Dr. Satoshi Enomoto
at Toyo Gosei Co Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 13 November 2024 Presentation
Satoshi Enomoto, Kohei Machida, Shunya Honda, Akihiro Konda, Takahiro Kozawa
Proceedings Volume PC13215, PC1321508 (2024) https://doi.org/10.1117/12.3034571
KEYWORDS: Extreme ultraviolet, Optical lithography, Chemically amplified resists, Metals, Line width roughness, Etching, Stochastic processes, Optical systems, Metrology, Metal oxides

Proceedings Article | 12 November 2024 Poster + Paper
K. Machida, S. Enomoto, S. Honda, A. Konda, E. Nomura, T. Kozawa
Proceedings Volume 13215, 1321514 (2024) https://doi.org/10.1117/12.3034663
KEYWORDS: Polymers, Extreme ultraviolet lithography

Proceedings Article | 9 April 2024 Presentation + Paper
Satoshi Enomoto, Kohei Machida, Shunya Honda, Takahiro Kozawa
Proceedings Volume 12957, 1295704 (2024) https://doi.org/10.1117/12.3010724
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Photoacid generators, Chemically amplified resists, Metals, Ultraviolet radiation, Etching, Power consumption, Photoresist processing

Proceedings Article | 1 May 2023 Poster + Paper
Proceedings Volume 12498, 1249826 (2023) https://doi.org/10.1117/12.2670173
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Electron beam lithography, Design and modelling, Tin, Scanning electron microscopy, Internet of things, Electron beams

Proceedings Article | 1 May 2023 Poster + Paper
Satoshi Enomoto, Kohei Machida, Michiya Naito, Takahiro Kozawa
Proceedings Volume 12498, 124981O (2023) https://doi.org/10.1117/12.2658130
KEYWORDS: Polymers, Chemically amplified resists, Extreme ultraviolet, Etching, Metals, Optical lithography, Solubility, Line width roughness, Electron beam lithography, Extreme ultraviolet lithography

Proceedings Article | 1 December 2022 Presentation + Paper
Satoshi Enomoto, Kohei Machida, Michiya Naito, Takahiro Kozawa
Proceedings Volume 12292, 122920D (2022) https://doi.org/10.1117/12.2641179
KEYWORDS: Polymers, Ultraviolet radiation, Optical lithography, Line edge roughness, Chemically amplified resists, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet, Silver, Line width roughness

Proceedings Article | 26 September 2019 Paper
Satoshi Enomoto, Kohei Machida, Michiya Naito, Takahiro Kozawa
Proceedings Volume 11147, 111471K (2019) https://doi.org/10.1117/12.2536909
KEYWORDS: Chemically amplified resists, Polymers, Optical lithography, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Stochastic processes, Diffusion, Electron beam lithography, Light sources

Proceedings Article | 25 March 2019 Paper
Proceedings Volume 10960, 109600D (2019) https://doi.org/10.1117/12.2515149
KEYWORDS: Polymers, Extreme ultraviolet lithography, Absorption, Extreme ultraviolet, Semiconducting wafers, Diffusion, Line width roughness, Chemically amplified resists, Stochastic processes, Head-mounted displays

Proceedings Article | 13 March 2018 Paper
Proceedings Volume 10586, 105860H (2018) https://doi.org/10.1117/12.2297392
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Electron beams, Chemically amplified resists, Lithography, Absorption, Diffusion, Line width roughness, Molecules

Proceedings Article | 24 April 2014 Paper
Proceedings Volume 9048, 90481S (2014) https://doi.org/10.1117/12.2046790
KEYWORDS: Lithography, Floods, Extreme ultraviolet, Ultraviolet radiation, Extreme ultraviolet lithography, Picosecond phenomena, Light sources, Chemically amplified resists, Contamination, Ions

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867926 (2013) https://doi.org/10.1117/12.2011650
KEYWORDS: Polymers, Diffusion, Extreme ultraviolet, Lithography, Line width roughness, Extreme ultraviolet lithography, Optical lithography, Semiconducting wafers, Line edge roughness, Nanotechnology

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86792C (2013) https://doi.org/10.1117/12.2011634
KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Lithography, Ionization, Manganese, Absorption, Neodymium, Surface conduction electron emitter displays, Electron beams

Proceedings Article | 1 April 2013 Paper
Tomoko Oyama, Akihiro Oshima, Tuan Dang, Satoshi Enomoto, Masakazu Washio, Seiichi Tagawa
Proceedings Volume 8679, 86792A (2013) https://doi.org/10.1117/12.2011442
KEYWORDS: X-rays, Electron beam lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Polymethylmethacrylate, Chemical reactions, Chemistry, Synchrotron radiation, Silicon, Semiconductors

Showing 5 of 13 publications
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