Dr. Satoshi Gonda Profile

Dr. Satoshi Gonda

Researcher at Nat Inst Advanced Industrial Science & Technology

SPIE Involvement:

Conference Program Committee | Author

Publications (24)

Proceedings Article | 10 April 2024 Presentation

AFM observation of EUV photoresist shrinkage due to electron-beam exposure

Ryosuke Kizu, Kazuhiro Kumagai, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 12955, 129551U (2024) https://doi.org/10.1117/12.3010107

KEYWORDS: Shrinkage, Photoresist materials, Extreme ultraviolet lithography, Atomic force microscopy

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SPIE Journal Paper | 7 December 2023

Evaluation of the change in photoresist sidewall roughness due to electron beam-induced shrinkage using atomic force microscopy

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 22, Issue 04, 044002, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.044002

KEYWORDS: Shrinkage, Photoresist materials, Line edge roughness, Scanning electron microscopy, Atomic force microscopy, 3D metrology, Lithography, Metrology, Fractal analysis, Electron beams

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Proceedings Article | 27 April 2023 Presentation + Paper

Photoresist shrinkage observation by a metrological tilting-AFM

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 12496, 1249605 (2023) https://doi.org/10.1117/12.2655566

KEYWORDS: Shrinkage, Photoresist materials, Line edge roughness, Scanning electron microscopy, Atomic force microscopy, Metrology, Lithography, Deformation, Critical dimension metrology, 3D metrology

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Proceedings Article | 13 June 2022 Presentation

High-resolution sidewall observation and LER measurement of a photoresist pattern by a metrological tilting-AFM

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume PC12053, PC1205307 (2022) https://doi.org/10.1117/12.2614122

KEYWORDS: Photoresist materials, Line edge roughness, Metrology, Atomic force microscopy, Scanning electron microscopy, Lithography, Anisotropy, Silicon, 3D metrology, Reliability

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SPIE Journal Paper | 30 May 2022

Unbiased line edge roughness measurement using profile-averaging method for precise roughness parameters measurement

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 21, Issue 02, 024001, (May 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.024001

KEYWORDS: Scanning electron microscopy, Line edge roughness, Metrology, Atomic force microscopy, Spatial resolution, Error analysis, Denoising, Silicon, Edge roughness, 3D metrology

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Proceedings Article | 22 February 2021 Presentation + Paper

Evaluating SEM-based LER metrology using a metrological tilting-AFM

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 11611, 1161117 (2021) https://doi.org/10.1117/12.2583475

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SPIE Journal Paper | 23 October 2020 Open Access

Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 19, Issue 04, 044001, (October 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.4.044001

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SPIE Journal Paper | 23 March 2020 Open Access

Line edge roughness measurement on vertical sidewall for reference metrology using a metrological tilting atomic force microscope

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 19, Issue 01, 014003, (March 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.1.014003

KEYWORDS: Line edge roughness, Metrology, Atomic force microscopy, Clouds, Scanning electron microscopy, Atomic force microscope, Servomechanisms, 3D metrology, Transmission electron microscopy, Semiconductors

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Proceedings Article | 20 March 2020 Presentation + Paper

Comparison of SEM and AFM performances for LER reference metrology

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 11325, 113250Q (2020) https://doi.org/10.1117/12.2551468

KEYWORDS: Scanning electron microscopy, Line edge roughness, 3D metrology, Metrology, Spatial resolution, Edge roughness, Atomic force microscopy, 3D image processing, Error analysis, Lithography

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Proceedings Article | 26 March 2019 Paper

Accurate vertical sidewall measurement by a metrological tilting-AFM for reference metrology of line edge roughness

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 10959, 109592B (2019) https://doi.org/10.1117/12.2511712

KEYWORDS: Line edge roughness, Metrology, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Surface roughness, Semiconductors, Lithography, Critical dimension metrology, Dimensional metrology

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Proceedings Article | 6 August 2014 Paper

Recent activity of international comparison for nanoparticle size measurement

Kayori Takahashi, Keiji Takahata, Ichiko Misumi, Kentaro Sugawara, Satoshi Gonda, Kensei Ehara

Proceedings Volume 9232, 92320L (2014) https://doi.org/10.1117/12.2063532

KEYWORDS: Particles, Atomic force microscopy, Scanning electron microscopy, Nanoparticles, Scattering, Dynamic light scattering, Diffusion, Standards development, Metrology, Nanomaterials

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Proceedings Article | 22 June 2013 Paper

Pixel length calibration using a pattern matching method for secondary-electron images

Kentaro Sugawara, Ichiko Misumi, Satoshi Gonda

Proceedings Volume 8769, 876909 (2013) https://doi.org/10.1117/12.2021086

KEYWORDS: Interferometers, Particles, Scanning electron microscopy, Calibration, Laser systems engineering, Image acquisition, Image processing, Metrology, Laser development, Electron microscopes

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Proceedings Article | 14 May 2012 Paper

Extension of gravity center method for diameter calibration of polystyrene standard particles with a metrological AFM

Ichiko Misumi, Keiji Takahata, Kentaro Sugawara, Satoshi Gonda, Kensei Ehara

Proceedings Volume 8378, 83780J (2012) https://doi.org/10.1117/12.918528

KEYWORDS: Particles, Calibration, Thin films, Metrology, Atomic force microscopy, Optical spheres, Mica, Convolution, Data centers, Standards development

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Proceedings Article | 1 June 2011 Paper

Development of photomask linewidth measurement and calibration using AFM and SEM in NMIJ

