Dr. Tomas Marangoni Profile

Dr. Tomas Marangoni

at DuPont Electronics & Industrial

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Author

Publications (4)

Proceedings Article | 9 April 2024 Paper

Disruptive non-fluorinated photoacid generators using computational chemistry and library design

P. LaBeaume, K. Hernandez, E. Vitaku, T. Marangoni, E. Aqad, M. Li, C. Hoelzel, J. Lachowski, M. Hayes, S. Wong, J. Li, A. Kwok, W. Huang, J. Park, H. He, H. Mackay, C. Liu, J. Cameron, C. Xu, Q. Xie, K. Petrillo

Proceedings Volume 12957, 129572B (2024) https://doi.org/10.1117/12.3025297

KEYWORDS: Photoacid generators, Photoresist materials, Semiconducting wafers, Design, Lithography, Optical lithography, Coating thickness, Chemistry, Coating, Silicon, Sustainability, Extreme ultraviolet lithography

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Proceedings Article | 30 April 2023 Presentation

Challenges and opportunities in material development and understanding that enables advanced photolithography

Mingqi Li, Emad Aqad, Tomas Marangoni, James Cameron, Paul LaBeaume, Jung-June Lee, Jae-Hwan Sim, Choong Bong Lee, Xisen Hou, Michael Eller, Stanislav Verkhorurov, Emile Schweikert, Peter Trefonas, Chengbai Xu

Proceedings Volume 12498, 124980H (2023) https://doi.org/10.1117/12.2657445

KEYWORDS: Optical lithography, Thin films, Semiconductors, Semiconductor manufacturing, Photoresist materials, Manufacturing, Lithography

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Proceedings Article | 22 February 2021 Presentation + Paper

Design considerations for chemically amplified EUV resist materials

Emad Aqad, ChoongBong Lee, Suzanne Coley, Ke Yang, Li Cui, Manibarsha Goswami, Bhooshan Popere, Tomas Marangoni, James Cameron, James Thackeray

Proceedings Volume 11609, 116090I (2021) https://doi.org/10.1117/12.2583642

KEYWORDS: Extreme ultraviolet, Polymers, Absorption, Quantum efficiency, Imaging systems, Yield improvement, Systems modeling, Stochastic processes, Modulation, Lithography

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Proceedings Article | 23 March 2018 Presentation + Paper

Roughness power spectral density as a function of resist parameters and its impact through process

Charlotte Cutler, James Thackeray, Jason DeSisto, John Nelson, Choong-Bong Lee, Mingqi Li, Emad Aqad, Xisen Hou, Tomas Marangoni, Joshua Kaitz, Rochelle Rena, Chris Mack

Proceedings Volume 10587, 1058707 (2018) https://doi.org/10.1117/12.2297690

KEYWORDS: Line width roughness, Scanning electron microscopy

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