Mr. Sunghyun Oh Profile

Sunghyun Oh

at SK Hynix Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 23 October 2015 Paper

Novel CD control of HTPSM by advanced process for sub-20nm tech

Sangjin Jo, Chungseon Choi, Sunghyun Oh, Taejoong Ha, Youngmo Lee, Sangpyo Kim, Donggyu Yim

Proceedings Volume 9635, 96351T (2015) https://doi.org/10.1117/12.2196938

KEYWORDS: Critical dimension metrology, Etching, Chromium, Scanning electron microscopy, Photomasks, Transmission electron microscopy, Double patterning technology, Phase shifts, Image processing, Signal processing

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Proceedings Article | 29 October 2014 Paper

A method of utilizing AIMS to quantify lithographic performance of high transmittance mask

Chun Seon Choi, Dong Sik Jang, Sung Hyun Oh, Jae Cheon Shin, Byungho Nam, Tae Joong Ha, Sang Pyo Kim, Dong Gyu Yim

Proceedings Volume 9235, 92351R (2014) https://doi.org/10.1117/12.2066283

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Nanoimprint lithography, Lithography, Binary data, Chromium, Etching, Image analysis, Extreme ultraviolet

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Proceedings Article | 17 April 2014 Paper

Analysis of phase defect effect on contact hole pattern using a programmed phase defect in EUVL mask

Yongdae Kim, Tsuneo Terasawa, Tsuyoshi Amano, Sunghyun Oh, Yoonsuk Hyun, Hidehiro Watanabe

Proceedings Volume 9048, 90482Q (2014) https://doi.org/10.1117/12.2046571

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Extreme ultraviolet, Optical lithography, Phase measurement, Inspection, Erbium

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Proceedings Article | 8 June 2010 Paper

Photomask defect detection and inspection: aerial imaging and high resolution inspection strategies

Sunghyun Oh, DaeHo Hwang, Inpyo Kim, Changreol Kim, Aviram Tam, Michael Ben Yishai, Yulian Wolff

Proceedings Volume 7748, 774827 (2010) https://doi.org/10.1117/12.869574

KEYWORDS: Inspection, Photomasks, SRAF, Defect detection, Image resolution, Critical dimension metrology, Airborne remote sensing, Artificial intelligence, Optics manufacturing, Signal detection

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Proceedings Article | 19 May 2008 Paper

The study to optimize CD uniformity by reliable area CD measurement on 45nm D/R DRAM

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proceedings Volume 7028, 70281O (2008) https://doi.org/10.1117/12.793065

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Scanning electron microscopy, Transmittance, Spatial filters, Image filtering, Image enhancement, Image processing, Error analysis

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Proceedings Article | 2 May 2008 Paper

Design of pattern-specific mask grating for giving the effect of an off-axis illumination

Young-Seok Kim, Seok Ho Song, Jong Ung Lee, Sung Hyun Oh, Yong Kyoo Choi, Munsik Kim, Beom-Hoan O, Se-Geun Park, El-Hang Lee, Seung Gol Lee

Proceedings Volume 6792, 67920R (2008) https://doi.org/10.1117/12.798809

KEYWORDS: Photomasks, Lithographic illumination, Optical design, Chromium, Lithography, Quartz, Atrial fibrillation

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Proceedings Article | 21 March 2008 Paper

EUV mask inspection tool using high NA DUV inspection tool

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proceedings Volume 6921, 692123 (2008) https://doi.org/10.1117/12.773145

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Deep ultraviolet, Reflectivity, Defect inspection, Extreme ultraviolet lithography, EUV optics, Etching, Defect detection

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Proceedings Article | 25 October 2007 Paper

Mask inspection method for 45nm node device

Sunghyun Oh, Yongkyoo Choi, Daeho Hwang, Goomin Jeong, Oscar Han

Proceedings Volume 6730, 673029 (2007) https://doi.org/10.1117/12.746864

KEYWORDS: Inspection, Photomasks, Reflectivity, Critical dimension metrology, Wafer-level optics, Pellicles, Light, Semiconducting wafers, Defect inspection, Resolution enhancement technologies

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Proceedings Article | 20 October 2006 Paper

CD measurement evaluation on periodic patterns between optic tools and CD-SEM

Yongkyoo Choi, Munsik Kim, Sunghyun Oh, Oscar Han

Proceedings Volume 6349, 63491N (2006) https://doi.org/10.1117/12.686461

KEYWORDS: Critical dimension metrology, Scatterometry, Photomasks, Scanning electron microscopy, Deep ultraviolet, Image enhancement, Metrology, Wafer-level optics, Transmittance, Calibration

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Proceedings Article | 20 October 2006 Paper

Multi-point CD measurement method to evaluate pattern fidelity and performance of mask

Munsik Kim, Hyemi Lee, Kanjoon Seo, Dongwook Lee, Yongkyoo Choi, Sunghyun Oh, Oscar Han

Proceedings Volume 6349, 634944 (2006) https://doi.org/10.1117/12.686473

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Image filtering, Line edge roughness, Anisotropic filtering, Time metrology, Anisotropic diffusion, Scatterometry, Metrology

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Showing 5 of 10 publications

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