Dr. Osamu Wakabayashi Profile

Dr. Osamu Wakabayashi

Researcher at EUVA

SPIE Involvement:

Author

Publications (33)

Proceedings Article | 20 March 2010 Paper

Paper

First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo

Proceedings Volume 7636, 763608 (2010) https://doi.org/10.1117/12.846271

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Tin, Laser systems engineering, Plasma systems, Mirrors, Extreme ultraviolet lithography, Pulsed laser operation

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Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 11 April 2008 Paper

Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

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Proceedings Article | 21 March 2006 Paper

Paper

Sub-40nm pattern fabrication in 157nm interferometric immersion lithography

Takuya Hagiwara, Shou Tsuji, Kiyoshi Fujii, Masato Moriya, Osamu Wakabayashi, Akira Sumitani, Yusuke Saito, Kazuhiko Maeda

Proceedings Volume 6154, 61544H (2006) https://doi.org/10.1117/12.656981

KEYWORDS: Refractive index, Liquids, Fluorine, Chemical species, Molecules, Interferometers, Prisms, Immersion lithography, Semiconducting wafers, Transparency

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Proceedings Article | 15 March 2006 Paper

Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 12 May 2005 Paper

Paper

Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

Tsukasa Hori, Takayuki Yabu, Takanobu Ishihara, Takayuki Watanabe, Osamu Wakabayashi, Akira Sumitani, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601438

KEYWORDS: Acoustics, Excimer lasers, Lithography, Pulsed laser operation, Reflectors, Laser development, Computer simulations, Gas lasers, Laser countermeasures, Immersion lithography

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Proceedings Article | 12 May 2005 Paper

Paper

Development and evaluation of an F2 laser for immersion interference lithography at 157nm

Yasuo Itakura, Youichi Kawasa, Osamu Wakabayashi, Masato Moriya, Shinji Nagai, Akira Sumitani, Takuya Hagiwara, Toshiyuki Ishimaru, Shou Tsuji, Kiyoshi Fujii, Wataru Wakamiya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599512

KEYWORDS: Polarization, Interferometers, Lithography, Fluorine, Spatial coherence, Prisms, Immersion lithography, Fringe analysis, Laser resonators, Visibility

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Proceedings Article | 12 May 2005 Paper

Paper

Liquid immersion lithography at 157 nm

Takuya Hagiwara, Toshiyuki Ishimaru, Shou Tsuji, Kiyoshi Fujii, Yasuo Itakura, Osamu Wakabayashi, Youichi Kawasa, Keiji Egawa, Ikuo Uchino, Akira Sumitani, Yusuke Saito, Kazuhiko Maeda

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599379

KEYWORDS: Absorption, Transparency, Interferometry, Immersion lithography, Chemical species, Microfluidics, Refractive index, Fluorine, Semiconducting wafers, Glasses

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Proceedings Article | 28 May 2004 Paper

Paper

Beam quality of a new-type MOPO laser system for VUV laser lithography

Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Koutarou Sasano, Takayuki Watanabe, Takayuki Yabu, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536241

KEYWORDS: Spatial coherence, Fabry–Perot interferometers, Spectroscopy, Laser systems engineering, Lithography, Vacuum ultraviolet, Oscillators, Interferometers, Mirrors, Visibility

Read Abstract +

ArF-dry microlithography is currently switching from pre-production to mass-production and the target node is shifted from 90 nm to 65 nm. ArF-wet or F₂ laser lithography will then be an important player for the next generation node below 45 nm. Therefore, high throughput and high-resolution exposure tools for VUV lithography require VUV light sources (ArF and F₂ lasers) with high power and narrow bandwidth. In this paper, we describe the beam quality of the new- type injection lock (MOPO, master oscillator power oscillator) ArF laser system we developed and compare it with the beam quality of a master oscillator power amplifier (MOPA) ArF laser system. A high power and narrow bandwidth ArF laser can be achieved with twin laser chambers in a MOPA or an injection lock laser configuration. Compared to the MOPA system, the injection lock laser system has an excellent performance (e.g. high efficiency, long pulse duration and narrow spectrum). On the other hand, the injection lock system has some disadvantages in beam quality showing high spatial coherence, broadband emission and having a beam profile with a hole. These technical issues have been solved, however, with the following two new breakthrough-technologies: (1) a new-type injection lock system having low spatial coherence and a beam profile with no hole and (2) the optimization of the injection seed energy and discharge timing between the twin chambers for low broadband emission. The spatial coherence, the broadband spectrum and the beam profile of the new-type injection lock system were measured with a Young’s interferometer, a wide range spectrometer with etalons and a 2-dimensional beam profiler, respectively. The new-type injection lock ArF laser system had a lower spatial coherence than a conventional injection lock system, a very low broadband emission level thus preventing deterioration of exposure tools resolution, and a beam profile with no hole. Moreover, we reconfirmed that the new-type injection lock system has the same excellent performance as the conventional injection lock system.

