At the core of Design-technology co-optimization (DTCO) processes, is the Design Space Exploration (DSE), where different design schemes and patterns are systematically analyzed and design rules and processes are co-optimized for optimal yield and performance before real products are designed. Synthetic layout generation offers a solution. With rules-based synthetic layout generation, engineers design rules to generate realistic layout they will later see in real product designs. This paper shows two approaches to generating full coverage of the design space and providing contextual layout. One approach relies on Monte Carlo methods and the other depends on combining systematic and random methods to core patterns and their contextual layout. Also, in this paper we present a hierarchical classification system that catalogs layouts based on pattern commonality. The hierarchical classification is based on a novel algorithm of creating a genealogical tree of all the patterns in the design space.
Due to limited availability of DRC clean patterns during the process and RET recipe development, OPC recipes are not tested with high pattern coverage. Various kinds of pattern can help OPC engineer to detect sensitive patterns to lithographic effects. Random pattern generation is needed to secure robust OPC recipe. However, simple random patterns without considering real product layout style can’t cover patterning hotspot in production levels. It is not effective to use them for OPC optimization thus it is important to generate random patterns similar to real product patterns. This paper presents a strategy for generating random patterns based on design architecture information and preventing hotspot in early process development stage through a tool called Layout Schema Generator (LSG). Using LSG, we generate standard cell based on random patterns reflecting real design cell structure – fin pitch, gate pitch and cell height. The output standard cells from LSG are applied to an analysis methodology to assess their hotspot severity by assigning a score according to their optical image parameters - NILS, MEEF, %PV band and thus potential hotspots can be defined by determining their ranking. This flow is demonstrated on Samsung 7nm technology optimizing OPC recipe and early enough in the process avoiding using problematic patterns.
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