Prof. Seiji Samukawa Profile

Prof. Seiji Samukawa

at Tohoku Univ

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 17 November 2016 Paper

Defect-free fabrication of nano-disk and nano-wire by fusion of bio-template and neutral beam etching

S. Samukawa, Shuichi Noda, Akio Higo, Manabu Yasuda, Kazumi Wada

Proceedings Volume 10027, 100270Q (2016) https://doi.org/10.1117/12.2247702

KEYWORDS: Nanowires, Etching, Nanolithography, Luminescence, Germanium, Silicon, Gallium arsenide, Iron, Ions, Plasma

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Proceedings Article | 17 March 2015 Paper

Low-temperature and damage-free transition metal and magnetic material etching using a new metallic complex reaction

Toshihisa Nozawa, Ryo Miyama, Shinji Kubota, Kazuki Moyama, Tomihiro Kubota, Seiji Samukawa

Proceedings Volume 9428, 94280N (2015) https://doi.org/10.1117/12.2178327

KEYWORDS: Etching, Magnetism, Plasma, Platinum, Transition metals, Argon, Reactive ion etching, Gases, Plasma generation, Semiconducting wafers

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Proceedings Article | 28 March 2014 Paper

Large-radius neutral beam enhanced chemical vapor deposition process for non-porous ultra-low-k SiOCH

Yoshiyuki Kikuchi, Yasuaki Sakakibara, Seiji Samukawa

Proceedings Volume 9054, 90540H (2014) https://doi.org/10.1117/12.2048898

KEYWORDS: Copper, Silicon, Plasma, Plasma enhanced chemical vapor deposition, Annealing, Diffusion, Silicon films, Chemical species, Chemical vapor deposition, Oxygen

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Proceedings Article | 29 March 2013 Paper

Novel ArF photoresist polymer to suppress the roughness formation in plasma etching processes

Keisuke Kato, Atsushi Yasuda, Shin-ichi Maeda, Takuji Uesugi, Takeru Okada, Akira Wada, Seiji Samukawa

Proceedings Volume 8682, 86821R (2013) https://doi.org/10.1117/12.2011096

KEYWORDS: Photoresist materials, Polymers, Etching, Plasma etching, Plasma, Chemical reactions, Polymer thin films, Surface roughness, Chlorine, Chemical analysis

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