Proceedings Article | 28 May 2004 Paper

Paper

Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography

Takashi Saito, Hirotoshi Inoue, Hitoshi Nagano, Masaya Yoshino, Osamu Wakabayashi, Ryoichi Nohdomi, Toshihiro Nishisaka, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534475

KEYWORDS: Excimer lasers, Lithography, Reliability, Data modeling, Optical lithography, High power lasers

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Proceedings Article | 28 May 2004 Paper

Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

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Proceedings Article | 26 June 2003 Paper

Paper

Spectral dynamics analysis of utlra-line-narrowed F2 laser

Takahito Kumazaki, Osamu Wakabayashi, Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe, Kazuaki Hotta, Hakaru Mizoguchi, Hiroki Tanaka, Akihiko Takahashi, Tatsuo Okada

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485381

KEYWORDS: Pulsed laser operation, Oscillators, Optical simulations, Laser systems engineering, Laser development, Amplifiers, Numerical simulations, Optical amplifiers, Resonators, Luminescence

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Proceedings Article | 26 June 2003 Paper

Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485386

KEYWORDS: Excimer lasers, Lithography, Acoustics, Reliability, Electrodes, Laser development, Laser stabilization, Magnetism, Laser ablation, Fabry–Perot interferometers

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Proceedings Article | 30 July 2002 Paper

Paper

Spectral metrologies for ultra-line-narrowed F2 laser

Takanori Nakaike, Osamu Wakabayashi, Toru Suzuki, Hakaru Mizoguchi, Kiyoharu Nakao, Ryoichi Nohdomi, Tatsuya Ariga, Naoki Kitatochi, Takashi Suganuma, Takahito Kumazaki, Kazuaki Hotta, Masaki Yoshioka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474560

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Laser development, Calibration, Refractor telescopes, Metrology, Light sources, Laser systems engineering, Oscillators, Optical lithography

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Proceedings Article | 25 February 2002 Paper

Paper

In-situ measurement of VUV optical materials under F2 laser irradiation

Yasuo Itakura, Akira Sumitani, Fumika Yoshida, Youichi Kawasa, Jing Zhang, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4426, (2002) https://doi.org/10.1117/12.456904

KEYWORDS: Transmittance, Laser irradiation, Vacuum ultraviolet, Pulsed laser operation, Laser optics, Spectrophotometry, Reflectivity, Optical coatings, Optical testing, Fluorine

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Proceedings Article | 14 September 2001 Paper

Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Hirokazu Kubo, Takashi Suganuma, Toshio Yamashita, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435662

KEYWORDS: Spectroscopy, Excimer lasers, Diffraction gratings, Holography, Diffraction, Light sources, Collimators, Surface plasmons, Mirrors, Charge-coupled devices

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Proceedings Article | 14 September 2001 Paper

Paper

Evaluation of characteristics of VUV optical materials irradiated by F2 laser

Yasuo Itakura, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435641

KEYWORDS: Transmittance, Laser irradiation, Vacuum ultraviolet, Coating, Reflectivity, Spectrophotometry, Surface finishing, Fluorine, Laser optics, Calcium

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The 157 nm molecular fluorine laser is regarded as the next generation light source for semiconductor exposure technology in the vacuum ultraviolet (VUV) region. Research for high performance F₂ laser optical materials is therefore indispensable. In this paper, we describe methods and results of evaluating optical materials used in the 157 nm region. We have developed an in-situ VUV evaluation system, which can measure the transmittance in the deep ultraviolet (DUV) and the VUV region directly after laser irradiation and the temporal transmittance during 157 nm-laser irradiation without airborne contamination. The system consists of a 2 kHz F₂ laser, an in-situ VUV irradiation system and a specialized VUV spectrophotometer. Laser irradiation and measurements were carried out under high purity nitrogen gas. During the first phase of F₂ laser irradiation (0 approximately 0.7 million pulses), a rapid transmittance increase (87% yields 89%) of calcium fluoride (CaF₂) substrates was observed and this change took almost place within one minute after starting the irradiation. It is assumed that this effect is due to surface cleaning by the F₂ laser beam. Surface polishing has been excluded because the sample surface roughness measured with an atomic force microscope (AFM) showed no difference before and after irradiation. After an irradiation of 0.1 million pulses, the fast initial increase of the transmittance slowed down and finally reached about 89%. The slower increase might be correlated with a reduced chemical bonding of hydroxyl groups on the surface, because the transmittance change at 157 nm was in good agreement with the measured VUV transmittance below 170 nm. This is corresponds with the hydroxyl absorption band below 170 nm. The transmittance and reflectance of high reflection coated substrates were examined as well. Obvious damage and a huge reflectivity loss (82.4% yields 47.4%) were observed after 1.5 billion irradiation pulses. The information obtained during this work is very useful in devising optical F₂ laser components.

