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Sang-Yil Chang
at Synopsys Korea Inc
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Publications (1)
Proceedings Article | 15 May 2020 Presentation + Paper
An application study on the stochastic effect of EUV photons
Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi
Proceedings Volume 11323, 113231E (2020) https://doi.org/10.1117/12.2553319
KEYWORDS: Stochastic processes, Photomasks, Data modeling, Nanoimprint lithography, Line width roughness, Calibration, Extreme ultraviolet, Photons, Scanning electron microscopy, Line edge roughness
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