Dr. Shane R. Palmer Profile

Dr. Shane R. Palmer

Senior Principal Scientist

SPIE Involvement:

Author

Area of Expertise:

Optical and Etch Proximity Correction , Lithographic Simulation , Electron Beam Technology , Electromagnetic Scattering , Metrology

Publications (18)

SPIE Journal Paper | 30 March 2016

Lithographic imaging-driven pattern edge placement errors at the 10-nm node

Jacek Tyminski, Julia Sakamoto, Shane Palmer, Stephen Renwick

JM3, Vol. 15, Issue 02, 021402, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021402

KEYWORDS: Scanners, Optical proximity correction, Photomasks, Lithography, Metals, Error analysis, Overlay metrology, Semiconducting wafers, Statistical analysis, Optical lithography

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Proceedings Article | 15 March 2016 Paper

Lithographic imaging-driven pattern edge placement errors at 10nm node

Jacek Tyminski, Stephen Renwick, Shane Palmer, Julia Sakamoto, Steven Slonaker

Proceedings Volume 9780, 97800C (2016) https://doi.org/10.1117/12.2218146

KEYWORDS: Lithography, Optical lithography, Computational lithography, Optical proximity correction, Integrated circuit design, 193nm lithography, Performance modeling, Scanners, Optical design, Optical alignment, Semiconducting wafers, Monte Carlo methods, Image processing, Etching, Ions, Statistical analysis

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Proceedings Article | 23 March 2011 Paper

Illuminator predictor for effective SMO solutions

Daniel Smith, Naonori Kita, Nobumichi Kanayamaya, Ryota Matsui, Shane Palmer, Tomoyuki Matsuyama, Donis Flagello

Proceedings Volume 7973, 797309 (2011) https://doi.org/10.1117/12.879116

KEYWORDS: Source mask optimization, Fiber optic illuminators, Point spread functions, Ray tracing, Lithographic illumination, Reticles, Critical dimension metrology, Lithography, Computer simulations, Imaging systems

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Proceedings Article | 27 March 2007 Paper

Demonstration of sub-45-nm features using azimuthal polarization on a 1.30NA immersion microstepper

Emil Piscani, Shane Palmer, Chris Van Peski

Proceedings Volume 6520, 652025 (2007) https://doi.org/10.1117/12.720863

KEYWORDS: Polarization, Resolution enhancement technologies, Imaging systems, Photomasks, Immersion lithography, Scanning electron microscopy, Optical proximity correction, Image resolution, Semiconducting wafers, Finite element methods

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Proceedings Article | 15 March 2006 Paper

Hyper-NA model validation for the 45-nm node

Shane Palmer, Min Bai, Paul J. van Adrichem

Proceedings Volume 6155, 615505 (2006) https://doi.org/10.1117/12.656059

KEYWORDS: Data modeling, Optical proximity correction, Photomasks, Polarization, Semiconducting wafers, Fiber optic illuminators, Lithography, Silicon, Immersion lithography, Mathematical modeling

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Proceedings Article | 12 May 2005 Paper

Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

Marylyn Bennett, Andrew Grenville, Scott Hector, Shane Palmer, Leonardus Leunissen, Vicky Philipsen, Theodore Bloomstein, Dennis Hardy, Mordechai Rothschild, James Hilfiker

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600098

KEYWORDS: Photomasks, Diffraction, Sensors, Polarization, Binary data, Diffraction gratings, Phase shifts, Polarizers, Laser beam diagnostics, Attenuators

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Proceedings Article | 22 January 2001 Paper

Dual-mask model-based proximity correction for high-performance 0.10-um CMOS process

Shane Palmer, Mark Mason, John Randall, Tom Aton, Keeho Kim, Alexander Tritchkov, James Burdorf, Michael Rieger, John Stirniman

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410679

KEYWORDS: Optical proximity correction, Photomasks, Binary data, Data modeling, Etching, Phase shifts, Optical lithography, Databases, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 5 July 2000 Paper

Variable-threshold optical proximity correction (OPC) models for high-performance 0.18-um process

Hongmei Liao, Shane Palmer, Kayvan Sadra

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388938

KEYWORDS: Optical proximity correction, Semiconducting wafers, Data modeling, Scanning electron microscopy, Etching, Critical dimension metrology, Photomasks, Photoresist processing, Silicon, Lithography

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Proceedings Article | 5 July 2000 Paper

