Prof. Roxann L. Engelstad Profile

Prof. Roxann L. Engelstad

Professor and Chair

SPIE Involvement:

Author

Publications (102)

Proceedings Article | 20 March 2010 Paper

Paper

A study of reticle non-flatness induced image placement error contributions in EUV lithography

Sudhar Raghunathan, Obert Wood, Pradeep Vukkadala, Roxann Engelstad, Brian Lee, Sander Bouten, Thomas Laursen, John Zimmerman, Jaewoong Sohn, John Hartley

Proceedings Volume 7636, 76360W (2010) https://doi.org/10.1117/12.847107

KEYWORDS: Reticles, Extreme ultraviolet, Semiconducting wafers, Finite element methods, Extreme ultraviolet lithography, Particles, Electrodes, Distortion, Data modeling, Printing

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SPIE Journal Paper | 1 October 2009

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for extreme ultraviolet lithography

Michael Sogard, Andrew Mikkelson, Vasu Ramaswamy, Roxann Engelstad

JM3, Vol. 8, Issue 04, 041506, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238518

KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

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Proceedings Article | 27 May 2009 Paper

Paper

Mounting methodologies to measure EUV reticle nonflatness

Venkata Siva Battula, Jacob Zeuske, Roxann Engelstad, Pradeep Vukkadala, Andrew Mikkelson, Chris Van Peski

Proceedings Volume 7470, 747014 (2009) https://doi.org/10.1117/12.835202

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Interferometry, Photography, Computer aided design, Interferometers, Extreme ultraviolet, Beam expanders, Lithography

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Proceedings Article | 11 May 2009 Paper

Paper

Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness

Kevin Orvek, Jaewoong Sohn, Jin Choi, Roxann Engelstad, Sudharshanan Raghunathan, John Zimmerman, Thomas Laursen, Yoshitake Shusuke, Tsutomu Shoki

Proceedings Volume 7379, 73790Q (2009) https://doi.org/10.1117/12.824267

KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Extreme ultraviolet, Polishing, Distortion, Overlay metrology, Optical alignment

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Proceedings Article | 18 March 2009 Paper

Paper

Characterization of electrostatic chucks for extreme ultraviolet lithography

Tom Mulholland, Jacob Zeuske, Pradeep Vukkadala, Roxann Engelstad

Proceedings Volume 7271, 72713L (2009) https://doi.org/10.1117/12.814968

KEYWORDS: Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Dielectrics, Photography, Particles, Fourier transforms, Protactinium, Semiconductors

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Proceedings Article | 18 March 2009 Paper

Paper

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for EUV lithography

Michael Sogard, Andrew Mikkelson, Vasu Ramaswamy, Roxann Engelstad

Proceedings Volume 7271, 72710H (2009) https://doi.org/10.1117/12.815402

KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics

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Proceedings Article | 2 May 2008 Paper

Paper

Status of EUVL reticle chucking

Roxann Engelstad, Jaewoong Sohn, Jacob Zeuske, Venkata Siva Battula, Pradeep Vukkadala, Chris Van Peski, Kevin Orvek, Kevin Turner, Andrew Mikkelson, Madhura Nataraju

Proceedings Volume 6792, 67920X (2008) https://doi.org/10.1117/12.798937

KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

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Proceedings Article | 30 October 2007 Paper

Paper

Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks

Roxann Engelstad, Kevin Turner, Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Venkata Siva Battula, Pradeep Vukkadala, Jacob Zeuske, Chris Van Peski

Proceedings Volume 6730, 673014 (2007) https://doi.org/10.1117/12.746842

KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

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Proceedings Article | 24 October 2007 Paper

Paper

Compensating for image placement errors induced during the fabrication and chucking of EUVL masks

Roxann Engelstad, Jaewoong Sohn, Andrew Mikkelson, Madhura Nataraju, Kevin Turner

Proceedings Volume 6730, 673004 (2007) https://doi.org/10.1117/12.752601

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Distortion, Electron beam lithography, 3D modeling, Etching, Interferometry, Surface finishing, Thin films

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Proceedings Article | 3 May 2007 Paper

Paper

Predicting and correcting for image placement errors during the fabrication of EUVL masks

R. Engelstad, J. Sohn, A. Mikkelson, M. Nataraju, K. Turner

Proceedings Volume 6533, 653314 (2007) https://doi.org/10.1117/12.737181

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Distortion, Reticles, 3D modeling, Etching, Electron beam lithography, Surface finishing, Thin films, Multilayers

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Proceedings Article | 15 March 2007 Paper

Paper

Electrostatic chucking of EUVL reticles

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Roxann Engelstad, Kevin Turner, Chris Van Peski, Kevin Orvek

Proceedings Volume 6517, 65170Y (2007) https://doi.org/10.1117/12.720621

KEYWORDS: Reticles, Extreme ultraviolet lithography, Standards development, Photomasks, Interferometers, Photography, Dielectrics, Finite element methods, Coating, Interferometry

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Proceedings Article | 20 October 2006 Paper

Paper

Measuring force uniformity in electrostatic chucking of EUVL masks

Jaewoong Sohn, Sathish Veerarghavan, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 63493B (2006) https://doi.org/10.1117/12.686282

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Particles, Analytical research, Dielectrics, Interferometry, Data modeling, Finite element methods, Fourier transforms

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Proceedings Article | 20 October 2006 Paper

Paper

Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 634939 (2006) https://doi.org/10.1117/12.686153

KEYWORDS: Reticles, Data modeling, Photomasks, Extreme ultraviolet lithography, Interferometers, Standards development, Finite element methods, Photography, Vibration isolation, Particles

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Proceedings Article | 20 October 2006 Paper

Paper

Predicting the influence of trapped particles on EUVL reticle distortion during exposure chucking

