Prof. Satoru Takahashi Profile

Prof. Satoru Takahashi

Professor at Univ of Tokyo

SPIE Involvement:

Conference Program Committee | Author

Publications (29)

Proceedings Article | 20 September 2023 Paper

Measurement of the diameter of the thinned optical fiber based on the spatial period of standing wave

Yushen Liu, Shotaro Kadoya, Masaki Michihata, Satoru Takahashi

Proceedings Volume 12607, 1260709 (2023) https://doi.org/10.1117/12.3005531

KEYWORDS: Standing waves, Near field scanning optical microscopy, Optical fibers, Refractive index, Light wave propagation, Single mode fibers, Tunable lasers, Semiconductor lasers, Scanning electron microscopy, Incident light

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Proceedings Article | 20 September 2023 Paper

One-step measurement of micro-periodic structures from single diffraction image

H. Goto, S. Kadoya, M. Michihata, S. Takahashi

Proceedings Volume 12607, 1260708 (2023) https://doi.org/10.1117/12.3005530

KEYWORDS: Diffraction, Reflection, Image restoration, Deflectometry, Terahertz radiation, Statistical modeling, Specular reflections, Diffraction gratings, Vibration, Photography

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Proceedings Article | 27 October 2021 Paper

The FDTD analysis for diffraction limited microgroove structure with standing wave illumination for the realization of coherent structured illumination microscopy

Yizhao Guan, Masahiro Kume, Shotaro Kadoya, Masaki Michihata, Satoru Takahashi

Proceedings Volume 11927, 119270J (2021) https://doi.org/10.1117/12.2616266

KEYWORDS: Finite-difference time-domain method, Super resolution, Near field, Near field optics, Microscopy, Waveguides, Reflection, Reconstruction algorithms, Diffraction, Light scattering

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Proceedings Article | 27 October 2021 Paper

Simulation study on diameter measurement technique for submicrometer-sized tapered fibers with standing wave illumination

Sojiro Murakami, Shotaro Kadoya, Satoru Takahashi

Proceedings Volume 11927, 1192707 (2021) https://doi.org/10.1117/12.2616248

KEYWORDS: Optical fibers, Light scattering, Numerical simulations, Tapered optical fibers, Sensors, Scattering, Mie scattering, Finite element methods, Analytical research, Near field

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Proceedings Article | 1 August 2021 Presentation + Paper

Optical adhesion of photocurable emulsion droplets using laser trapping

Shuzo Masui, Wakana Endo, Shotaro Kadoya, Masaki Michihata, Satoru Takahashi

Proceedings Volume 11798, 117981L (2021) https://doi.org/10.1117/12.2593871

KEYWORDS: Particles, Optical tweezers, Polymerization, Glasses, Ultraviolet radiation, Solids, Optical trapping, Photopolymerization, Mirrors, Water

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Proceedings Article | 15 June 2020 Paper

Nano optical measurement for next-generation nano/micro manufacturing based on localized light energy control

Satoru Takahashi

Proceedings Volume 11523, 115230G (2020) https://doi.org/10.1117/12.2574755

KEYWORDS: Optics manufacturing, Near field optics, Near field scanning optical microscopy, Optical testing, Fusion energy, Remote sensing, Diffraction, Free space optics, Control systems, Spatial resolution

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Proceedings Article | 26 March 2019 Presentation + Paper

Linewidth and roughness measurement of SAOP by using FIB and Planer-TEM as reference metrology

Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Stefan Decoster, Frederic Lazzarino, Gian Lorusso

Proceedings Volume 10959, 109590Q (2019) https://doi.org/10.1117/12.2515989

KEYWORDS: Line width roughness, Metrology, Transmission electron microscopy, Edge detection, Image processing, Semiconducting wafers, Optical lithography, Ion beams, Scanning electron microscopy

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SPIE Journal Paper | 8 September 2018

Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology

Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada, Masami Ikota

JM3, Vol. 17, Issue 04, 041010, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041010

KEYWORDS: Line width roughness, Extreme ultraviolet, Fin field effect transistors, Edge detection, Semiconductors, Metrology, Ion beams, Electron microscopes, Line edge roughness, Transmission electron microscopy

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Proceedings Article | 22 March 2018 Presentation + Paper

Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology

Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada, Masami Ikota

Proceedings Volume 10585, 105850E (2018) https://doi.org/10.1117/12.2296463

KEYWORDS: Line width roughness, Extreme ultraviolet, Fin field effect transistors, Transmission electron microscopy, Edge detection, Metrology, Line edge roughness, Semiconductors, Denoising

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SPIE Journal Paper | 19 June 2017

Scanning dimensional measurement using laser-trapped microsphere with optical standing-wave scale

