CONFERENCE PROCEEDINGS
Advanced Search
Scott Ashkenaz
Consultant at SMArt
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 2 June 2000 Paper
Accelerated yield learning in agressive lithography
Kevin Monahan, Scott Ashkenaz, Xing Chen, Patrick Lord, Mark Merrill, Rich Quattrini, James Wiley
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386505
KEYWORDS: Metrology, Semiconducting wafers, Lithography, Critical dimension metrology, Process control, Overlay metrology, Yield improvement, Inspection, Manufacturing, Information operations
Proceedings Article | 1 July 1994 Paper
Sampling considerations for semiconductor manufacture
Proceedings Volume 10274, 102740G (1994) https://doi.org/10.1117/12.187458
KEYWORDS: Semiconductor manufacturing, Semiconductors, Manufacturing, Control systems
Proceedings Article | 17 May 1994 Paper
Overlay and lens distortion in a modified illumination stepper
Chul-Seung Lee, Jeong Soo Kim, Ikboum Hur, Young-Mog Ham, Soo-Han Choi, YeonSeon Seo, Scott Ashkenaz
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175404
KEYWORDS: Distortion, Error analysis, Reticles, Lithographic illumination, Photomasks, Semiconducting wafers, Image processing, Phase shifts, Image resolution, Astatine
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top