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Rong Huang
at Applied Materials China
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Publications (1)
Proceedings Article | 10 December 2024 Paper
Edge placement error analysis through backscattered electron imaging
Yuyang Bian, Na Li, Wenzhan Zhou, Biqiu Liu, Yu Zhang, Rong Huang, Jiawang Song, Qiang Zhou, Siqun Xiao, Or Zruya, Lee Rubinstein, Aner Avakrat, Jovian Delaforce, Antoine Legrain, Qing Ye, Frederic Roberten, Amir Rosen, Michael Shifrin
Proceedings Volume 13423, 134230C (2024) https://doi.org/10.1117/12.3052520
KEYWORDS: Optical lithography, Statistical analysis, Semiconductor manufacturing, Process control, Scanning electron microscopy, Line width roughness
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