Proceedings Article | 14 September 2001 Paper

Paper

Spectral measurement of ultra line-narrowed F2 laser

Osamu Wakabayashi, Jun Sakuma, Toru Suzuki, Hirokazu Kubo, Naoki Kitatochi, Takashi Suganuma, Takanori Nakaike, Takahito Kumazaki, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao, Tadashi Togashi, Yasuo Nabekawa, Shuntaro Watanabe

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435638

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Light sources, Laser development, Michelson interferometers, Calibration, Xenon, Spectral calibration, Excimer lasers, Sapphire lasers

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Proceedings Article | 6 November 2000 Paper

Paper

High-repetition-rate ArF excimer laser for microlithography

Osamu Wakabayashi, Tatsuo Enami, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Satoshi Andou, Takashi Matsunga, Hiroshi Umeda, Toru Suzuki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 4088, (2000) https://doi.org/10.1117/12.405749

KEYWORDS: Excimer lasers, Gas lasers, Xenon, Laser development, Laser stabilization, Pulsed laser operation, Light sources, Spectroscopy, Laser applications, Lithography

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Proceedings Article | 6 November 2000 Paper

Paper

Evaluation of characteristics of VUV optical materials irradiated by F2 laser

Yasuo Itakura, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4088, (2000) https://doi.org/10.1117/12.405748

KEYWORDS: Transmittance, Vacuum ultraviolet, Laser irradiation, Spectrophotometry, Laser optics, Ultraviolet radiation, Calcium, Light sources, Lithography, Laser development

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Proceedings Article | 5 July 2000 Paper

Paper

Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Tatsuo Enami, Osamu Wakabayashi, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Toru Suzuki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388981

KEYWORDS: Excimer lasers, Gas lasers, Laser development, Lithography, Deep ultraviolet, Performance modeling, Electrodes, Optical lithography, Light sources, Laser applications

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Proceedings Article | 5 July 2000 Paper

Paper

High-repetition-rate fluorine laser for microlithography

Junichi Fujimoto, Shinji Nagai, Koji Shio, Yasuaki Iwata, Kiwamu Takehisa, Toshihiro Nishisaka, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388997

KEYWORDS: Fluorine, Optical lithography, Excimer lasers, Laser development, Vacuum ultraviolet, Molecular lasers, Pulsed laser operation, Transmittance, Absorption, Solid state lasers

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Proceedings Article | 5 July 2000 Paper

Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Takanori Nakaike, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388982

KEYWORDS: Spectroscopy, Excimer lasers, Light sources, Mirrors, Diffraction gratings, Deep ultraviolet, Charge-coupled devices, Sensors, CCD image sensors, Diffraction

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Proceedings Article | 26 July 1999 Paper

Paper

Billion-level durable ArF excimer laser with highly stable energy

Osamu Wakabayashi, Tatsuo Enami, Takeshi Ohta, Hirokazu Tanaka, Hirokazu Kubo, Toru Suzuki, Katsutomo Terashima, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354311

KEYWORDS: Excimer lasers, Gas lasers, Laser development, Pulsed laser operation, Fabry–Perot interferometers, Xenon, Laser stabilization, Spectroscopy, Carbon dioxide lasers, Light sources

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Proceedings Article | 26 July 1999 Paper

Paper

Performance of a highly stable 2-kHz operation KrF laser

Tatsuo Enami, Masaki Nakano, Takayuki Watanabe, Ayako Ohbo, Tsukasa Hori, Takashi Ito, Toshihiro Nishisaka, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, Hiroaki Nakarai, Naoto Hisanaga, Takeshi Matsunaga, Hirokazu Tanaka, Tatsuya Ariga, Syouich Sakanishi, Takeshi Okamoto, Ryoichi Nodomi, Takashi Suzuki, Yuichi Takabayashi, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354313