Vasu Ramaswamy, Kevin Turner, Roxann Engelstad, Edward Lovell

Proceedings Volume 6349, 634938 (2006) https://doi.org/10.1117/12.686145

KEYWORDS: Particles, Reticles, Dielectrics, Extreme ultraviolet lithography, Distortion, Particle systems, Photomasks, Data modeling, Glasses, Semiconducting wafers

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Proceedings Article | 21 June 2006 Paper

Paper

Characterizing the response of an EUV reticle during electrostatic chucking

Roxann Engelstad, Edward Lovell, Andrew Mikkelson, Madhura Nataraju, Vasu Ramaswamy, Jaewoong Sohn, Gerald Dicks, Amr Abdo, Richard Tejeda

Proceedings Volume 6281, 628107 (2006) https://doi.org/10.1117/12.692727

KEYWORDS: Reticles, Particles, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Data modeling, Zerodur, Glasses, 3D modeling, Thermal modeling

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Proceedings Article | 23 March 2006 Paper

Paper

Assessment of electron projection lithography mask membrane image placement accuracy due to fabrication processes

Michael Boruszewski, Roxann Engelstad, Gerald Dicks, Hiroshi Sakaue, Hiroshi Arimoto

Proceedings Volume 6151, 61511J (2006) https://doi.org/10.1117/12.657659

KEYWORDS: Photomasks, Picosecond phenomena, Silicon carbide, Mask making, Metrology, Electron beam lithography, Projection lithography, Image processing, 3D modeling, Etching

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Proceedings Article | 22 March 2006 Paper

Paper

EUV mask and chuck analysis: simulation and experimentation

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6151, 61510C (2006) https://doi.org/10.1117/12.657154

KEYWORDS: Photomasks, Extreme ultraviolet, Data modeling, Focus stacking software, Lithography, Semiconductors, Extreme ultraviolet lithography, Standards development, Interferometers, Contamination

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Proceedings Article | 8 November 2005 Paper

Paper

Electrostatic chucking and EUVL mask flatness analysis

M. Nataraju, A. Mikkelson, J. Sohn, R. Engelstad, E. Lovell

Proceedings Volume 5992, 59923S (2005) https://doi.org/10.1117/12.631361

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Data modeling, Standards development, Image quality, Control systems, Error analysis, Analytical research, Lithography

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Proceedings Article | 8 November 2005 Paper

Paper

Predicting wafer-level IP error due to particle-induced EUVL reticle distortion during exposure chucking

Vasu Ramaswamy, Andrew Mikkelson, Roxann Engelstad, Edward Lovell

Proceedings Volume 5992, 59923T (2005) https://doi.org/10.1117/12.631362

KEYWORDS: Reticles, Particles, Distortion, Extreme ultraviolet lithography, Particle contamination, Semiconducting wafers, Photomasks, Finite element methods, Error analysis, Glasses

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SPIE Journal Paper | 1 January 2005

Simulation of the coupled thermal/optical effects for liquid immersion nanolithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Gregory Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad, Mordechai Rothschild, Michael Switkes

JM3, Vol. 4, Issue 01, 013002, (January 2005) https://doi.org/10.1117/12.10.1117/1.1858331

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Microfluidics, Wafer-level optics, Refraction, Computational fluid dynamics, Optical lithography, Microfluidic imaging, Photomasks

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Proceedings Article | 6 December 2004 Paper

Paper

Gas flow modeling for focused ion beam (FIB) repair processes

Mohamed El-Morsi, Alexander Wei, Gregory Nellis, Roxann Engelstad, Sybren Sijbrandij, Diane Stewart, Hans Mulders

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570268

KEYWORDS: Ion beams, 3D modeling, Systems modeling, Process modeling, Photomask technology, Photomasks, Gases, Computational fluid dynamics, Computing systems, Statistical modeling

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Proceedings Article | 6 December 2004 Paper

Paper

Simulating the effects of bake process parameters on resist thermal reflow

Jae-Won Lee, Zhaohua Feng, Roxann Engelstad, Edward Lovell

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568860

KEYWORDS: Semiconducting wafers, Silicon, Photoresist processing, Thermal modeling, Convection, Polymers, Temperature metrology, Radium, Lithography, Interfaces

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Proceedings Article | 6 December 2004 Paper

Paper

Modeling and experimental investigation of bubble entrainment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Benjamin Spike, Chris Van Peski, Andrew Grenville, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569295

KEYWORDS: Semiconducting wafers, Immersion lithography, Liquids, Cameras, Fluid dynamics, Nitrogen, Image processing, Imaging systems, Refractive index, Water

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Proceedings Article | 6 December 2004 Paper

Paper

Analysis and control of template distortions in Step-and-Flash Imprint Lithography templates

Scott Schuetter, Gerald Dicks, Gregory Nellis, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569316

KEYWORDS: Nanoimprint lithography, Liquids, Fluid dynamics, Capillaries, Quartz, Absorption, Computational fluid dynamics, Computer simulations, Lithography, Silicon

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Nanoimprint lithography (NIL) was placed on the 2004 ITRS Roadmap, thus signifying its growing potential as a viable next-generation lithography technique. A particularly promising NIL technology is Step-and-Flash Imprint Lithography in which the pattern from a quartz template is transferred into a UV-curable silicon-rich monomer. The process of squeezing the monomer film during the imprint process produces significant flow-related pressures on the template which result in out-of-plane distortions (OPD). These OPD inherently produce in-plane distortions which compromise the quality of the resulting features. A single droplet imprint process, wherein a single puddle of monomer is used to cover the entire active area, suffers from throughput limitations due to the low imprint velocities that are required to control the flow-related pressures exerted on the template. In response to these limitations, recent research has focused on a multiple droplet imprint process wherein many droplets are dispensed and coalesce during the imprint process, resulting in lower flow-related pressures. In this paper, a numerical model is described that is capable of predicting both the pressures and the template distortions during a multiple droplet imprint process. The model consists of a finite element structural model of the template interfaced to a fluid-dynamic model of the flow through the gap; the distortion of the template affects the pressure applied on the template and vice versa, therefore a coupled, fluid-structure model is required. The pressure distribution during the imprint process is described by an analytical solution to the Reynolds equation that is modified to account for the coalescing process as well as the affects of absorption and surface tension. The modified solution is developed and verified through the use of computational fluid dynamic simulations. Results are described for a nominal set of conditions and a parametric study of the effect of droplet density is presented.

