CONFERENCE PROCEEDINGS
Advanced Search
Santosh Shaw
Packaging R&D Engineer at Intel Corporation
SPIE Involvement:
Author
Publications (2)
SPIE Journal Paper | 6 September 2016
Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles
Santosh Shaw, Kyle Miller, Julien Colaux, Ludovico Cademartiri
JM3, Vol. 15, Issue 03, 031607, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.031607
KEYWORDS: Plasma, Lithography, Nanoparticles, Nanocrystals, Photomasks, Plasma etching, Polymers, Etching, Copper, Hybrid fiber optics
Proceedings Article | 21 March 2016 Paper
Optics-free lithography on colloidal nanocrystal assemblies
Santosh Shaw, Kyle Miller, Julien Colaux, Ludovico Cademartiri
Proceedings Volume 9779, 97791J (2016) https://doi.org/10.1117/12.2218792
KEYWORDS: Plasma, Nanocrystals, Lithography, Etching, Plasma etching, Nanoparticles, Nanolithography, Photomasks, Zirconium dioxide
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top