Prof. Puneet Gupta
at UCLA Samueli School of Engineering
SPIE Involvement:
Author | Instructor
Publications (49)

Proceedings Article | 8 March 2024 Presentation + Paper
Proceedings Volume 12890, 1289003 (2024) https://doi.org/10.1117/12.2692958
KEYWORDS: Convolution, Neural networks, Integrated photonics, Modulation, Waveguides, Backscatter, Fourier transforms, Design, Wavelength division multiplexing

Proceedings Article | 4 October 2023 Presentation + Paper
Proceedings Volume 12673, 1267307 (2023) https://doi.org/10.1117/12.2678666
KEYWORDS: Convolution, Silicon photonics, Neural networks, Receivers, Photodetectors, Microrings, Geometrical optics, Fourier transforms, Analog to digital converters, Wavelength division multiplexing

Proceedings Article | 17 March 2023 Presentation + Paper
Proceedings Volume 12424, 124240L (2023) https://doi.org/10.1117/12.2650228
KEYWORDS: Photonics, Neural networks, Silicon photonics, Lithium, Photodetectors, Machine learning, Design and modelling, Convolutional neural networks, Microrings, Artificial neural networks

Proceedings Article | 4 October 2022 Presentation
Puneet Gupta, Shurui Li
Proceedings Volume PC12204, PC1220404 (2022) https://doi.org/10.1117/12.2634039
KEYWORDS: Neural networks, Computing systems, Digital micromirror devices, Convolution, Fourier transforms, Photonics systems, Optical correlators, Optical computing, Micromirrors, Lenses

Proceedings Article | 3 October 2022 Presentation + Paper
Proceedings Volume 12204, 1220409 (2022) https://doi.org/10.1117/12.2633917
KEYWORDS: Diffraction, Convolution, Image processing, Data processing, Digital micromirror devices, Convolutional neural networks, Machine learning, Quantization, Electronics, Binary data

Proceedings Article | 9 March 2022 Presentation
Proceedings Volume PC12019, PC120190L (2022) https://doi.org/10.1117/12.2613810
KEYWORDS: Optical correlators, Joint transforms, Photonic integrated circuits, Convolution, System integration, Spatial light modulators, Prototyping, Matrices, Digital micromirror devices

Proceedings Article | 3 March 2022 Presentation + Paper
Puneet Gupta, Shurui Li
Proceedings Volume 12019, 120190B (2022) https://doi.org/10.1117/12.2614731
KEYWORDS: Convolution, Digital micromirror devices, Spatial light modulators, Neural networks, Channel projecting optics, Quantization, Optical filters, Machine learning, Optical computing

Proceedings Article | 9 March 2020 Presentation
Proceedings Volume 11299, 112990K (2020) https://doi.org/10.1117/12.2545970
KEYWORDS: Computer networks, Data processing, Optical computing, Digital micromirror devices, Convolution, Image processing, Neural networks, Spatial filters, Electronics, Optical filters

Proceedings Article | 9 October 2018 Paper
Proceedings Volume 10809, 108091H (2018) https://doi.org/10.1117/12.2501525
KEYWORDS: Photomasks, Computer programming, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Metals, 193nm lithography, Semiconducting wafers, Safety, Yield improvement

Proceedings Article | 20 March 2018 Paper
Proceedings Volume 10588, 105880O (2018) https://doi.org/10.1117/12.2297515
KEYWORDS: Line edge roughness, Metals, Optical lithography, Dielectrics, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Stochastic processes, Very large scale integration, Electrons

Proceedings Article | 26 February 2018 Presentation + Paper
Proceedings Volume 10523, 105230B (2018) https://doi.org/10.1117/12.2287944
KEYWORDS: Computer programming, 3D printing, Printing, Error analysis, Additive manufacturing, Solids, 3D modeling, Solid modeling, Computer aided design, Stereolithography

Proceedings Article | 28 March 2017 Presentation + Paper
Proceedings Volume 10148, 101480D (2017) https://doi.org/10.1117/12.2257821
KEYWORDS: Surface plasmons, Germanium, Electron beam lithography, 193nm lithography, Lithography, Photomasks, Directed self assembly, Extreme ultraviolet, Optical lithography, Manufacturing

SPIE Journal Paper | 28 March 2017
JM3, Vol. 16, Issue 01, 013505, (March 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013505
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Legal, Electron beam lithography, Germanium, Surface plasmons, Optical lithography, Double patterning technology, Directed self assembly

