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Suhas Pillai
at Ctr for Deep Learning in Electronics Manufacturing
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Publications (5)
Proceedings Article | 30 September 2021 Presentation
An SEM-based deep defect classification system for VSB mask writer that works with die-to-die and die-to-database inspection methods using multiple digital twins built with the state-of-the-art neural networks
Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim DeWitt, Noriaki Nakayamada, Aki Fujimura
Proceedings Volume 11855, 118550D (2021) https://doi.org/10.1117/12.2601004
KEYWORDS: Inspection, Vestigial sideband modulation, Classification systems, Scanning electron microscopy, Neural networks, Reticles, Computer aided design, Solid modeling, Glasses, Defect inspection
Proceedings Article | 23 August 2021 Paper
A deep learning toolset to mask analysis with SEM digital twins
Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura
Proceedings Volume 11908, 1190805 (2021) https://doi.org/10.1117/12.2601856
Proceedings Article | 16 October 2020 Presentation + Paper
A deep learning mask analysis toolset using mask SEM digital twins
Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura
Proceedings Volume 11518, 1151814 (2020) https://doi.org/10.1117/12.2576431
KEYWORDS: Scanning electron microscopy, Digital filtering, Image registration, Image filtering, Image classification, Data modeling, Solid modeling, Image quality, Image processing, Image analysis
Proceedings Article | 25 October 2019 Paper
Five deep learning recipes for the mask-making industry
Ajay Baranwal, Mike Meyer, Thang Nguyen, Suhas Pillai, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura, Mariusz Niewczas, Michael Pomerantsev
Proceedings Volume 11148, 1114809 (2019) https://doi.org/10.1117/12.2538440
KEYWORDS: Photomasks, Scanning electron microscopy, Image segmentation, Computer aided design, Neural networks, Manufacturing, Data modeling, Network architectures, Image processing, Electronics
Proceedings Article | 21 October 2019 Paper
Making digital twins using the Deep Learning Kit (DLK)
Linyong Pang, Suhas Pillai, Thang Nguyen, Mike Meyer, Ajay Baranwal, Henry Yu, Mariusz Niewczas, Ryan Pearman, Abhishek Shendre, Aki Fujimura
Proceedings Volume 11148, 111480B (2019) https://doi.org/10.1117/12.2538508
KEYWORDS: Photomasks, Scanning electron microscopy, Semiconducting wafers, Digital imaging, Computer aided design, Data modeling, Neural networks, Inspection, Semiconductor manufacturing, Gallium nitride
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