Ms. Rama Puligadda Profile

Rama Puligadda

Executive Director at Brewer Science Inc

SPIE Involvement:

Author

Proceedings Article | 14 May 2004 Paper

Bottom anti-reflective coatings (BARCs) for 157-nm lithography

Liu He, Rama Puligadda, Joyce Lowes, Michael Rich

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535245

KEYWORDS: Lithography, Polymers, Reflectivity, Chromophores, Absorbance, Etching, Coating, Bottom antireflective coatings, Prototyping, Photoresist materials

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Proceedings Article | 14 May 2004 Paper

New materials for 193-nm trilayer imaging

Jim Meador, Doug Holmes, Mariya Nagatkina, Rama Puligadda, Denise Gum, Randy Bennett, Sam Sun, Tomoyuki Enomoto

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533539

KEYWORDS: Etching, Plasma etching, Photoresist materials, Silicon, Plasma, Resistance, Reflectivity, Solids, Electroluminescence, Silicon films

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Proceedings Article | 26 June 2003 Paper

BARC-resist interfacial interacations

Chelladurai Devadoss, Yubao Wang, Rama Puligadda, Joseph Lenhart, Erin Jablonski, Daniel Fischer, Sharadha Sambasivan, Eric Lin, Wen-li Wu

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485347

KEYWORDS: Polymers, Carbon, Chemistry, X-rays, Sensors, Molecules, Chlorine, Thin films, Liquids, Silicon

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Proceedings Article | 26 June 2003 Paper

Bottom antireflective coatings (BARCs) for 157-nm lithography

Liu He, Rama Puligadda, Joyce Lowes, Michael Rich

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485334

KEYWORDS: Reflectivity, Lithography, Etching, Polymers, Coating, Refractive index, Bottom antireflective coatings, Photoresist processing, Silicon, Prototyping

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Proceedings Article | 24 July 2002 Paper

Design considerations for bottom antireflective coating for 157 nm lithography

James Claypool, Rama Puligadda, Jill Akers, Rikimaru Sakamoto, Kenichi Mizusawa

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474182

KEYWORDS: Etching, Photoresist materials, Lithography, Reflectivity, Antireflective coatings, Bottom antireflective coatings, Multilayers, Resistance, Optical lithography, Absorbance

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Proceedings Article | 24 July 2002 Paper

Processing techniques for novel BARC chemistries

Nickolas Brakensiek, Chris Cox, Rama Puligadda

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474180

KEYWORDS: Etching, Photoresist materials, Optical properties, Chemistry, Optical lithography, Reflectivity, Refraction, Silica, Absorption, Silicon

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Proceedings Article | 24 August 2001 Paper

New fast-etching bottom antireflective coatings for 248-nm lithography

Rama Puligadda, Runhui Huang, Chris Cox, James Lamb, Manuel Arjona, James Claypool

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436916

KEYWORDS: Etching, Photoresist materials, Reflectivity, Coating, Optical properties, Polymers, Deep ultraviolet, Bottom antireflective coatings, Lithography, Manufacturing

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Proceedings Article | 24 August 2001 Paper

Development of a bond contribution model for structure: property correlations in dry etch studies

Tianyue Yu, Philip Ching, Christopher Ober, Shreeram Deshpande, Rama Puligadda

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436819

KEYWORDS: Etching, Polymers, Reactive ion etching, Plasma, Dry etching, Photoresist processing, Plasma etching, Ions, Resistance, Semiconductors

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Showing 5 of 8 publications

Conference Committee Involvement (2)

Advances in Resist Technology and Processing XXII

28 February 2005 | San Jose, California, United States

Advances in Resist Technology and Processing XXI

23 February 2004 | Santa Clara, California, United States

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