/10.1117/12.867979

KEYWORDS: Photomasks, Inspection, Critical dimension metrology, Signal detection, Defect detection, Extreme ultraviolet lithography, Imaging systems, Atomic force microscopy, Semiconducting wafers, Multilayers

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Proceedings Article | 26 May 2010 Paper

Evaluation of transfer of particles from dual-pod base plate to EUV mask

Masami Yonekawa, Kazuya Ota, Takao Taguchi, Osamu Suga

Proceedings Volume 7748, 774820 (2010) https://doi.org/10.1117/12.867044

KEYWORDS: Particles, Photomasks, Extreme ultraviolet, Nickel, Silica, Atmospheric particles, Inspection, Image processing, Semiconducting wafers, Statistical analysis

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SPIE Journal Paper | 1 April 2010

Thin-absorber extreme-ultraviolet lithography mask with light-shield border for full-field scanner: flatness and image placement change through mask process

Takashi Kamo, Yuusuke Tanaka, Toshihiko Tanaka, Iwao Nishiyama, Osamu Suga, Tsukasa Abe, Tadahiko Takikawa, Hiroshi Mohri, Tsutomu Shoki, Youichi Usui

JM3, Vol. 9, Issue 02, 023005, (April 2010) https://doi.org/10.1117/12.10.1117/1.3378154

KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating

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Proceedings Article | 23 March 2010 Paper

Improvement of EUV mask defect printability evaluation

Noriaki Takagi, Hiroyuki Shigemura, Tsuyoshi Amano, Takashi Kamo, Osamu Suga

Proceedings Volume 7636, 763621 (2010) https://doi.org/10.1117/12.846333

KEYWORDS: Opacity, Photomasks, Semiconducting wafers, Scanning electron microscopy, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Printing, Computer simulations, Image analysis

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Proceedings Article | 20 March 2010 Paper

Impact of EUV mask absorber defect with pattern-roughness on lithographic images

Takashi Kamo, Hajime Aoyama, Yukiyasu Arisawa, Mihoko Kijima, Toshihiko Tanaka, Osamu Suga

Proceedings Volume 7636, 76360L (2010) https://doi.org/10.1117/12.846347

KEYWORDS: Photomasks, Line width roughness, Scanning electron microscopy, Extreme ultraviolet lithography, Image processing, Lithography, Extreme ultraviolet, Opacity, Semiconducting wafers, Line edge roughness

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Proceedings Article | 20 March 2010 Paper

Evaluation results of a new EUV reticle pod based on SEMI E152

Kazuya Ota, Masami Yonekawa, Takao Taguchi, Osamu Suga

Proceedings Volume 7636, 76361F (2010) https://doi.org/10.1117/12.846316

KEYWORDS: Reticles, Particles, Prototyping, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Photomasks, Tolerancing, Packaging, Data storage

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Proceedings Article | 18 March 2010 Paper

Actinic phase defect detection and printability analysis for patterned EUVL mask

Tsuneo Terasawa, Takeshi Yamane, Toshihiko Tanaka, Osamu Suga, Takashi Kamo, Ichiro Mori

Proceedings Volume 7636, 763602 (2010) https://doi.org/10.1117/12.846678

KEYWORDS: Inspection, Photomasks, Defect detection, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Multilayers, EUV optics, Phase shifts, Bridges

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Proceedings Article | 30 September 2009 Paper

Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yukiyasu Arisawa, Osamu Suga, Hideaki Hashimoto, Masanori Saito, Masaya Takeda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7488, 74882I (2009) https://doi.org/10.1117/12.829748

KEYWORDS: Photomasks, Inspection, Opacity, Defect inspection, Defect detection, Extreme ultraviolet lithography, Semiconducting wafers, Reflectivity, Signal analysis, Scanning electron microscopy

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Proceedings Article | 30 September 2009 Paper

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda

Proceedings Volume 7488, 74882O (2009) https://doi.org/10.1117/12.829747

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Image contrast enhancement, Laser sources, Optical inspection, Defect detection, Super resolution, Optical alignment

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Proceedings Article | 30 September 2009 Paper

Thin absorber EUVL mask with light-shield border for full-field scanner: flatness and image placement change through mask process

Takashi Kamo, Yuusuke Tanaka, Toshihiko Tanaka, Osamu Suga, Tsukasa Abe, Tadahiko Takikawa, Hiroshi Mohri, Tsutomu Shoki, Youichi Usui

Proceedings Volume 7488, 748818 (2009) https://doi.org/10.1117/12.829873

KEYWORDS: Photomasks, Etching, Image processing, Extreme ultraviolet lithography, Multilayers, Photoresist processing, Scanners, Coating, Optical lithography, Lithography

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Proceedings Article | 30 September 2009 Paper

Actinic EUVL mask blank inspection capability with time delay integration mode

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 7488, 74881B (2009) https://doi.org/10.1117/12.829724

KEYWORDS: Inspection, Defect detection, Extreme ultraviolet lithography, Imaging systems, Signal detection, Photomasks, Defect inspection, Charge-coupled devices, Multilayers, Detection and tracking algorithms

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Proceedings Article | 11 May 2009 Paper

FIB mask repair technology for EUV mask

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Tsukasa Abe, Hiroshi Mohri

Proceedings Volume 7379, 73792L (2009) https://doi.org/10.1117/12.824335

KEYWORDS: Photomasks, Carbon, Etching, Extreme ultraviolet, Hydrogen, Chemical vapor deposition, Contamination, Cadmium sulfide, Extreme ultraviolet lithography, Scanning electron microscopy

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Proceedings Article | 11 May 2009 Paper

Actinic EUVL mask blank inspection and phase defect characterization

Takeshi Yamane, Teruo Iwasaki, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga, Toshihisa Tomie

Proceedings Volume 7379, 73790H (2009) https://doi.org/10.1117/12.824258

KEYWORDS: Inspection, Defect detection, Photomasks, Particles, Imaging systems, Atomic force microscopy, Scanning electron microscopy, Extreme ultraviolet lithography, Defect inspection, Multilayers

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Proceedings Article | 11 May 2009 Paper

Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Yukiyasu Arisawa, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7379, 73792K (2009) https://doi.org/10.1117/12.824334

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect inspection, Reflectivity, Optical inspection, Defect detection, Signal detection, Opacity, Finite-difference time-domain method

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