KEYWORDS: Excimer lasers, Magnetism, Pulsed laser operation, Contamination, Semiconductors, Laser applications, Laser development, Fluctuations and noise, Fabry–Perot interferometers

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Proceedings Article | 7 April 1999 Paper

Paper

1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage

Tatsuo Enami, Takeshi Ohta, Hirokazu Tanaka, Hirokazu Kubo, Toru Suzuki, Fumika Sunaka, Katsutomo Terashima, Akira Sumitani, Youichi Kawasa, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344436

KEYWORDS: Excimer lasers, Luminescence, Laser stabilization, Crystals, Optical lithography, Laser development, Silica, Optical damage, Pulsed laser operation, Laser optics

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Proceedings Article | 29 June 1998 Paper

Paper

High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge

Tatsuo Enami, Osamu Wakabayashi, Toshihiro Nishisaka, Natsushi Suzuki, Takashi Nire, Hakaru Mizoguchi, Hiroaki Nakarai, Hirokazu Tanaka, Tatsuya Ariga, Kouji Shio, Takeshi Okamoto, Ryoichi Nodomi, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310733

KEYWORDS: Excimer lasers, Pulsed laser operation, Optical lithography, Halogens, Gas lasers, Lithography, Deep ultraviolet, Laser development, Solid state lasers, Reliability

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Proceedings Article | 7 June 1996 Paper

Paper

High-power KrF excimer laser with a solid state switch for microlithography

Hakaru Mizoguchi, Noritoshi Ito, Hiroaki Nakarai, Yukio Kobayashi, Yasuo Itakura, Hiroshi Komori, Osamu Wakabayashi, Taketo Aruga, Takashi Sakugawa, Takehisa Koganezawa

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240945

KEYWORDS: Excimer lasers, Solid state lasers, Pulsed power, Chlorine, Solid state physics, Switches, Pulsed laser operation, Optical lithography, Reliability, Switching

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Proceedings Article | 26 May 1995 Paper

Paper

Feasibility study of argon fluoride excimer laser for microlithography

Hiroshi Komori, Hidetomi Ochi, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209315

KEYWORDS: Excimer lasers, Laser systems engineering, Projection systems, Optical lithography, Lithography, Pulsed laser operation, Reflectivity, Light sources, Amplifiers, Oscillators

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Proceedings Article | 17 May 1994 Paper

Paper

Recent advances of a KrF excimer laser on a plant's practical requirements

Yukio Kobayashi, Takanobu Ishihara, Hiroaki Nakarai, Noritoshi Ito, Tomokazu Takahashi, Osamu Wakabayashi, Hakaru Mizoguchi, Yoshiho Amada, Junichi Fujimoto, Masahiko Kowaka, Yasuhiro Nozue

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175482

KEYWORDS: Excimer lasers, Pulsed laser operation, Performance modeling, Reliability, Lithographic illumination, Data modeling, Lithography, Laser development, Control systems, Inspection

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Proceedings Article | 8 August 1993 Paper

Paper

Stability of krypton fluoride laser in real stepper mode operation

Masahiko Kowaka, Yukio Kobayashi, Osamu Wakabayashi, Noritoshi Ito, Junichi Fujimoto, Takanobu Ishihara, Hiroaki Nakarai, Hakaru Mizoguchi, Yoshiho Amada, Yasuhiro Nozue

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150429

KEYWORDS: Pulsed laser operation, Excimer lasers, Optical lithography, Laser stabilization, Semiconducting wafers, Krypton, Lithography, Gas lasers, Fabry–Perot interferometers, Spectroscopy

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Proceedings Article | 1 June 1992 Paper

Paper

Narrow band KrF excimer laser for mass production of ULSI ICs

Hakaru Mizoguchi, Osamu Wakabayashi, Noritoshi Ito, Masahiko Kowaka, Junichi Fujimoto, Yukio Kobayashi, Takanobu Ishihara, Yoshiho Amada, Yasuhiro Nozue

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130349

KEYWORDS: Excimer lasers, Optical lithography, Magnetism, Pulsed laser operation, Gas lasers, Lithography, Switches, Laser development, Fabry–Perot interferometers, Lasers

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Proceedings Article | 1 July 1991 Paper

Paper

High-average-power narrow-band KrF excimer laser

Osamu Wakabayashi, Masahiko Kowaka, Yukio Kobayashi

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44820

KEYWORDS: Fabry–Perot interferometers, Excimer lasers, Prisms, Beam expanders, Electrodes, Optical lithography, Control systems, Signal detection, Light sources, Ultraviolet radiation

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Showing 5 of 33 publications

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