Kentaro Sugawara, Osamu Sato, Ichiko Misumi, Satoshi Gonda, Mingzi Lu

Proceedings Volume 8036, 80360U (2011) https://doi.org/10.1117/12.883851

KEYWORDS: Scanning electron microscopy, Photomasks, Calibration, Atomic force microscopy, Image processing, Chromium, Glasses, Standards development, Image resolution, Microscopes

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Proceedings Article | 6 November 2006 Paper

Pitch calibration of one-dimensional grating standard by tapping mode nanometrological atomic force microscope

Qiangxian Huang, Ichiko Misumi, Satoshi Gonda, Osamu Sato, Tomizo Kurosawa

Proceedings Volume 6357, 635730 (2006) https://doi.org/10.1117/12.717161

KEYWORDS: Atomic force microscopy, Interferometers, Calibration, Atomic force microscope, Temperature metrology, Solids, Error analysis, Metrology, Data processing, Standards development

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Proceedings Article | 13 October 2006 Paper

Research on pitch analysis methods for calibration of one-dimensional grating standard based on nanometrological AFM

Qiangxian Huang, Satoshi Gonda, Ichiko Misumi, Taeho Keem, Tomizo Kurosawa

Proceedings Volume 6280, 628007 (2006) https://doi.org/10.1117/12.715251

KEYWORDS: Atomic force microscopy, Calibration, Analytical research, Interferometers, Standards development, Data analysis, Data centers, Diffraction gratings, Scanning electron microscopy, Scanning tunneling microscopy

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Proceedings Article | 24 March 2006 Paper

Three-dimensional metrology with side-wall measurement using tilt-scanning operation in digital probing AFM

Ken Murayama, Satoshi Gonda, Hajime Koyanagi, Tsuneo Terasawa

Proceedings Volume 6152, 615216 (2006) https://doi.org/10.1117/12.654346

KEYWORDS: 3D metrology, Atomic force microscopy, 3D image processing, Semiconducting wafers, Semiconductors, Metrology, Silicon, Scanning electron microscopy, Carbon nanotubes, Critical dimension metrology

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Proceedings Article | 10 May 2005 Paper

Novel CD-SEM calibration reference patterned by EB cell projection lithography

Yoshinori Nakayama, Satoshi Gonda, Ichiko Misumi, Tomizo Kurosawa, Jun-ichiro Kitta, Hisaichi Mine, Katsuhiro Sasada, Shozo Yoneda, Takeshi Mizuno

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.597165

KEYWORDS: Calibration, Diffraction gratings, Diffraction, Photomasks, Projection lithography, Silicon, Dry etching, Deep ultraviolet, Metrology, Semiconducting wafers

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Proceedings Article | 10 May 2005 Paper

AFM measurement of linewidth with sub-nanometer scale precision

Satoshi Gonda, Kazuto Kinoshita, Hironori Noguchi, Tomizo Kurosawa, Hajime Koyanagi, Ken Murayama, Tsuneo Terasawa

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599442

KEYWORDS: Atomic force microscopy, Interferometers, 3D scanning, Scanners, Digital signal processing, Servomechanisms, Metrology, Mirrors, Signal processing, Precision measurement

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Proceedings Article | 2 August 2004 Paper

Compact high-resolution homodyne interferometer for nanometer-scale multidimensional AFM metrology

Satoshi Gonda, Kazuto Kinoshita, Hironori Noguchi, Hajime Koyanagi, Tsuneo Terasawa

Proceedings Volume 5532, (2004) https://doi.org/10.1117/12.559173

KEYWORDS: Interferometers, Atomic force microscopy, Mirrors, Scanners, 3D scanning, Homodyne detection, Semiconducting wafers, Beam splitters, Metrology, Servomechanisms

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SPIE Journal Paper | 1 January 2004

Atomic-resolution measurements with a new tunable diode laser-based interferometer

Richard Silver, H. Zou, Satoshi Gonda, Bradley Damazo, Jau-Shi Jun, Carsten Jensen, Lowell Howard

OE, Vol. 43, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1631002

KEYWORDS: Semiconductor lasers, Scanning tunneling microscopy, Interferometers, Mirrors, Data acquisition, Tunable diode lasers, Polarization, Motion measurement, Crystals, Distance measurement

Proceedings Article | 24 July 2002 Paper

New design and uncertainty budget for a metrology UHV-STM used in direct measurements of atom spacings

Satoshi Gonda, Hui Zhou, Joseph Fu, Richard Silver

Proceedings Volume 4608, (2002) https://doi.org/10.1117/12.465125

KEYWORDS: Semiconductor lasers, Scanning tunneling microscopy, Interferometers, Metrology, Chemical species, Diodes, Calibration, Crystals, Polarization, Tunable lasers

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Proceedings Article | 24 July 2002 Paper

Effects of etching time and wafer miscut on the morphology of etched Si(111) surfaces

Hui Zhou, Joseph Fu, Sotoshi Gonda, Richard Silver

Proceedings Volume 4608, (2002) https://doi.org/10.1117/12.465124

KEYWORDS: Etching, Semiconducting wafers, Silicon, Hydrogen, Metrology, Standards development, Chemical species, Ultrasonics, Semiconductor manufacturing, Manufacturing

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Proceedings Article | 10 June 1996 Paper

High-resolution photoelectron yield spectroscopy of oxide superconductors

Masashi Kawasaki, Satoru Ohashi, Toshikazu Kitajima, Satoshi Gonda, Noriyoshi Kanda, Ryuta Tsuchiya, Kohji Kishio, Hideomi Koinuma

Proceedings Volume 2696, (1996) https://doi.org/10.1117/12.241783

KEYWORDS: Superconductors, Crystals, Metals, Semiconductors, Photoemission spectroscopy, Ultraviolet radiation, Spectroscopy, Gold, Cryogenics, Thin films

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