Mr. Tatsuro Okawa Profile

Tatsuro Okawa

manager at Advantest Corp

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Publications (5)

Proceedings Article | 18 September 2024 Paper

High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

Joost Bekaert, Balakumar Baskaran, Lieve Van Look, Joern-Holger Franke, Vicky Philipsen, Ardavan Niroomand, Eric Hendrickx, Hideaki Komami, Tatsuro Okawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai

Proceedings Volume 13273, 132730S (2024) https://doi.org/10.1117/12.3029528

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Metrology, Scanning electron microscopy, Smoothing, Extreme ultraviolet lithography, Scanners, Design, Printing

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Proceedings Article | 21 November 2023 Presentation + Paper

Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks

Deepan Kishore Kumar, Varun Mohan, Hatsey Frezghi, Adam Seeger, Malahat Tavassoli, Masayuki Kuribara, Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai

Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660

KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles

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Proceedings Article | 5 October 2023 Paper

High-performance computing architecture (HW/SW) for mask CDSEM design based metrology

Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai

Proceedings Volume 12802, 128020D (2023) https://doi.org/10.1117/12.2675545

KEYWORDS: Image processing, Metrology, Design and modelling, Computer hardware, Image processing software, Scanning electron microscopy, Contour extraction, Parallel processing, Computing systems, Lithography

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Proceedings Article | 25 May 2010 Paper

Evaluation of throughput improvement and character projection in multi-column-cell E-beam exposure system

Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe

Proceedings Volume 7748, 774816 (2010) https://doi.org/10.1117/12.864286

KEYWORDS: Photomasks, Logic devices, Beam shaping, Vestigial sideband modulation, Optical proximity correction, Power supplies, Analytical research, Analog electronics, Semiconducting wafers, Logic

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Proceedings Article | 11 March 2010 Paper

Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system

Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe

Proceedings Volume 7637, 76370C (2010) https://doi.org/10.1117/12.846464

KEYWORDS: Photomasks, Beam shaping, Vestigial sideband modulation, Power supplies, Semiconducting wafers, Analog electronics, Analytical research, Lenses, Silicon, Calibration

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