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9427, 94270P (2015) https://doi.org/10.1117/12.2084776
KEYWORDS: Photomasks, Lithography, Electron beam lithography, Optical lithography, Directed self assembly, Manufacturing, Semiconductor manufacturing, Visualization, Annealing, Optics manufacturing

SPIE Journal Paper | 17 December 2014
JM3, Vol. 13, Issue 04, 043018, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043018
KEYWORDS: Optical lithography, Double patterning technology, Diffusion, Extreme ultraviolet lithography, Standards development, Transistors, Binary data, Interfaces, Lithography, Machine learning

SPIE Journal Paper | 27 October 2014
Abde Ali Kagalwalla, Puneet Gupta
JM3, Vol. 13, Issue 04, 043005, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043005
KEYWORDS: Photomasks, Extreme ultraviolet, Yield improvement, Extreme ultraviolet lithography, Tolerancing, Multilayers, Lithography, Critical dimension metrology, Semiconducting wafers, Algorithms

Proceedings Article | 17 April 2014 Paper
Abde Ali Kagalwalla, Puneet Gupta
Proceedings Volume 9048, 90480U (2014) https://doi.org/10.1117/12.2046701
KEYWORDS: Photomasks, Extreme ultraviolet, Tolerancing, Extreme ultraviolet lithography, Multilayers, Lithography, Semiconducting wafers, Algorithms, Yield improvement, Optimization (mathematics)

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 905307 (2014) https://doi.org/10.1117/12.2046140
KEYWORDS: Optical lithography, Double patterning technology, Standards development, Lithography, Binary data, Lithium, Design for manufacturability, Manufacturing, Machine learning, Transistors

SPIE Journal Paper | 19 August 2013
JM3, Vol. 12, Issue 03, 033014, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.033014
KEYWORDS: Overlay metrology, Semiconducting wafers, Photomasks, Optical alignment, Transistors, Lithography, Manufacturing, Double patterning technology, Systems modeling, Scanners

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86810C (2013) https://doi.org/10.1117/12.2013619
KEYWORDS: Overlay metrology, Semiconducting wafers, Ferroelectric LCDs, Optical alignment, Photomasks, Lithography, Systems modeling, Scanners, Dysprosium, Process control

Proceedings Article | 15 March 2012 Paper
Proceedings Volume 8327, 832709 (2012) https://doi.org/10.1117/12.918067
KEYWORDS: Statistical analysis, Manufacturing, Lithography, Design for manufacturability, Standards development, Statistical modeling, Astatine, Double patterning technology, 193nm lithography

Proceedings Article | 15 March 2012 Paper
Rani Ghaida, Kanak Agarwal, Lars Liebmann, Sani Nassif, Puneet Gupta
Proceedings Volume 8327, 83270M (2012) https://doi.org/10.1117/12.916636
KEYWORDS: Double patterning technology, Optical lithography, Metals, Semiconductors, Photomasks, Manufacturing, Chlorine, Algorithm development, Electrical engineering, Extreme ultraviolet

Proceedings Article | 19 May 2011 Paper
Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan
Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394
KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

Proceedings Article | 5 April 2011 Paper
Abde Ali Kagalwalla, Puneet Gupta, Duck-Hyung Hur, Chul-Hong Park
Proceedings Volume 7974, 79740Z (2011) https://doi.org/10.1117/12.881667
KEYWORDS: Photomasks, Reticles, Yield improvement, Extreme ultraviolet, Tolerancing, Critical dimension metrology, Algorithms, Dysprosium, Lithography, Semiconducting wafers

SPIE Journal Paper | 1 January 2011
Tuck Boon Chan, Abde Ali Kagalwalla, Puneet Gupta
JM3, Vol. 10, Issue 1, 013014, (January 2011) https://doi.org/10.1117/12.10.1117/1.3545822
KEYWORDS: Transistors, Tolerancing, Lithography, Optical proximity correction, Critical dimension metrology, Device simulation, Logic, Error analysis, Digital electronics, Computer simulations

Proceedings Article | 3 April 2010 Paper
Tuck-Boon Chan, Abde Ali Kagalwalla, Puneet Gupta
Proceedings Volume 7641, 76410J (2010) https://doi.org/10.1117/12.849066
KEYWORDS: Transistors, Tolerancing, Lithography, Optical proximity correction, Ions, Critical dimension metrology, 193nm lithography, Photomasks, Resolution enhancement technologies, Nickel