Proceedings Article | 6 December 2004 Paper

Paper

The influence of an electrostatic pin chuck on EUV mask flatness

Gerald Dicks, Andrew Mikkelson, Roxann Engelstad

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569034

KEYWORDS: Photomasks, Extreme ultraviolet, Dielectrics, 3D modeling, Optical lithography, Reticles, Extreme ultraviolet lithography, Electrodes, Capacitance, Interferometry

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Proceedings Article | 6 December 2004 Paper

Paper

Simulating the process flow of the Nikon EPL new geometry mask

Jaehyuk Chang, Roxann Engelstad, Edward Lovell, Michael Sogard

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569315

KEYWORDS: Photomasks, Electron beam lithography, Semiconducting wafers, Silicon, Device simulation, Oxides, Mask making, Projection lithography, Etching, Semiconductors

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Proceedings Article | 2 June 2004 Paper

Paper

Predicting microfluidic response during immersion lithography scanning

Alexander Wei, Gerald Dicks, Amr Abdo, Gregory Nellis, Roxann Engelstad, Jaehyuk Chang, Edward Lovell, William Beckman

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568024

KEYWORDS: Liquids, Semiconducting wafers, Immersion lithography, Polymers, Microfluidics, Refraction, Absorption, Optical simulations, Refractive index, Wafer-level optics

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Proceedings Article | 2 June 2004 Paper

Paper

Effect of electrostatic chucking on EUVL mask flatness

Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Lutz Aschke, Frauke Rueggeberg, Frank Sobel

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568014

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Polishing, Multilayers, Surface finishing, Data modeling, Finite element methods, Standards development, Mask making, Semiconductors

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Proceedings Article | 2 June 2004 Paper

Paper

Hard pellicle investigation for 157-nm lithography: impact on overlay

Richard Bruls, Tammo Uitterdijk, Orlando Cicilia, Peter De Bisschop, Michael Kocsis, Andrew Grenville, Chris Van Peski, Roxann Engelstad, Jaehyuk Chang, Eric Cotte, Kaname Okada, Kazushige Ohta, Hitoshi Mishiro, Shinya Kikugawa

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568003

KEYWORDS: Pellicles, Reticles, Distortion, Lithography, Overlay metrology, Polymers, Semiconducting wafers, Fluorine, Polymer thin films, Refraction

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Proceedings Article | 28 May 2004 Paper

Paper

Simulation of the coupled thermal optical effects for liquid immersion micro-/nano-lithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Greg Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537574

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Protactinium, Wafer-level optics, Refraction, Computational fluid dynamics, Microfluidics, Immersion lithography, Microfluidic imaging

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Proceedings Article | 28 May 2004 Paper

Paper

Equivalent modeling technique for predicting the transient thermomechanical response of optical reticles during exposure

Amr Abdo, Roxann Engelstad, William Beckman, Edward Lovell, John Mitchell

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537478

KEYWORDS: Reticles, Thermal modeling, Platinum, 3D modeling, Semiconducting wafers, Thermography, Glasses, Heat flux, Photomasks, Pellicles

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Proceedings Article | 20 May 2004 Paper

Paper

Modeling LEEPL mask fabrication processes

Xabier Azkorra, Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Jaehyuk Chang, Jaewoong Sohn, Madhura Nataraju, Hideyuki Eguchi

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546927

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electrodes, Mask making, Silicon, 3D modeling, Printing, Lithography, Device simulation

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Proceedings Article | 20 May 2004 Paper

Paper

Controlling template response during imprint lithography

Scott Schuetter, Gerald Dicks, Greg Nellis, Roxann Engelstad, Edward Lovell, Brad Schulteis

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546925

KEYWORDS: Lithography, Semiconducting wafers, Liquids, Fluid dynamics, Nanoimprint lithography, Performance modeling, Atmospheric modeling, Mechanics, Solids, Chemical elements

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Proceedings Article | 20 May 2004 Paper

Paper

Predicting image placement accuracy of x-ray masks

Gerald Dicks, Roxann Engelstad, Edward Lovell, Brent Boerger, Daniel Fleming, Karen Brown

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546200

KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Silicon carbide, X-rays, 3D modeling, Silicon, Etching, X-ray lithography, Chromium

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SPIE Journal Paper | 1 April 2004

Thermal response of optical reticles: experimental verification of finite element models

Amr Abdo, Roxann Engelstad, William Beckman, Edward Lovell

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669489

KEYWORDS: Lamps, Reticles, Xenon, Mercury, Calibration, Thermography, Thermal modeling, Light sources, Copper, Floods

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SPIE Journal Paper | 1 January 2004

Microfluidic simulations for immersion lithography

Alexander Wei, Gregory Nellis, Amr Abdo, Roxann Engelstad, Cheng-Fu Chen, Michael Switkes, Mordechai Rothschild

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1632500

KEYWORDS: Semiconducting wafers, Liquids, Microfluidics, Immersion lithography, Capillaries, Computational fluid dynamics, Fluid dynamics, Computer simulations, Calcium, Refraction

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SPIE Journal Paper | 1 January 2004

Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process

Gregory Nellis, Amr Abdo, Roxann Engelstad, Eric Cotte

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1630313

KEYWORDS: Pellicles, Resistance, Oxygen, Nitrogen, Protactinium, Reticles, Finite element methods, Fluid dynamics, Optical lithography, Lithography

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Proceedings Article | 17 December 2003 Paper

Paper

Modeling thermal reflow of resist contact hole arrays

Jae-Won Lee, Zhaohua Feng, Roxann Engelstad, Edward Lovell

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517886

KEYWORDS: Polymers, Photoresist processing, Lithography, Solids, Thermal modeling, Semiconducting wafers, Interfaces, Finite element methods, Analytical research, Silicon

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Proceedings Article | 17 December 2003 Paper

Paper

Optimization of EUVL reticle thickness for image placement accuracy

Liang Zheng, Andrew Mikkelson, Amr Abdo, Roxann Engelstad, Edward Lovell, Thomas White

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518062

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Device simulation, Mask making, Glasses, Metrology, Polishing, Solids

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Proceedings Article | 17 December 2003 Paper

Paper

Experimental investigation of hard pellicle purge processes

Amr Abdo, Gregory Nellis, Aya Diab, Eric Cotte, Aaron Chalekian, Roxann Engelstad, Edward Lovell, Chris Peski

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518125

KEYWORDS: Pellicles, Resistance, Reticles, Oxygen, Distortion, Mechanics, Optical lithography, Lithography, Nitrogen, Photography

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Proceedings Article | 26 June 2003 Paper

Paper

Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks

Eric Cotte, Roxann Engelstad, Edward Lovell, Daniel Tanzil, Florence Eschbach, Yulia Korobko, Minoru Fujita, Hiroaki Nakagawa

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485474

KEYWORDS: Reticles, Pellicles, Adhesives, Metrology, Sensors, Aluminum, Photomasks, Lithography, Photography, Mechanics

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Proceedings Article | 26 June 2003 Paper

Paper

Strategies for predictive control of chrome stress-induced registration errors

Alexander Wei, Gregory Hughes, Aaron Chalekian, Lawrence Mackey, Andrew Mikkelson, Roxann Engelstad

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485496

KEYWORDS: Photomasks, Image registration, Etching, Distortion, Optical lithography, Reticles, Yield improvement, Manufacturing, Chemical elements, Finite element methods

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Proceedings Article | 26 June 2003 Paper

Paper

Preliminary microfluidic simulation for immersion lithography

Alexander Wei, Greg Nellis, Amr Abdo, Roxann Engelstad, Cheng-Fu Chen, Michael Switkes, Mordechai Rothschild

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.497495

KEYWORDS: Semiconducting wafers, Liquids, Immersion lithography, Computational fluid dynamics, Microfluidics, Fluid dynamics, Computer simulations, Water, Liquid lenses, Process modeling

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Proceedings Article | 16 June 2003 Paper

Paper

EUV mask stress mapping by an experimental and hybrid finite element technique

Zhaohua Feng, Edward Lovell, Roxann Engelstad, Andrew Mikkelson, Phillip Reu, Jaewoong Sohn, Kenneth Blaedel, Andre Claudet

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490139

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Reticles, Reflectors, Lithography, Distortion, Extreme ultraviolet lithography, Chromium, Spherical lenses

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Proceedings Article | 16 June 2003 Paper

Paper

Predicting local thermomechanical distortions of the 200-mm EPL mask system

Po-Tung Lee, Roxann Engelstad, Edward Lovell, Shintaro Kawata, Noriyuki Hirayanagi, Michael Sogard

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504552

KEYWORDS: Photomasks, Semiconducting wafers, Electron beams, Silicon, Reticles, Thermal modeling, Prototyping, Lithography, Electron beam lithography, Projection lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Reduction of image placement errors in EPL masks

Obert Wood, Phillip Reu, Roxann Engelstad, Edward Lovell, Michael Lercel, Carey Thiel, Mark Lawliss, R. Mackay

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490136

KEYWORDS: Photomasks, Reticles, Silicon, Semiconducting wafers, Mask making, Metrology, Electron beam lithography, Optical alignment, Projection lithography, Lithography

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Proceedings Article | 16 June 2003 Paper

Paper

Comparison of EUV and optical device wafer heating

Jaehyuk Chang, Roxann Engelstad, Edward Lovell

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490137

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Optical lithography, Thermal modeling, Performance modeling, Distortion, 3D modeling, Extreme ultraviolet, Convection

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Proceedings Article | 28 May 2003 Paper

Paper

Ultrathin-membrane EPL masks

J. Greschner, T. Bayer, S. Kalt, H. Weiss, Phillip Reu, Roxann Engelstad, Obert Wood, Carey Thiel, Michael Gordon, Rajinder Dhaliwal, Christopher Robinson, Hans Pfeiffer

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515090

KEYWORDS: Photomasks, Silicon, Manufacturing, Lithography, Silicon carbide, Carbon, Scanning electron microscopy, Photomicroscopy, Mechanics, Microelectronics

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SPIE Journal Paper | 1 April 2003

Predicting overlay performance for electron projection lithography masks

Phillip Reu, Cheng-Fu Chen, Roxann Engelstad, Edward Lovell, Michael Lercel, Obert Wood, R. Mackay

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1563646

KEYWORDS: Photomasks, Mask making, Manufacturing, Electron beam lithography, Performance modeling, Projection lithography, Finite element methods, 3D modeling, Device simulation, Semiconducting wafers

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Proceedings Article | 27 December 2002 Paper

Paper

Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation

Eric Cotte, Phillip Reu, Roxann Engelstad, Edward Lovell, Andrew Grenville, Chris Van Peski

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468606

KEYWORDS: Pellicles, Reticles, Acoustics, Modal analysis, Lithography, Photomasks, Adhesives, Silica, Glasses, Computing systems

