Dr. Richard Ciesielski Profile

Dr. Richard Ciesielski

at Physikalisch-Technische Bundesanstalt

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Author

Publications (10)

SPIE Journal Paper | 23 August 2024 Open Access

Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy

Richard Ciesielski, Janusz Bogdanowicz, Roger Loo, Yosuke Shimura, Antonio Mani, Christoph Mitterbauer, Michael Kolbe, Victor Soltwisch

JM3, Vol. 23, Issue 04, 041405, (August 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041405

KEYWORDS: Interfaces, Reflectometry, X-rays, Silicon, Germanium, Thin films, Data modeling, Transmission electron microscopy, Reflectivity, X-ray microscopy

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Proceedings Article | 10 April 2024 Presentation + Paper

Soft x-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures

Richard Ciesielski, Roger Loo, Yosuke Shimura, Janusz Bogdanowicz, Antonio Mani, Christoph Mitterbauer, Vinh-Binh Truong, Michael Kolbe, Victor Soltwisch

Proceedings Volume 12955, 1295507 (2024) https://doi.org/10.1117/12.3009953

KEYWORDS: Reflectometry, Interfaces, X-rays, Silicon, Thin films, Data modeling, Film thickness, Scanning transmission electron microscopy, Inspection, Reflectivity

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Proceedings Article | 4 October 2023 Presentation

Investigating the sensitivity of optical constant determination in the vacuum ultraviolet spectral range to s- and p-polarized reflectance

Najmeh Abbasirad, Udo Kroth, Qais Saadeh, Richard Ciesielski, Alexander Gottwald, Vicky Philipsen, Frank Scholze, Victor Soltwisch, Mattia Mulazzi

Proceedings Volume PC12695, PC1269507 (2023) https://doi.org/10.1117/12.2681821

KEYWORDS: Vacuum ultraviolet, Reflectivity, Refractive index, Reflectance spectroscopy, Polarization, Absorption, Thin films, Spectroscopy, Semiconductors, Semiconductor manufacturing

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Proceedings Article | 27 April 2023 Paper

Precise optical constant determination in the soft x-ray, EUV, and VUV spectral range

Najmeh Abbasirad, Qais Saadeh, Richard Ciesielski, Alexander Gottwald, Vicky Philippsen, Igor Makhotkin, Andrey Sokolov, Michael Kolbe, Frank Scholze, Victor Soltwisch

Proceedings Volume 12496, 124963B (2023) https://doi.org/10.1117/12.2659369

KEYWORDS: Optical constants, Vacuum ultraviolet, Ruthenium, Extreme ultraviolet, X-rays, Thin films, Reflectometry, Monte Carlo methods, Film thickness

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Proceedings Article | 27 April 2023 Presentation + Paper

Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques

Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff

Proceedings Volume 12496, 124961J (2023) https://doi.org/10.1117/12.2657963

KEYWORDS: Nanostructures, X-ray fluorescence spectroscopy, Metrology, Semiconductors, Fluorescence intensity, Data modeling, Transmission electron microscopy, Small targets

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Proceedings Article | 27 April 2023 Presentation + Paper

Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology

Richard Ciesielski, Leonhard Lohr, Hans Mertens, Anne-Laure Charley, Rudi de Ruyter, Janusz Bogdanowicz, Philipp Hönicke, Najmeh Abbasirad, Victor Soltwisch

Proceedings Volume 12496, 124961M (2023) https://doi.org/10.1117/12.2658501

KEYWORDS: Extreme ultraviolet, Scatterometry, Data modeling, Diffraction, Nanostructures, X-rays, Finite element methods, Scattering

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Proceedings Article | 1 December 2022 Paper

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Qais Saadeh, Hazem Mesilhy, Victor Soltwisch, Andreas Erdmann, Richard Ciesielski, Leonhard Lohr, Anna Andrle, Vicky Philipsen, Devesh Thakare, Christian Laubis, Frank Scholze, Michael Kolbe

Proceedings Volume 12293, 122930Y (2022) https://doi.org/10.1117/12.2643246

KEYWORDS: Extreme ultraviolet, Scatterometry, Photomasks, Refractive index, Scattering, Reflectivity, Metrology, Databases, Oxidation, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet coatings, Modeling and simulation, Optical constants, Optical metrology

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Proceedings Article | 1 November 2022 Paper

High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

V. Soltwisch, S. Glabisch, A. Andrle, V. Philipsen, Q. Saadeh, S. Schröder, L. Lohr, R. Ciesielski, S. Brose

Proceedings Volume 12472, 124720Q (2022) https://doi.org/10.1117/12.2640176

KEYWORDS: Extreme ultraviolet, Scatterometry, Diffraction, Reflectivity, X-rays, Photomasks, Reflectometry, Scattering, Ruthenium, Optical components

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Proceedings Article | 2 August 2021 Poster

Tailored local bandgap modulation as a strategy to maximize optoelectronic performance in mixed-halide perovskites

Sascha Feldmann, Timo Neumann, Richard Ciesielski, Richard Friend, Achim Hartschuh, Felix Deschler

Proceedings Volume 11809, 1180918 (2021) https://doi.org/10.1117/12.2594502

KEYWORDS: Perovskite, Modulation, Luminescence, Optoelectronics, Process control, Tandem solar cells, Solar energy, Solar cells, Semiconductors, Quantum efficiency

Proceedings Article | 20 June 2021 Presentation

Optical constants for EUV scatterometry

Richard Ciesielski, Qais Saadeeh, Philipp Naujok, Karl Opsomer, Jean-Philippe Soulié, Meiyi Wu, Vicky Philipsen, Robbert W.. van de Kruijs, Michael Kolbe, Frank Scholze, Victor Soltwisch

Proceedings Volume 11783, 117830M (2021) https://doi.org/10.1117/12.2592543

KEYWORDS: Reflectivity, Photomasks, Data modeling, X-rays, Thin films, Statistical modeling, Semiconductors, Scattering, Phase shifting, Nanostructures

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Showing 5 of 10 publications

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