Mr. Sungho Jun Profile

Sungho Jun

at Dongbu HiTek Co Ltd

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 23 March 2011 Paper

Overcome the process limitation by using inverse lithography technology with assist feature

Yeon-Ah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, Ki-Ho Baik

Proceedings Volume 7973, 79732S (2011) https://doi.org/10.1117/12.870704

KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Overlay metrology, Logic

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Proceedings Article | 27 May 2010 Paper

Improvement of KrF contact layer by inverse lithography technology with assist feature

Sungho Jun, Yeon-Ah Shim, Jaeyoung Choi, Kwangsun Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, KiHo Baik

Proceedings Volume 7748, 77481V (2010) https://doi.org/10.1117/12.868563

KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Resolution enhancement technologies, Lithographic illumination, Scanners, Computer simulations

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Proceedings Article | 23 September 2009 Paper

Patterning of 90nm node flash contact hole with assist feature using KrF

Yeonah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Thomas Cecil, David Kim, KiHo Baik

Proceedings Volume 7488, 748837 (2009) https://doi.org/10.1117/12.833499

KEYWORDS: Lithography, SRAF, Photomasks, Optical lithography, Image processing, Lithographic illumination, Optical proximity correction, Resolution enhancement technologies, Scanners, Computer simulations

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Proceedings Article | 16 March 2009 Paper

Smart data filtering for enhancement of model accuracy

Shady Abdelwahed, Jae Hyun Kang, Jaeyoung Choi, Jong Doo Kim, Hyesung Lee, Sungho Jun, Youngmi Kim

Proceedings Volume 7274, 727423 (2009) https://doi.org/10.1117/12.814153

KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Lithography, Semiconducting wafers, Scanning electron microscopy, Photomasks, Image processing, Critical dimension metrology

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Proceedings Article | 7 March 2008 Paper

Extension of low k1 lithography processes with KrF for 90nm technology node

Sungho Jun, Eunsoo Jeong, Youngje Yun, Kwangseon Choi, Jeahee Kim, Jaewon Han

Proceedings Volume 6924, 692439 (2008) https://doi.org/10.1117/12.772537

KEYWORDS: Lithography, Critical dimension metrology, Line edge roughness, Etching, Image processing, Resolution enhancement technologies, Photomasks, Optical lithography, Image resolution, Edge roughness

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Proceedings Article | 5 April 2007 Paper

Enhanced hole shape of flash devices in ArF lithography by eliptical mask bias technique

Young-Doo Jeon, Sungho Jun, Jae-Hyun Kang, Sang-Uk Lee, Jeahee Kim, Keeho Kim

Proceedings Volume 6518, 65183W (2007) https://doi.org/10.1117/12.712016

KEYWORDS: Photomasks, Optical proximity correction, Optical lithography, Lithography, Diffraction, Data modeling, Process modeling, Optical properties, Semiconductor manufacturing, Bridges

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Proceedings Article | 5 April 2007 Paper

Optimization of lithography process to improve image deformation of contact hole sub-90 nm technology node

Sungho Jun, Juhyun Kim, Eunsoo Jeong, Youngje Yun, Jaehee Kim, Keeho Kim

Proceedings Volume 6518, 65183T (2007) https://doi.org/10.1117/12.711978

KEYWORDS: Image processing, Photomasks, Lithography, Edge roughness, Etching, Critical dimension metrology, Image analysis, Resistance, Image resolution, Failure analysis

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Showing 5 of 7 publications

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