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Proceedings Article | 1 August 2002 Paper

Paper

Pellicle-induced distortions in advanced photomasks

Minoru Fujita, Masaya Akiyama, Masahiro Kondo, Hiroaki Nakagawa, Daniel Tanzil, Florence Eschbach, Eric Cotte, Roxann Engelstad, Edward Lovell

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476974

KEYWORDS: Adhesives, Pellicles, Photomasks, Reticles, Statistical analysis, Mechanics, Sensors, Image registration, Aluminum, Numerical simulations

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Proceedings Article | 1 August 2002 Paper

Paper

Experimental and numerical studies of the effects of materials and attachment conditions on pellicle induced distortions in advanced photomasks

Eric Cotte, Roxann Engelstad, Edward Lovell, Daniel Tanzil, Florence Eschbach, Emily Shu

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476972

KEYWORDS: Reticles, Pellicles, Temperature metrology, Photomasks, Aluminum, Adhesives, Lithography, Performance modeling, Manufacturing, Error analysis

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Proceedings Article | 1 August 2002 Paper

Paper

Hard pellicle study for 157-nm lithography

Emily Shu, Fu-Chang Lo, Florence Eschbach, Eric Cotte, Roxann Engelstad, Edward Lovell, Kaname Okada, Shinya Kikugawa

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477011

KEYWORDS: Pellicles, Reticles, Photomasks, Quartz, Interferometers, Refraction, Aluminum, Lithography, Glasses, Silica

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Proceedings Article | 1 July 2002 Paper

Paper

Mechanical modeling of the reticle and chuck for EUV lithography

Carl Martin, Andrew Mikkelson, Richard Tejeda, Roxann Engelstad, Edward Lovell, Kenneth Blaedel, Andre Claudet

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472290

KEYWORDS: Reticles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development, Reflectivity, Multilayers, Glasses, Finite element methods, Semiconducting wafers

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Proceedings Article | 1 July 2002 Paper

Paper

Thermomechanical global response of the EUVL wafer during exposure

Jaehyuk Chang, Carl Martin, Roxann Engelstad, Edward Lovell

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472350

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Distortion, Reticles, Thermal modeling, Thermal analysis, Lithography, Finite element methods, Interfaces, Optical alignment

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Proceedings Article | 1 July 2002 Paper

Paper

Thermomechanical modeling of the pin-chucked EUV reticle during exposure

Alexander Wei, Carl Martin, William Beckman, John Mitchell, Roxann Engelstad, Edward Lovell, Kenneth Blaedel

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472349

KEYWORDS: Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Particles, Helium, 3D modeling, Semiconducting wafers, Nitrogen, Thermal modeling

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Proceedings Article | 1 July 2002 Paper

Paper

Complete system of nanoimprint lithography for IC production

Donald White, Obert Wood, Cheng-Fu Chen, Edward Lovell, Roxann Engelstad

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472294

KEYWORDS: Semiconducting wafers, Polymers, Optical alignment, Binary data, Inspection, Ultraviolet radiation, Lithography, Photomasks, Silicon, Actuators

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Proceedings Article | 1 July 2002 Paper

Paper

Predicting overlay performance for electron projection lithography masks

Phillip Reu, Cheng-Fu Chen, Roxann Engelstad, Edward Lovell, Michael Lercel, Obert Wood, R. Mackay

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472280

KEYWORDS: Photomasks, Mask making, Electron beam lithography, Projection lithography, Manufacturing, Semiconducting wafers, Silicon, Etching, Control systems, Finite element methods

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Proceedings Article | 11 March 2002 Paper

Paper

Numerical and experimental studies of pellicle-induced photomask distortions

Eric Cotte, Roxann Engelstad, Edward Lovell, Yuri Shkel, Florence Eschbach, Emily Shu, Daniel Tanzil, Rebecca Calhoun

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458346

KEYWORDS: Pellicles, Reticles, Refraction, Aluminum, Photomasks, Silica, Adhesives, Lithography, Performance modeling, Temperature metrology

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Proceedings Article | 11 March 2002 Paper

Paper

Mask-related distortions of modified fused silica reticles for 157-nm lithography

Andrew Mikkelson, Amr Abdo, Eric Cotte, Jaewoong Sohn, Roxann Engelstad, Edward Lovell

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458256

KEYWORDS: Reticles, Pellicles, Electron beam lithography, Photomasks, Silica, Lithography, Device simulation, 3D modeling, Chromium, Mechanics

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Proceedings Article | 14 September 2001 Paper

Paper

Experimental model verification of the thermal response of optical reticles

Amr Abdo, Phillip Reu, Michael Schlax, Roxann Engelstad, William Beckman, John Mitchell, Edward Lovell

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435687

KEYWORDS: Reticles, Thermography, Calibration, Thermal modeling, Light sources, Copper, Optical lithography, Platinum, 3D modeling, Optical components

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Proceedings Article | 14 September 2001 Paper

Paper

Mechanical analysis of hard pellicles for 157-nm lithography

Phillip Reu, Andrew Mikkelson, Michael Schlax, Eric Cotte, Lowell Siewert, Roxann Engelstad, Edward Lovell, Giang Dao, Jun-Fei Zheng

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435651

KEYWORDS: Pellicles, Reticles, Lithography, Aluminum, Velocity measurements, Finite element methods, Silica, Optical components, Adhesives, Modal analysis

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Proceedings Article | 20 August 2001 Paper

Paper

Vibrational analysis of 200-mm EPL masks

Andrew Mikkelson, Cheng-Fu Chen, Roxann Engelstad, Edward Lovell

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436698

KEYWORDS: Photomasks, Mask cleaning, Charged-particle lithography, Metrology, Inspection, Shape analysis, 3D modeling, Performance modeling, Silicon, Aluminum

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Proceedings Article | 20 August 2001 Paper

