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Dr. Stefan Egger
at National Institute for Materials Science
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 8 September 2006 Paper
Dynamic shadow mask technique for device fabrication in UHV
Proceedings Volume 6340, 63400Z (2006) https://doi.org/10.1117/12.681375
KEYWORDS: Photomasks, Electrodes, Fabrication, Scanning probe microscopy, Metals, Atomic force microscopy, Modulation, Contamination, Dielectrics, Nanolithography
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