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Shunsuke Sato
at Toppan Printing
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Publications (3)
Proceedings Article | 28 July 2014 Paper
In-die registration measurement using novel model-based approach for advanced technology masks
Shunsuke Sato, Frank Laske, Shinji Kunitani, Tatsuhiko Kamibayashi, Akira Fuse, Naoki Takahashi, Klaus-Dieter Roeth, Slawomir Czerkas, Mehdi Daneshpanah, Yoshinori Nagaoka
Proceedings Volume 9256, 92560E (2014) https://doi.org/10.1117/12.2070399
KEYWORDS: Photomasks, Image registration, Model-based design, Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Semiconductors, Data processing, Metals
Proceedings Article | 8 November 2012 Paper
Impact of mask CDU and local CD variation on intra-field CDU
Proceedings Volume 8522, 85220E (2012) https://doi.org/10.1117/12.970523
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Lithography, Photoresist processing, Reticles, Metrology, Radium, Semiconductors
Proceedings Article | 27 May 2010 Paper
Contact mask LER impact on lithographic performance
Tatsuya Nagatomo, Mitsuharu Yamana, Katsuhisa Morinaga, Masaru Higuchi, Shunsuke Sato, Tsuyoshi Tanaka
Proceedings Volume 7748, 77481S (2010) https://doi.org/10.1117/12.866397
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Lithography, Line edge roughness, Quartz, Nanoimprint lithography, Binary data, Opacity, Glasses
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