Paper

Thermomechanical modeling of the EUV reticle during exposure

Carl Martin, Roxann Engelstad, Edward Lovell

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436683

KEYWORDS: Reticles, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectivity, Interfaces, Lithography, Glasses, Cameras, 3D modeling

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Proceedings Article | 22 January 2001 Paper

Paper

Pellicle-induced distortions in advanced optical reticles

William Semke, Lowell Siewert, Andrew Mikkelson, Eric Risius, Ning Tang, Roxann Engelstad, Edward Lovell, Jun-Fei Zheng, Giang Dao

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410695

KEYWORDS: Pellicles, Reticles, Photomasks, Adhesives, Analytical research, Lithography, Sensors, Aluminum, Error analysis, Finite element methods

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Proceedings Article | 22 January 2001 Paper

Paper

SCALPEL mask parametric study

Gerald Dicks, Roxann Engelstad, Edward Lovell, James Liddle

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410749

KEYWORDS: Metals, Photomasks, Kinematics, Charged-particle lithography, Lithography, Projection lithography, Device simulation, Scattering, Cobalt, Electron beam lithography

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Proceedings Article | 22 January 2001 Paper

Paper

Predicting thermomechanical distortions of optical reticles for 157-nm technology

Amr Abdo, Roxann Engelstad, William Beckman, John Mitchell, Edward Lovell

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410752

KEYWORDS: Reticles, Semiconducting wafers, Thermography, Photomasks, Silica, Signal attenuation, Heat flux, Convection, 3D modeling, Pellicles

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Proceedings Article | 22 January 2001 Paper

Paper

Localized resist heating due to electron-beam patterning during photomask fabrication

Alexander Wei, William Beckman, Roxann Engelstad, John Mitchell, Thanh Phung, Jun-Fei Zheng

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410727

KEYWORDS: Electron beam lithography, Picosecond phenomena, Photomasks, Optical lithography, Diffusion, Critical dimension metrology, Spatial resolution, Temperature metrology, Electron beams, Thermal effects

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Proceedings Article | 21 July 2000 Paper

Paper

Thermomechanical modeling of the SCALPEL mask during exposure

Carl Martin, Roxann Engelstad, Edward Lovell, James Liddle

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390094

KEYWORDS: Photomasks, Charged-particle lithography, Finite element methods, Lithography, Semiconducting wafers, Electron beams, Thermal modeling, Scattering, Silicon, Thermal analysis

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Proceedings Article | 21 July 2000 Paper

Paper

Comparison of substrate curvature and resonant frequency thin film stress mapping techniques

Michael Schlax, Roxann Engelstad, Edward Lovell, Cameron Brooks, Christopher Magg

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390093

KEYWORDS: Photomasks, Diagnostics, Composites, Thin films, Semiconducting wafers, Silicon carbide, Lithography, Etching, Received signal strength, Sensors

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Proceedings Article | 21 July 2000 Paper

Paper

Film stress changes during anodic bonding of NGL masks

Eric Cotte, Michael Schlax, Roxann Engelstad, Edward Lovell, Cameron Brooks

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390089

KEYWORDS: Semiconducting wafers, Photomasks, Silicon, X-rays, Wafer bonding, Chromium, Data modeling, Lithography, Mask making, Etching

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Proceedings Article | 21 July 2000 Paper

Paper

Predicting pattern transfer distortions during EUV mask fabrication

Phillip Reu, Richard Tejeda, Roxann Engelstad, Edward Lovell, Avijit Ray-Chaudhuri

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390034

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Photoresist processing, Mask making, Lithography, 3D modeling, Oxides, Silicon, Etching

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Proceedings Article | 21 July 2000 Paper

Paper

Thermomechanical simulations for microbeam reduction lithography

Gary Frisque, Po-Tung Lee, Edward Lovell, Roxann Engelstad, Ka-Ngo Leung, Vinh Ngo, Karen Scott

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390097

KEYWORDS: Lithography, Photomasks, Silicon, Chemical elements, Semiconducting wafers, Ions, Thermal modeling, Projection lithography, Ion beams, Systems modeling

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Proceedings Article | 21 July 2000 Paper

Paper

Pattern transfer distortions in IPL and EPL masks with pattern density gradients

Gary Frisque, Edward Lovell, Roxann Engelstad

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390096

KEYWORDS: Photomasks, Silicon, Error analysis, Optical lithography, Chemical elements, Lithography, Projection lithography, Mechanics, Ion beams, Mask making

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Proceedings Article | 5 July 2000 Paper

Paper

Influence of film stress on advanced optical reticle distortions

Lowell Siewert, Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Mark Mason, R. Mackay

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389008

KEYWORDS: Reticles, Etching, Thin films, Photomasks, Metrology, Optical lithography, Optical alignment, Chromium, Chemical elements, Mask making

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Proceedings Article | 30 December 1999 Paper

Paper

Placement measurement and FE modeling results for distortion control of stencil masks

Albrecht Ehrmann, Thomas Struck, Rainer Kaesmaier, Ernst Haugeneder, Hans Loeschner, Joerg Butschke, Florian Letzkus, Mathias Irmscher, Reinhard Springer, Roxann Engelstad

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373376

KEYWORDS: Photomasks, Semiconducting wafers, Distortion, Silicon, Etching, Electron beam lithography, Oxides, Quartz, Semiconductor lasers, Lamps

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Proceedings Article | 25 June 1999 Paper

Paper

Thermomechanical distortions of advanced optical reticles during exposure

Jaehyuk Chang, Amr Abdo, Byung-Kyu Kim, Theodore Bloomstein, Roxann Engelstad, Edward Lovell, William Beckman, John Mitchell

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351144

KEYWORDS: Reticles, Silica, Heat flux, Thermal modeling, Performance modeling, Convection, Photomasks, Calcium, Thermography, Optical lithography