Masaki Michihata, Shin-ichi Ueda, Satoru Takahashi, Kiyoshi Takamasu, Yasuhiro Takaya

OE, Vol. 56, Issue 06, 064103, (June 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.6.064103

KEYWORDS: Laser optics, Laser development, Spherical lenses, Laser metrology, 3D metrology, Metrology, Optical testing, Sensors, Phase shifts

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Proceedings Article | 19 April 2017 Presentation + Paper

3D-profile measurement of advanced semiconductor features by using FIB as reference metrology

Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota

Proceedings Volume 10145, 101451A (2017) https://doi.org/10.1117/12.2257217

KEYWORDS: CMOS sensors, Coating, 3D metrology, Scanning transmission electron microscopy, Metrology, Transmission electron microscopy, Line width roughness, Semiconducting wafers, Semiconductors

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Proceedings Article | 24 March 2016 Paper

3D-profile measurement of advanced semiconductor features by reference metrology

Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Gian Lorusso, Naoto Horiguchi

Proceedings Volume 9778, 97781T (2016) https://doi.org/10.1117/12.2218496

KEYWORDS: Scanning transmission electron microscopy, Semiconducting wafers, Transmission electron microscopy, CMOS sensors, Metrology, Semiconductors, Edge detection, 3D metrology, Electron microscopes

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Proceedings Article | 19 March 2015 Paper

Line profile measurement of advanced-FinFET features by reference metrology

Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Atsuko Yamaguchi, Gian Lorusso, Naoto Horiguchi

Proceedings Volume 9424, 942406 (2015) https://doi.org/10.1117/12.2087099

KEYWORDS: Transmission electron microscopy, Silica, Silicon, Metrology, Edge detection, Electron microscopes, Image filtering, Calibration, Scanning electron microscopy

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Proceedings Article | 2 April 2014 Paper

Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Osamu Inoue, Hiroki Kawada, Vimal Kamineni, Abhijeet Paul, A. Bello

Proceedings Volume 9050, 90501K (2014) https://doi.org/10.1117/12.2046144

KEYWORDS: Scanning transmission electron microscopy, Transmission electron microscopy, Photoresist materials, Metrology, Carbon, Coating, Edge detection, Silicon, Edge roughness

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Proceedings Article | 10 April 2013 Paper

Edge determination methodology for cross-section STEM image of photoresist feature used for reference metrology

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada

Proceedings Volume 8681, 868132 (2013) https://doi.org/10.1117/12.2011103

KEYWORDS: Scanning transmission electron microscopy, Metals, Coating, Photoresist materials, Metrology, Scanning electron microscopy, Carbon, Image transmission, Electron microscopes, Calibration

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Proceedings Article | 3 April 2012 Paper

Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada

Proceedings Volume 8324, 83240X (2012) https://doi.org/10.1117/12.916680

KEYWORDS: Scanning transmission electron microscopy, Silicon, Metals, Edge detection, Coating, Interfaces, Scanning electron microscopy, Silica, Calibration, Metrology

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Proceedings Article | 27 September 2011 Paper

Nanometer profile measurement of large aspheric optical surface by scanning deflectometry with rotatable devices

Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu

Proceedings Volume 8126, 81260R (2011) https://doi.org/10.1117/12.893393

KEYWORDS: Mirrors, Aspheric lenses, Deflectometry, Spherical lenses, Surface conduction electron emitter displays, Telescopes, Autocollimators, Optical components, Interferometry, Lenses

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Proceedings Article | 14 September 2011 Paper

Multi-probe system comprising three laser interferometers and one autocollimator for measuring flat bar mirror profile with nanometer accuracy on a high-precision micro-coordinate measuring machine

Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji

Proceedings Volume 8133, 81330T (2011) https://doi.org/10.1117/12.892385

KEYWORDS: Mirrors, Interferometers, Autocollimators, Laser stabilization, Sensors, Laser systems engineering, Motion measurement, Beam splitters, Receivers, Lasers

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Proceedings Article | 20 April 2011 Paper

Sub-nanometer line width and line profile measurement for CD-SEM calibration by using STEM

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada

Proceedings Volume 7971, 797108 (2011) https://doi.org/10.1117/12.879036

KEYWORDS: Scanning transmission electron microscopy, Silicon, Metals, Coating, Edge detection, Interfaces, Silica, Calibration, Scanning electron microscopy, Oxides

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Proceedings Article | 27 August 2010 Paper

Multiple image reconstruction for high-resolution optical imaging using structured illumination