SPIE Journal Paper | 1 April 2010
JM3, Vol. 9, Issue 02, 023014, (April 2010) https://doi.org/10.1117/12.10.1117/1.3452319
KEYWORDS: Capacitance, Lithography, Optical proximity correction, Optical lithography, 3D modeling, Transistors, Nano opto mechanical systems, Logic, Diffusion, TCAD

Proceedings Article | 23 September 2009 Paper
Dominic Reinhard, Puneet Gupta
Proceedings Volume 7488, 748838 (2009) https://doi.org/10.1117/12.833502
KEYWORDS: Optical proximity correction, Transistors, Mathematical modeling, Photomasks, Lithography, Error analysis, Manufacturing, Resolution enhancement technologies, Chemical elements, Instrument modeling

Proceedings Article | 23 September 2009 Paper
Rani Ghaida, George Torres, Puneet Gupta
Proceedings Volume 7488, 74882J (2009) https://doi.org/10.1117/12.833190
KEYWORDS: Photomasks, Overlay metrology, Lithography, Optical lithography, Reticles, Manufacturing, Etching, Optical alignment, Double patterning technology, Scanners

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 727514 (2009) https://doi.org/10.1117/12.814299
KEYWORDS: Overlay metrology, Semiconducting wafers, Capacitance, Metals, Critical dimension metrology, Double patterning technology, Optical alignment, Back end of line, Lithography, Tolerancing

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70283A (2008) https://doi.org/10.1117/12.793117
KEYWORDS: Information operations, Ions, Capacitance, Lithium, Diffusion, Lithography, Optical lithography, TCAD, Instrument modeling, 3D modeling

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6925, 69250I (2008) https://doi.org/10.1117/12.772889
KEYWORDS: Transistors, Ions, Capacitance, TCAD, Mathematical modeling, Manufacturing, Optimization (mathematics), Standards development, Diffusion, Oxides

SPIE Journal Paper | 1 July 2007
JM3, Vol. 6, Issue 03, 031005, (July 2007) https://doi.org/10.1117/12.10.1117/1.2774994
KEYWORDS: Optical proximity correction, Tolerancing, Photomasks, Critical dimension metrology, Resolution enhancement technologies, Model-based design, Lithography, Computer programming, Capacitance, Semiconductors

Proceedings Article | 14 March 2006 Paper
Puneet Gupta, Andrew Kahng, Sam Nakagawa, Saumil Shah, Puneet Sharma
Proceedings Volume 6156, 61560T (2006) https://doi.org/10.1117/12.658129
KEYWORDS: Lithography, Capacitance, Resolution enhancement technologies, Device simulation, Error analysis, Optical proximity correction, Databases, Resistance, Shape analysis, Critical dimension metrology

Proceedings Article | 14 March 2006 Paper
Puneet Gupta, Andrew Kahng, Swamy Muddu, Sam Nakagawa
Proceedings Volume 6156, 61560S (2006) https://doi.org/10.1117/12.658580
KEYWORDS: Optical proximity correction, Lithography, Statistical analysis, Diffusion, Instrument modeling, Standards development, Error analysis, Photomasks, Optics manufacturing, Design for manufacturability

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560B (2006) https://doi.org/10.1117/12.659577
KEYWORDS: Critical dimension metrology, Scattering, Lithography, SRAF, Optical proximity correction, Computer programming, Manufacturing, Resolution enhancement technologies, Optimization (mathematics), Binary data

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560U (2006) https://doi.org/10.1117/12.658087
KEYWORDS: TCAD, Instrument modeling, Ions, Data modeling, Line edge roughness, Silicon, Transistors, Device simulation, 3D modeling, Lithography

Proceedings Article | 9 November 2005 Paper
Puneet Gupta, Andrew Kahng, Swamy Muddu, Sam Nakagawa, Chul-Hong Park
Proceedings Volume 5992, 59921W (2005) https://doi.org/10.1117/12.633416
KEYWORDS: Optical proximity correction, Tolerancing, Information technology, Resolution enhancement technologies, Data modeling, Image quality standards, Optimization (mathematics), Design for manufacturability, Manufacturing, Performance modeling

Proceedings Article | 8 November 2005 Paper
Puneet Gupta, Andrew Kahng, Chul-Hong Park
Proceedings Volume 5992, 59923P (2005) https://doi.org/10.1117/12.632753
KEYWORDS: Etching, SRAF, Atrial fibrillation, Critical dimension metrology, Optical proximity correction, Photoresist processing, Reactive ion etching, Cadmium, Ions, Manufacturing