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Proceedings Article | 25 June 1999 Paper

Paper

Finite element modeling of SCALPEL masks

Roxann Engelstad, Edward Lovell, Gerald Dicks, Carl Martin, Michael Schlax, William Semke, James Liddle, Anthony Novembre

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351085

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Finite element methods, Silicon, 3D modeling, Data modeling, Radiation effects, Mechanics, Device simulation

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Proceedings Article | 25 June 1999 Paper

Paper

Predicting mechanical distortions in x-ray masks

Eric Cotte, Roxann Engelstad, Edward Lovell, Cameron Brooks

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351116

KEYWORDS: Photomasks, Silicon carbide, Semiconducting wafers, Silicon, X-rays, Chromium, Finite element methods, Device simulation, Data modeling, Etching

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Proceedings Article | 25 June 1999 Paper

Paper

Modal analysis of the SCALPEL mask using experimental and numerical methods

William Semke, Michael Schlax, Roxann Engelstad, Edward Lovell, James Liddle

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351129

KEYWORDS: Photomasks, Charged-particle lithography, Interferometers, Modal analysis, Sensors, Silicon, Semiconducting wafers, Numerical analysis, Lithography, Particles

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Proceedings Article | 25 June 1999 Paper

Paper

Finite element modeling of ion-beam lithography masks for pattern transfer distortions

Gary Frisque, Richard Tejeda, Edward Lovell, Roxann Engelstad

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351145

KEYWORDS: Photomasks, Silicon, Carbon, Silicon carbide, Finite element methods, Ion beams, Lithography, Semiconducting wafers, Device simulation, Chemical elements

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Proceedings Article | 25 June 1999 Paper

Paper

Thermomechanical distortions of ion-beam stencil masks during exposure

Po-Tung Lee, Byung-Kyu Kim, Gary Frisque, Richard Tejeda, Roxann Engelstad, Edward Lovell, William Beckman, John Mitchell

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351146

KEYWORDS: Photomasks, Electrodes, 3D modeling, Ion beams, Thermal modeling, Silicon, Semiconducting wafers, Lithography, Solids, Projection lithography

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Proceedings Article | 25 June 1999 Paper

Paper

Mechanical distortions in advanced optical reticles

Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Theodore Bloomstein, Mark Mason

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351143

KEYWORDS: Photomasks, Chromium, Silica, Reticles, Magnesium fluoride, Mask making, Device simulation, Etching, Electron beam lithography, Transmittance

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Proceedings Article | 25 June 1999 Paper

Paper

Stress mapping techniques for the SCALPEL mask membrane system

Michael Schlax, Roxann Engelstad, Edward Lovell, James Liddle, Anthony Novembre

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351087

KEYWORDS: Composites, Charged-particle lithography, Photomasks, Sensors, Prototyping, Temperature metrology, Radiation effects, Electrodes, Lithography, Metals

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Proceedings Article | 18 December 1998 Paper

Paper

Effects of material properties on patterning distortions of optical reticles

Bassam Shamoun, Walter Trybula, Roxann Engelstad, Edward Lovell

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332829

KEYWORDS: Electron beam lithography, Reticles, Photomasks, Thermography, Thermal modeling, Magnesium fluoride, Optical components, Kinematics, Reflectors, Finite element methods

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Proceedings Article | 18 December 1998 Paper

Paper

Mechanical distortions in advanced photomasks

Andrew Mikkelson, Roxann Engelstad, Edward Lovell

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332852

KEYWORDS: Photomasks, Chromium, Device simulation, Deposition processes, Reticles, Silica, Thin films, Mask making, Optical lithography, Solids

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Proceedings Article | 5 June 1998 Paper

Paper

Dynamic characterization of step-induced vibrations of x-ray mask membranes

Michael Schlax, Roxann Engelstad, Edward Lovell

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309626

KEYWORDS: Photomasks, X-rays, Capacitors, Silicon, Data modeling, X-ray characterization, Acoustics, X-ray lithography, Standards development, Sensors

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Proceedings Article | 5 June 1998 Paper

Paper

Photomask in-plane distortion induced during e-beam patterning

Bassam Shamoun, Michael Sprague, Roxann Engelstad, Franco Cerrina

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309581

KEYWORDS: Distortion, Photomasks, Electron beam lithography, 3D modeling, Tin, Reticles, Acquisition tracking and pointing, Thermal modeling, Monte Carlo methods, Semiconductors

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Proceedings Article | 5 June 1998 Paper

Paper

Pattern-specific emulation (PSE) for ion-beam projection lithography masks using finite element analysis

Adam Fisher, Roxann Engelstad, Edward Lovell

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309616

KEYWORDS: Photomasks, Distortion, Chemical elements, Ion beams, Finite element methods, Silicon, Projection lithography, Computer simulations, Lithography, Device simulation

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Proceedings Article | 5 June 1998 Paper

Paper

Transient thermal distortions of x-ray mask membranes during exposure scanning

Zhaohua Feng, Roxann Engelstad, Edward Lovell, Franco Cerrina

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309579

KEYWORDS: Photomasks, X-rays, 3D modeling, X-ray lithography, Finite element methods, Thermal modeling, Semiconducting wafers, Silicon carbide, Standards development, Convection

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Proceedings Article | 5 June 1998 Paper

Paper

Mask requirements for advanced lithography

Walter Trybula, Roxann Engelstad

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309576

KEYWORDS: Photomasks, Distortion, Semiconducting wafers, Lithography, X-rays, Silicon, Extreme ultraviolet, Charged-particle lithography, Ion beams, Thermal effects

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Proceedings Article | 5 June 1998 Paper

Paper

Equivalent modeling of SCALPEL mask membrane distortions

Gerald Dicks, Roxann Engelstad, Edward Lovell, James Liddle

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309623

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Silicon, Computer hardware, Solids, Scattering, Semiconductors, Integrated circuits

