KEYWORDS: Electron beam lithography, Lithography, Polymethylmethacrylate, Silicon, Electron beams, Photoresist processing, Wet etching, Monte Carlo methods, Etching, Nanolithography
Nano-pattering process by low-voltage electron beam lithography based on microcolumn with beam energy of 500 eV
has been developed. Low kV exposure provides the advantages of high sensitivity, reduced charging, and a lack of
proximity and heating effects. However a low-voltage electron beam has very thin penetration range. At 500 V, the
penetration range is less than 20 nm, while typical resist thickness is > 200 nm. A resist process with bilayer scheme, 17
nm-thick PMMA resist on 100 nm-thick SiO2 layer, and wet etch method was demonstrated for 250 nm line patterns
transfer to Si substrate. The process was applied to fabricate periodic grating patterns on a silicon substrate. The results
of nano-pattern process by low energy microcolumn lithography will be discussed in detail.
We report numerically analyzed results on various parameters of planar-type long period waveguide gratings
(LPWGs) for potential temperature-insensitive refractive index sensor applications. The LPWGs based on polymer
materials can be low cost mass-produceable devices because they can be fabricated in a wafer-level process with a
typical imprinting technology and can be integrated with other multi-functional photonic devices of planar type such as
optical printed circuit board (O-PCB). We have designed a temperature insensitive long-period waveguide grating by
using a 4-layer waveguide structure which consists of a silica substrate, polymer core and clad layers, and the upper clad
layer for materials or analytes to be tested. Our numerical calculation show that there are optimized conditions on the
thermo-optic coefficients of the core polymer materials for a temperature-independent LPWGs with given core and clad
polymer materials as well as with the given waveguide dimensions. The maximum temperature range and the refractive
index sensitivity of the temperature-independent LPWGs have been also calculated for several conditions of the
waveguide parameters.
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