Proceedings Article | 28 June 2005 Paper
Puneet Gupta, Andrew Kahng, Chul-Hong Park, Kambiz Samadi, Xu Xu
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.620379
KEYWORDS: Optical proximity correction, Laser sintering, Metals, Critical dimension metrology, Chemical mechanical planarization, Semiconducting wafers, Lithography, Tolerancing, SRAF, Standards development

Proceedings Article | 28 June 2005 Paper
Puneet Gupta, Andrew Kahng, C.-H. Park
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617372
KEYWORDS: Optical proximity correction, Tolerancing, SRAF, Photomasks, Atrial fibrillation, Model-based design, Lithography, Resolution enhancement technologies, Chemical mechanical planarization, Manufacturing

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617146
KEYWORDS: Molybdenum, Source mask optimization, Computed tomography, Photomasks, Resolution enhancement technologies, Design for manufacturing, Optical proximity correction, Error analysis, Statistical analysis, Lithography

Proceedings Article | 5 May 2005 Paper
Puneet Gupta, Andrew Kahng, Chul-Hong Park
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.604872
KEYWORDS: SRAF, Optical proximity correction, Atrial fibrillation, Lithography, Manufacturing, Tolerancing, Resolution enhancement technologies, Critical dimension metrology, Photomasks, Lithographic illumination

Proceedings Article | 5 May 2005 Paper
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.601842
KEYWORDS: Semiconducting wafers, Resistance, Photomasks, Cadmium sulfide, Manufacturing, Quality measurement, Statistical analysis, Shape analysis, Photoresist processing, Optical proximity correction

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.594095
KEYWORDS: Optical proximity correction, Tolerancing, SRAF, Photomasks, Manufacturing, Model-based design, Atrial fibrillation, Resolution enhancement technologies, Lithography, Critical dimension metrology

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.535852
KEYWORDS: Optical proximity correction, Model-based design, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Lithography, Optical lithography, Diffusion, Performance modeling, Data modeling

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.538271
KEYWORDS: Optical proximity correction, Critical dimension metrology, Nano opto mechanical systems, Manufacturing, Very large scale integration, Model-based design, Photomasks, Semiconducting wafers, Resolution enhancement technologies, Lithography

Proceedings Article | 10 July 2003 Paper
Yu Chen, Puneet Gupta, Andrew Kahng
Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.487732
KEYWORDS: Capacitance, Resistance, Computer programming, Chemical mechanical planarization, Manufacturing, 3D modeling, Neodymium, Very large scale integration, Lanthanum, Edge roughness

Proceedings Article | 2 July 2003 Paper
Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.485277
KEYWORDS: Optical proximity correction, Photomasks, Resolution enhancement technologies, Lithography, Transistors, Model-based design, Laser induced breakdown spectroscopy, Monte Carlo methods, Optical lithography, Critical dimension metrology

Showing 5 of 49 publications
Course Instructor
SC1101: Understanding Design-Patterning Interactions
This course explains how layout and circuit design interact with lithography choices. We especially focus on multi-patterning technologies such as LELE double patterning and SADP. We will explore role of design in lithography technology development as well as in lithographic process control. We will further discuss design enablement of multi-patterning technologies, especially in context of cell-based digital designs.
SC1187: Understanding Design-Patterning Interactions for EUV and DSA
EUV lithography and DSA haven been accepted by the industry as most promising candidates for dimensional scaling enablement at N7 technology node and beyond. This tutorial explains how introduction of such lithography technologies going to impact layout and circuit design. Choices of lithography would impact physical design and have a significant impact at system level. This tutorial will focus on transition from 193i multi-patterning technologies to EUV lithography and DSA. Factors that would determine on the enablement of these technologies would be highlighted and possible solutions would be shared.
SC708: Impact Of Variability On VLSI Circuits
Sub-90nm CMOS technologies are giving rise to significant variation in physical parameters of VLSI designs which has adverse impact on their electrical behavior. Most manufacturing-oriented professionals are familiar with the variations in physical parameters. This course will provide attendees with knowledge of how these physical variations impact the circuit operations, i.e., their electrical behavior. The impact on timing as well as power will be discussed. We will describe relative impact of these variations on various circuit families as well as circuit design techniques to mitigate the impact of manufacturing variations. Due to the large mangnitude of these variations, it is clear that designing for worst case behavior leaves significant performance on the table. We will discuss how systematic variation can be exploited in the current static timing methodology if it is known. A statistical timing and design methodology will also be discussed that can help regain some of this performance. With an eye towards the future, we will also explore manufacturing aware design closure. The course will be illustrated with practical examples throughout.
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