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Proceedings Article | 5 June 1998 Paper

Paper

Analysis, design, and optimization of ion-beam lithography masks

Richard Tejeda, Roxann Engelstad, Edward Lovell, Ivan Berry

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309624

KEYWORDS: Photomasks, Distortion, Lithography, Ion beams, Silicon, Laser induced plasma spectroscopy, Optimization (mathematics), Kinematics, X-rays, Optical spheres

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Proceedings Article | 5 June 1998 Paper

Paper

Mechanical distortions in advanced optical reticles

Andrew Mikkelson, Michael Sprague, Roxann Engelstad, Edward Lovell, David Trost

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309622

KEYWORDS: Reticles, Chromium, Solids, 3D modeling, Kinematics, Photomasks, Polymethylmethacrylate, Device simulation, Modal analysis, Mask making

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Proceedings Article | 7 July 1997 Paper

Paper

Membrane distortions in x-ray masks due to specific absorber features

Adam Fisher, Roxann Engelstad, Matthew Laudon

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275771

KEYWORDS: Chemical elements, Finite element methods, Photomasks, X-rays, Silicon carbide, Tungsten, Data modeling, Process modeling, Etching, Performance modeling

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Proceedings Article | 7 July 1997 Paper

Paper

Stability and stiffness characteristics of the national x-ray mask standard

Adam Fisher, Michael Sprague, Roxann Engelstad, Daniel Laird, Steven Nash

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275789

KEYWORDS: Semiconducting wafers, Photomasks, Silicon carbide, Silicon, X-rays, Standards development, Etching, Wafer bonding, X-ray lithography, Finite element methods

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Proceedings Article | 13 May 1994 Paper

Paper

Application and experimental verification of finite element modeling of friction effects for x-ray lithography mask mounts

Hector Chen, Matthew Hansen, Roxann Engelstad, William Johnson

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175810

KEYWORDS: Photomasks, Finite element methods, X-ray lithography, Chemical elements, Interferometry, Temperature metrology, Kinematics, 3D modeling, X-rays, Data modeling

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Proceedings Article | 13 May 1994 Paper

Paper

Interferometric investigation of x-ray mask fabrication distortions

Matthew Hansen, Roxann Engelstad, Michael Reilly, Frederick Moore

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175830

KEYWORDS: Photomasks, Semiconducting wafers, X-rays, Etching, Interferometry, Mask making, Wafer bonding, Silicon, Reactive ion etching, Nickel

Read Abstract +

Proceedings Article | 9 July 1992 Paper

Paper

Effects of mounting imperfections on an x-ray lithography mask (Poster Paper)

Daniel Laird, Roxann Engelstad

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136026

KEYWORDS: Photomasks, Finite element methods, X-ray lithography, 3D modeling, Semiconducting wafers, X-rays, Synchrotrons, Mechanical engineering, Overlay metrology, Optical alignment

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Proceedings Article | 9 July 1992 Paper

Paper

Finite element analysis of dynamic thermal distortions of an x-ray mask for synchrotron radiation lithography

Eric Haytcher, Roxann Engelstad, N. Schnurr

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136019

KEYWORDS: Photomasks, 3D modeling, Finite element methods, X-ray lithography, X-rays, Helium, Thermal modeling, Synchrotron radiation, Semiconducting wafers, Convection

Read Abstract +

Proceedings Article | 1 August 1991 Paper

Paper

Parametric studies and characterization measurements of x-ray lithography mask membranes

Gregory Wells, Hector Chen, Roxann Engelstad, Shane Palmer

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47349

KEYWORDS: Photomasks, X-rays, Diamond, X-ray lithography, Distortion, Silicon carbide, Visible radiation, Silicon films, Ion beams, Manufacturing

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Proceedings Article | 1 August 1991 Paper

Paper

Optimization of an x-ray mask design for use with horizontal and vertical kinematic mounts

Daniel Laird, Roxann Engelstad, Shane Palmer

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47351

KEYWORDS: Photomasks, X-ray lithography, X-rays, Laser induced plasma spectroscopy, Ion beams, Manufacturing, Kinematics, Lithography, 3D modeling, Finite element methods

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Showing 5 of 102 publications

Proceedings Volume Editor (2)

SPIE Conference Volume | 16 June 2003

Emerging Lithographic Technologies VII

SPIE Conference Volume | 1 July 2002

Emerging Lithographic Technologies VI

Conference Committee Involvement (17)

SPIE Advanced Lithography

23 February 2014 | San Jose, United States

SPIE Advanced Lithography

24 February 2013 | San Jose, United States

SPIE Advanced Lithography

12 February 2012 | San Jose, United States

SPIE Advanced Lithography

27 February 2011 | San Jose, United States

Photomask Technology

13 September 2010 | Monterey, California, United States

Photomask Technology

15 September 2009 | Monterey, California, United States

SPIE Advanced Lithography

22 February 2009 | San Jose, United States

Photomask Technology

7 October 2008 | Monterey, California, United States

SPIE Advanced Lithography

24 February 2008 | San Jose, United States

Photomask Technology

18 September 2007 | Monterey, California, United States

SPIE Advanced Lithography

25 February 2007 | San Jose, United States

Photomask Technology

19 September 2006 | Monterey, California, United States

SPIE 31st International Symposium on Advanced Lithography

19 February 2006 | San Jose, United States

Photomask Technology

3 October 2005 | Monterey, California, United States

Microlithography 2005

27 February 2005 | San Jose, United States

Emerging Lithographic Technologies VII

25 February 2003 | Santa Clara, California, United States

Emerging Lithographic Technologies VI

5 March 2002 | Santa Clara, California, United States

Showing 5 of 17 Conference Committees

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