OPC methodology and implementation to prototyping of small SRAM cells of 0.18-um node logic gate levels

Qizhi He, Mi-Chang Chang, Shane Palmer, Kayvan Sadra

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389083

KEYWORDS: Optical proximity correction, Reticles, Optical lithography, Logic devices, Scanning electron microscopy, Prototyping, Lithography, Process modeling, Transistors, Digital signal processing

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Proceedings Article | 26 May 1995 Paper

Feature biasing versus feature-assisted lithography: a comparison of proximity correction methods for 0.5*(lambda/NA) lithography

Rainer Pforr, Kurt Ronse, Luc Van den Hove, Anthony Yen, Shane Palmer, Gene Fuller, Oberdan Otto

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209249

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Critical dimension metrology, Electroluminescence, Phase shifts, Binary data, Cadmium, Lithographic illumination, Transparency

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Proceedings Article | 26 May 1995 Paper

Printability study of opaque and transparent defects using standard and modified illumination

Sonya Shaw, Shane Palmer, Steven Schuda

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209313

KEYWORDS: Opacity, Reticles, Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Photomasks, Tolerancing, Bridges, Pellicles, Phase shifts

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SPIE Journal Paper | 1 October 1993

Benchmark comparison of i-line, alternating phase shift masks

Cesar Garza, Shane Palmer, Jing Shu

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.147129

KEYWORDS: Phase shifts, Reticles, Photomasks, Quartz, Lithography, Manufacturing, Chemical vapor deposition, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

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Proceedings Article | 8 August 1993 Paper

Quarter-micron lithography using a deep-UV stepper with modified illumination

Anthony Yen, William Partlo, Shane Palmer, Maureen Hanratty, Michael Tipton

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150421

KEYWORDS: Lithographic illumination, Lithography, Deep ultraviolet, Photoresist processing, Excimer lasers, Fiber optic illuminators, Optical lithography, Scanning electron microscopy, Reticles, Image analysis

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Proceedings Article | 1 June 1992 Paper

Exploring the limits of phase-shift lithography: Part I--the alternating shifter

Shane Palmer, Cesar Garza, Craig Sager, Patrick Reynolds

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130311

KEYWORDS: Photomasks, Information operations, Lithography, Photoresist materials, Optical lithography, Phase shifts, Photoresist processing, Scanning electron microscopy, Photomicroscopy, Reticles

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Proceedings Article | 1 June 1992 Paper

Lithographic evaluation and characterization of a negative deep-UV resist system for the next generation of DRAMs

Doowon Suh, Shane Palmer, Subhankar Chatterjee, Hans-Joachim Merrem, Robert Haltom

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59758

KEYWORDS: Lithography, Deep ultraviolet, Temperature metrology, Chemically amplified resists, Diffusion, Reticles, Photoresist processing, Scanning electron microscopy, Chemistry, Polymers

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Proceedings Article | 1 August 1991 Paper

Parametric studies and characterization measurements of x-ray lithography mask membranes

Gregory Wells, Hector Chen, Roxann Engelstad, Shane Palmer

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47349

KEYWORDS: Photomasks, X-rays, Diamond, X-ray lithography, Distortion, Silicon carbide, Visible radiation, Silicon films, Ion beams, Manufacturing

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Proceedings Article | 1 August 1991 Paper

Optimization of an x-ray mask design for use with horizontal and vertical kinematic mounts

Daniel Laird, Roxann Engelstad, Shane Palmer

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47351

KEYWORDS: Photomasks, X-ray lithography, X-rays, Laser induced plasma spectroscopy, Ion beams, Manufacturing, Kinematics, Lithography, 3D modeling, Finite element methods

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Proceedings Article | 1 June 1991 Paper

Process latitude measurements on chemically amplified resists exposed to synchrotron radiation

Carl Babcock, James Taylor, Monroe Sullivan, Doowon Suh, Dean Plumb, Shane Palmer, Amanda Berry, Karen Graziano, Theodore Fedynyshyn

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46413

KEYWORDS: X-rays, X-ray lithography, Photomasks, Synchrotron radiation, Semiconducting wafers, Synchrotrons, Chemically amplified resists, Photoresist processing, Silver, Standards development

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Showing 5 of 18 publications

Conference Committee Involvement (3)

Photomask Technology

11 September 2017 | Monterey, California, United States

SPIE Photomask

2 February 2016 |

Internation Conference on Electron, Ion, Photon Beam and Nanofabrication Technology

28 May 2012 |

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