S. Usuki, R. Kudo, S. Takahashi, K. Takamasu

Proceedings Volume 7800, 78000I (2010) https://doi.org/10.1117/12.861966

KEYWORDS: Spectral resolution, Image restoration, Diffraction, Digital imaging, Optical imaging, Diffraction gratings, Reconstruction algorithms, Charge-coupled devices, Point spread functions, Chemical elements

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Proceedings Article | 2 April 2010 Paper

Sub-nanometer calibration of CD-SEM line width by using STEM

Kiyoshi Takamasu, Kazuki Kuwabara, Satoru Takahashi, Takeshi Mizuno, Hiroki Kawada

Proceedings Volume 7638, 76381K (2010) https://doi.org/10.1117/12.846436

KEYWORDS: Silicon, Scanning transmission electron microscopy, Edge detection, Calibration, Oxides, Metrology, Scanning electron microscopy, Electroluminescence, Picosecond phenomena, Phase contrast

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Proceedings Article | 17 June 2009 Paper

Study on the temporal coherence function of a femtosecond optical frequency comb

Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto

Proceedings Volume 7389, 73891R (2009) https://doi.org/10.1117/12.824210

KEYWORDS: Temporal coherence, Michelson interferometers, Mirrors, Femtosecond phenomena, Camera shutters, Frequency combs, Interferometry, Beam splitters, Oscilloscopes, Metrology

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Proceedings Article | 12 October 2006 Paper

Development of super-resolution optical inspection system for semiconductor defects using standing wave illumination shift

S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu

Proceedings Volume 6375, 637508 (2006) https://doi.org/10.1117/12.690582

KEYWORDS: Super resolution, Light scattering, Particles, Scattering, Optical inspection, Semiconducting wafers, Inspection, Modulation, Semiconductors, Imaging systems

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Proceedings Article | 6 December 2005 Paper

Super-resolution optical inspection for semiconductor defects using standing wave shift

S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu

Proceedings Volume 6049, 60490C (2005) https://doi.org/10.1117/12.648356

KEYWORDS: Scattering, Super resolution, Light scattering, Semiconductors, Diffraction, Optical inspection, Inspection, Charge-coupled devices, Semiconducting wafers, Image acquisition

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Proceedings Article | 6 December 2005 Paper

Profile measurement of resist surface using multi-ball-cantilever AFM

S. Liu, S. Nagasawa, S. Takahashi, K. Takamasu

Proceedings Volume 6049, 604903 (2005) https://doi.org/10.1117/12.647962

KEYWORDS: Atomic force microscopy, Finite element methods, Thin films, Diamond, Interferometers, Chemical elements, Actuators, Semiconductors, Photoresist processing, Semiconductor materials

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Proceedings Article | 19 February 2003 Paper

Nonlaminate microphotosterolithography using LCD live-motion mask

Hideaki Nishino, Takashi Miyoshi, Yasuhiro Takaya, Satoru Takahashi

Proceedings Volume 4830, (2003) https://doi.org/10.1117/12.486568

KEYWORDS: LCDs, Stereolithography, Optical lithography, Imaging systems, Rapid manufacturing, Image resolution, Manufacturing, Micromachining, Liquids, Argon ion lasers

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Proceedings Article | 29 July 2002 Paper

Optical inverse scattering phase method for nano-in-process measurement of microsurface profile

Atsushi Taguchi, Takashi Miyoshi, Yasuhiro Takaya, Satoru Takahashi

Proceedings Volume 4900, (2002) https://doi.org/10.1117/12.484457

KEYWORDS: Fourier transforms, Far-field diffraction, Phase retrieval, Inverse scattering, Optical testing, Numerical simulations, Optical instrument design, Reconstruction algorithms, Spatial frequencies, Beam splitters

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Proceedings Article | 10 October 2000 Paper

Three-dimensional laser inverse scattering phase method for evaluating microstructure

Yasuhiro Takaya, Atsushi Taguchi, Satoru Takahashi, Takashi Miyoshi

Proceedings Volume 4222, (2000) https://doi.org/10.1117/12.403851

KEYWORDS: Laser scattering, Inverse scattering, 3D metrology, 3D microstructuring, Phase retrieval, Fourier transforms, Diffraction, Algorithm development, Laser development, Far-field diffraction

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Proceedings Article | 29 December 1998 Paper

Design-model-based in-process measuring method of a three-dimensional microprofile by employing the laser inverse scattering phase-reconstruction method

Yasuhiro Takaya, Kazuhiro Wake, Motoki Izukura, Satoru Takahashi, Takashi Miyoshi

Proceedings Volume 3520, (1998) https://doi.org/10.1117/12.334332

KEYWORDS: 3D modeling, Inverse scattering, Diffraction, Laser scattering, Fourier transforms, 3D metrology, Computer simulations, Phase retrieval, Reconstruction algorithms, Model-based design

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