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Dr. Ron E. Miller
at Texas State Technical College Waco
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 5 July 2000 Paper
Development of 157-nm small-field and mid-field microsteppers
Ron Miller, Paul Bischoff, Roger Sumner, Stephen Bowler, Warren Flack, Galen Fong
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388998
KEYWORDS: Photoresist materials, Lithography, Photoresist developing, Reticles, Optical lithography, Silica, Objectives, Semiconducting wafers, Lens design, Photomasks
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